GB2118563B - Light-sensitive unsaturated urethane resin composition - Google Patents

Light-sensitive unsaturated urethane resin composition

Info

Publication number
GB2118563B
GB2118563B GB08310771A GB8310771A GB2118563B GB 2118563 B GB2118563 B GB 2118563B GB 08310771 A GB08310771 A GB 08310771A GB 8310771 A GB8310771 A GB 8310771A GB 2118563 B GB2118563 B GB 2118563B
Authority
GB
United Kingdom
Prior art keywords
light
resin composition
urethane resin
unsaturated urethane
sensitive unsaturated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08310771A
Other languages
English (en)
Other versions
GB2118563A (en
GB8310771D0 (en
Inventor
Tatsuya Kanno
Yuzo Toga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd
Publication of GB8310771D0 publication Critical patent/GB8310771D0/en
Publication of GB2118563A publication Critical patent/GB2118563A/en
Application granted granted Critical
Publication of GB2118563B publication Critical patent/GB2118563B/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
GB08310771A 1982-04-22 1983-04-21 Light-sensitive unsaturated urethane resin composition Expired GB2118563B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6788882A JPS58183720A (ja) 1982-04-22 1982-04-22 感光性樹脂組成物

Publications (3)

Publication Number Publication Date
GB8310771D0 GB8310771D0 (en) 1983-05-25
GB2118563A GB2118563A (en) 1983-11-02
GB2118563B true GB2118563B (en) 1985-06-05

Family

ID=13357879

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08310771A Expired GB2118563B (en) 1982-04-22 1983-04-21 Light-sensitive unsaturated urethane resin composition

Country Status (3)

Country Link
JP (1) JPS58183720A (enrdf_load_stackoverflow)
DE (1) DE3314258C2 (enrdf_load_stackoverflow)
GB (1) GB2118563B (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07113767B2 (ja) * 1986-10-02 1995-12-06 旭化成工業株式会社 段ボ−ル印刷用感光性樹脂印刷版
US5288571A (en) * 1986-10-02 1994-02-22 Asahi Kasei Kogyo Kabushiki Kaisha Photoresin printing plate for use in printing a corrugated board
CN115003718B (zh) * 2020-03-31 2024-04-19 Tdk株式会社 树脂组合物及层叠体

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3136818C2 (de) * 1980-09-19 1990-08-02 Hitachi Chemical Co., Ltd., Tokio/Tokyo Verwendung eines lichtempfindlichen Gemisches und eines lichtempfindlichen Aufzeichnungsmaterials zur Bildung einer Lötmaske

Also Published As

Publication number Publication date
DE3314258A1 (de) 1983-10-27
DE3314258C2 (de) 1994-09-29
GB2118563A (en) 1983-11-02
JPS58183720A (ja) 1983-10-27
GB8310771D0 (en) 1983-05-25
JPH029610B2 (enrdf_load_stackoverflow) 1990-03-02

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19950421