JPS58183720A - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物

Info

Publication number
JPS58183720A
JPS58183720A JP6788882A JP6788882A JPS58183720A JP S58183720 A JPS58183720 A JP S58183720A JP 6788882 A JP6788882 A JP 6788882A JP 6788882 A JP6788882 A JP 6788882A JP S58183720 A JPS58183720 A JP S58183720A
Authority
JP
Japan
Prior art keywords
glycol
diisocyanate
photosensitive resin
unsaturated
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6788882A
Other languages
English (en)
Japanese (ja)
Other versions
JPH029610B2 (enrdf_load_stackoverflow
Inventor
Tatsuya Sugano
菅野　龍也
Yuuzou Toka
渡加　裕三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Corp
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Corp, Daicel Chemical Industries Ltd filed Critical Daicel Corp
Priority to JP6788882A priority Critical patent/JPS58183720A/ja
Priority to DE19833314258 priority patent/DE3314258C2/de
Priority to GB08310771A priority patent/GB2118563B/en
Publication of JPS58183720A publication Critical patent/JPS58183720A/ja
Publication of JPH029610B2 publication Critical patent/JPH029610B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP6788882A 1982-04-22 1982-04-22 感光性樹脂組成物 Granted JPS58183720A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP6788882A JPS58183720A (ja) 1982-04-22 1982-04-22 感光性樹脂組成物
DE19833314258 DE3314258C2 (de) 1982-04-22 1983-04-20 Lichtempfindliches Gemisch
GB08310771A GB2118563B (en) 1982-04-22 1983-04-21 Light-sensitive unsaturated urethane resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6788882A JPS58183720A (ja) 1982-04-22 1982-04-22 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS58183720A true JPS58183720A (ja) 1983-10-27
JPH029610B2 JPH029610B2 (enrdf_load_stackoverflow) 1990-03-02

Family

ID=13357879

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6788882A Granted JPS58183720A (ja) 1982-04-22 1982-04-22 感光性樹脂組成物

Country Status (3)

Country Link
JP (1) JPS58183720A (enrdf_load_stackoverflow)
DE (1) DE3314258C2 (enrdf_load_stackoverflow)
GB (1) GB2118563B (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07113767B2 (ja) * 1986-10-02 1995-12-06 旭化成工業株式会社 段ボ−ル印刷用感光性樹脂印刷版
US5288571A (en) * 1986-10-02 1994-02-22 Asahi Kasei Kogyo Kabushiki Kaisha Photoresin printing plate for use in printing a corrugated board
CN115003718B (zh) * 2020-03-31 2024-04-19 Tdk株式会社 树脂组合物及层叠体

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3136818C2 (de) * 1980-09-19 1990-08-02 Hitachi Chemical Co., Ltd., Tokio/Tokyo Verwendung eines lichtempfindlichen Gemisches und eines lichtempfindlichen Aufzeichnungsmaterials zur Bildung einer Lötmaske

Also Published As

Publication number Publication date
DE3314258A1 (de) 1983-10-27
GB2118563B (en) 1985-06-05
DE3314258C2 (de) 1994-09-29
GB2118563A (en) 1983-11-02
GB8310771D0 (en) 1983-05-25
JPH029610B2 (enrdf_load_stackoverflow) 1990-03-02

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