JPS58181872A - 反応性イオンで食刻される構造体を形成する方法 - Google Patents
反応性イオンで食刻される構造体を形成する方法Info
- Publication number
- JPS58181872A JPS58181872A JP58039313A JP3931383A JPS58181872A JP S58181872 A JPS58181872 A JP S58181872A JP 58039313 A JP58039313 A JP 58039313A JP 3931383 A JP3931383 A JP 3931383A JP S58181872 A JPS58181872 A JP S58181872A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- mask
- microns
- ferrite
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000015572 biosynthetic process Effects 0.000 title description 2
- 229920002120 photoresistant polymer Polymers 0.000 claims description 40
- 229910000859 α-Fe Inorganic materials 0.000 claims description 33
- 238000005530 etching Methods 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 150000002500 ions Chemical class 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 238000007747 plating Methods 0.000 claims description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 33
- 229910052759 nickel Inorganic materials 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000001020 plasma etching Methods 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910000640 Fe alloy Inorganic materials 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 2
- 229910001053 Nickel-zinc ferrite Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910001289 Manganese-zinc ferrite Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- JIYIUPFAJUGHNL-UHFFFAOYSA-N [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[Mn++].[Mn++].[Mn++].[Fe+3].[Fe+3].[Fe+3].[Fe+3].[Fe+3].[Fe+3].[Fe+3].[Fe+3].[Fe+3].[Fe+3].[Zn++].[Zn++] Chemical compound [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[Mn++].[Mn++].[Mn++].[Fe+3].[Fe+3].[Fe+3].[Fe+3].[Fe+3].[Fe+3].[Fe+3].[Fe+3].[Fe+3].[Fe+3].[Zn++].[Zn++] JIYIUPFAJUGHNL-UHFFFAOYSA-N 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Natural products CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- ZUSAAICYKOPBSX-UHFFFAOYSA-N nitric acid;propan-2-one Chemical compound CC(C)=O.O[N+]([O-])=O ZUSAAICYKOPBSX-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000003079 width control Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
- H01F41/34—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film in patterns, e.g. by lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
- G11B5/193—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features the pole pieces being ferrite or other magnetic particles
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Magnetic Heads (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/357,947 US4375390A (en) | 1982-03-15 | 1982-03-15 | Thin film techniques for fabricating narrow track ferrite heads |
| US357947 | 1994-12-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58181872A true JPS58181872A (ja) | 1983-10-24 |
| JPS619392B2 JPS619392B2 (OSRAM) | 1986-03-22 |
Family
ID=23407688
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58039313A Granted JPS58181872A (ja) | 1982-03-15 | 1983-03-11 | 反応性イオンで食刻される構造体を形成する方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4375390A (OSRAM) |
| EP (1) | EP0088869B1 (OSRAM) |
| JP (1) | JPS58181872A (OSRAM) |
| DE (1) | DE3374485D1 (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62234214A (ja) * | 1986-04-03 | 1987-10-14 | Alps Electric Co Ltd | 磁気ヘツドの製造方法 |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL8200532A (nl) * | 1982-02-12 | 1983-09-01 | Philips Nv | Reactief ionen etsen van een voorwerp van ferriet. |
| US4420365A (en) * | 1983-03-14 | 1983-12-13 | Fairchild Camera And Instrument Corporation | Formation of patterned film over semiconductor structure |
| US4564585A (en) * | 1983-11-28 | 1986-01-14 | Magnetic Peripherals, Inc. | Process for fabricating negative pressure sliders |
| DE3544299A1 (de) * | 1985-12-14 | 1987-06-19 | Hoechst Ag | Verfahren zum herstellen eines eich- und pruefstandardelements und nach dem verfahren hergestelltes eich- und pruefstandardelement |
| JPH01157527A (ja) * | 1987-12-14 | 1989-06-20 | Toshiba Corp | フォトレジストのパターン形成方法 |
| NL8900107A (nl) * | 1989-01-18 | 1990-08-16 | Philips Nv | Magneetkop alsmede werkwijze voor het vervaardigen van de magneetkop. |
| US4933209A (en) * | 1989-06-28 | 1990-06-12 | Hewlett-Packard Company | Method of making a thin film recording head apparatus utilizing polyimide films |
| JP2757546B2 (ja) * | 1990-08-27 | 1998-05-25 | 日本電気株式会社 | Ｆｅを含む物質のエッチング方法およびエッチング装置 |
| CA2090708A1 (en) * | 1992-04-30 | 1993-10-31 | Jeffrey Merritt Mckay | Combination transducer/slider/suspension and method for making |
| DE69607130T2 (de) * | 1995-12-29 | 2000-10-19 | At & T Corp., New York | Elektroplattieren von Nickel auf Nickel-Ferrit Vorrichtungen |
| US5779873A (en) * | 1995-12-29 | 1998-07-14 | Lucent Technologies Inc. | Electroplating of nickel on nickel ferrite devices |
| JPH11306706A (ja) | 1998-04-23 | 1999-11-05 | Alps Electric Co Ltd | パターン形成方法 |
| JPH11306707A (ja) | 1998-04-23 | 1999-11-05 | Alps Electric Co Ltd | 露光用マスク及びこの露光用マスクを用いた露光方法 |
| US20020110700A1 (en) * | 2001-02-12 | 2002-08-15 | Hein Gerald F. | Process for forming decorative films and resulting products |
| US8673161B2 (en) * | 2008-12-29 | 2014-03-18 | HGST Netherlands B.V. | Structure formation using metal deposited on a RIE-able seedlayer |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE792908A (fr) * | 1971-12-20 | 1973-04-16 | Western Electric Co | Procede de fabrication de dispositifs semi-conducteurs |
| FR2209216B1 (OSRAM) * | 1972-11-30 | 1977-09-30 | Ibm | |
| NL7401859A (nl) * | 1974-02-12 | 1975-08-14 | Philips Nv | Werkwijze voor het vervaardigen van een patroon en of meer lagen op een ondergrond door selijk verwijderen van deze laag of lagen sputteretsen en voorwerpen, in het bijzon- alfgeleiderinrichtingen, vervaardigd met ssing van deze werkwijze. |
| US4259433A (en) * | 1976-10-22 | 1981-03-31 | Fuji Photo Film Co., Ltd. | Method for producing disk-recording plates |
| US4124473A (en) * | 1977-06-17 | 1978-11-07 | Rca Corporation | Fabrication of multi-level relief patterns in a substrate |
| US4256514A (en) * | 1978-11-03 | 1981-03-17 | International Business Machines Corporation | Method for forming a narrow dimensioned region on a body |
| US4275286A (en) * | 1978-12-04 | 1981-06-23 | Hughes Aircraft Company | Process and mask for ion beam etching of fine patterns |
-
1982
- 1982-03-15 US US06/357,947 patent/US4375390A/en not_active Expired - Fee Related
-
1983
- 1983-01-26 EP EP83100689A patent/EP0088869B1/en not_active Expired
- 1983-01-26 DE DE8383100689T patent/DE3374485D1/de not_active Expired
- 1983-03-11 JP JP58039313A patent/JPS58181872A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62234214A (ja) * | 1986-04-03 | 1987-10-14 | Alps Electric Co Ltd | 磁気ヘツドの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0088869A2 (en) | 1983-09-21 |
| EP0088869A3 (en) | 1986-02-05 |
| DE3374485D1 (en) | 1987-12-17 |
| JPS619392B2 (OSRAM) | 1986-03-22 |
| EP0088869B1 (en) | 1987-11-11 |
| US4375390A (en) | 1983-03-01 |
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