JPS58176237A - Epoxy resin molding material - Google Patents

Epoxy resin molding material

Info

Publication number
JPS58176237A
JPS58176237A JP5922382A JP5922382A JPS58176237A JP S58176237 A JPS58176237 A JP S58176237A JP 5922382 A JP5922382 A JP 5922382A JP 5922382 A JP5922382 A JP 5922382A JP S58176237 A JPS58176237 A JP S58176237A
Authority
JP
Japan
Prior art keywords
epoxy resin
ion
molding material
inorg
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5922382A
Other languages
Japanese (ja)
Other versions
JPH044328B2 (en
Inventor
Masayuki Kobayashi
正之 小林
Masatoshi Ichi
正年 位地
Shinichiro Asai
新一郎 浅井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP5922382A priority Critical patent/JPS58176237A/en
Publication of JPS58176237A publication Critical patent/JPS58176237A/en
Publication of JPH044328B2 publication Critical patent/JPH044328B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To provide the titled molding material having high reliability and suitable for use in the sealing of electronic parts, by adding an ion exchanger to a compsn. consisting mainly of an epoxy resin, a hardener and an inorg. filler. CONSTITUTION:0.01-20pts.wt. (per 100pts.wt. of the combined amount of components A and B mentioned below) one or more org. or inorg. ion exchangers such as a strongly acidic cation exchanger is added to a compsn. obtd. by blending a hardener (B) such as a phenol novolak, 150-450pts.wt. inorg. filler (C) such as silica and, if necessary, parting agent, flame retarder, flexibilizer, etc. with 100pts.wt. epoxy resin (A). EFFECT:Since ionic impurities such as Na ion and Cl ion contained in the moldings, which cause corrosion, are captured by the ion exchanger, there can be obtd. electronic parts, which have high reliability and do not corrode semiconductor elements sealed by resins.

Description

【発明の詳細な説明】 本発明は、エポキシ樹脂系成形材料に係り、特に、半導
体素子などの電子部品封止用に適したエポキシ樹脂系成
形材料に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an epoxy resin molding material, and particularly to an epoxy resin molding material suitable for encapsulating electronic components such as semiconductor elements.

近年トランジスタ素子や集積回路素子などの電子部品の
封正においては、エポキシ樹脂系などの熱硬化樹脂系成
形材料を用いることが広く採用されている。これは、従
来の金属やセラミック製材料を用いるハーメチックシー
ル方式に比べ、封止操作が簡単で、さらに経済性がある
などの利点があるためである。しかし、その反丙、樹脂
封止方式は、ハーメチックシール方式に比べ湿気に対す
る信頼性が劣るという欠点がある。
BACKGROUND ART In recent years, thermosetting resin molding materials such as epoxy resins have been widely used for sealing electronic components such as transistor elements and integrated circuit elements. This is because the sealing operation is simpler and more economical than the conventional hermetic seal method using metal or ceramic materials. However, on the other hand, the resin sealing method has a drawback of being inferior in reliability against moisture compared to the hermetic sealing method.

すなわち、樹脂封止方式が湿気に対する信頼性の劣る理
由は、次の様に考えられる。エポキシ樹脂系成形材料か
らなる成形品は、吸湿性を有しており、外界囲気中の水
分が樹脂封止成形体を浸透して封止された電子部品表面
まで達するが、その際水分は、該成形体中に含まれるナ
トリウムイオンや塩素イオンなどのイオン性不純物を溶
解して電子部品表面まで運び、アルミニウムなどの金属
配線の腐食を引き起こすことにある。このイオン性不純
物の大部分は、成形材料の原料であるエポキシ樹脂など
に由来している。封止用エポキシ樹脂については、合成
後精製処理を施すのが一般的となっている。しかし、イ
オン性不純物を完全に除去するのは、実質的に不可能と
いえる。また、エポキシ樹脂中には、イオン性不純物で
はない力ζ熱や触媒の作用でイオン化しうる加水分解性
塩素がイオン性不純物の塩素の10〜1000倍程度存
在してあり、これも製造上除去するのは困難である。
That is, the reason why the resin sealing method has poor reliability against moisture is considered to be as follows. Molded products made of epoxy resin molding materials have hygroscopic properties, and moisture in the surrounding air permeates through the resin-sealed molded product and reaches the surface of the sealed electronic component. The problem is that ionic impurities such as sodium ions and chloride ions contained in the molded body are dissolved and transported to the surface of electronic components, causing corrosion of metal wiring such as aluminum. Most of these ionic impurities originate from epoxy resins, etc., which are raw materials for molding materials. It is common for epoxy resins for sealing to undergo purification treatment after synthesis. However, it is virtually impossible to completely remove ionic impurities. In addition, in epoxy resins, hydrolyzable chlorine, which is not an ionic impurity and can be ionized by the action of heat or catalyst, exists about 10 to 1000 times as much as chlorine, which is an ionic impurity, and this is also removed during manufacturing. It is difficult to do so.

この様にエポキシ樹脂封止には、耐湿性、耐食性に問題
があるので、種々検討を進めた結果、エポキシ樹脂系成
形材料に1種または2種以上のイオン交換体を添加配合
すると金属配線の腐食を著しく低減乃至抑制しうろこと
を見出した。
As described above, epoxy resin sealing has problems with moisture resistance and corrosion resistance, and as a result of various studies, we found that if one or more ion exchangers are added to the epoxy resin molding material, metal wiring We have discovered a scale that significantly reduces or suppresses corrosion.

本発明は上記知見に基き、信頼性ぬ秀れた樹脂封止電子
部品の製造に適するエポキシ樹脂系成形材料を提供しよ
うとするものである。
Based on the above findings, the present invention aims to provide an epoxy resin molding material suitable for manufacturing highly reliable resin-sealed electronic components.

すなわち、本発明は、エポキシ樹脂、硬化剤および無機
光てん剤を主成分とする組成物に1種又は2種以上のイ
オン交換体を添加することを特徴とする。
That is, the present invention is characterized in that one or more ion exchangers are added to a composition whose main components are an epoxy resin, a curing agent, and an inorganic photonic agent.

本発明において用いるエポキシ樹脂は、分子中にエポキ
シ基を少なくとも2個以上有するものであれば、分子構
造、分子量などに特に制限はない。
The epoxy resin used in the present invention is not particularly limited in molecular structure, molecular weight, etc., as long as it has at least two or more epoxy groups in the molecule.

例えば、ビスフェノールム型エポキシ樹脂、フェノール
ノボラック型エポキシ樹脂、クレゾールノボラック型エ
ポキシ樹脂、あるいは脂環式エポキシ樹脂など一般に成
形材料用として使用されているものであればいずれでも
よい。その際ナトリウムや塩素などのイオン性不純物や
加水分解性塩素の少ないものが望ましい。
For example, any resin commonly used as a molding material may be used, such as a bisphenol epoxy resin, a phenol novolak epoxy resin, a cresol novolak epoxy resin, or an alicyclic epoxy resin. In this case, it is desirable to use a material that contains less ionic impurities such as sodium and chlorine, and less hydrolyzable chlorine.

次に硬化剤としては、例えば、フェノールノボラック樹
脂、クレゾールノボラック樹脂などのフェノール系硬化
剤、アミン系硬化剤、酸無水物系硬化剤などが挙げられ
る。これらの使用量については、特に制限はないが、エ
ポキシ基と硬化剤の官能基のバランスを考えて加えるこ
とが必要である。
Examples of the curing agent include phenolic curing agents such as phenol novolak resin and cresol novolac resin, amine curing agents, and acid anhydride curing agents. There is no particular restriction on the amount of these to be used, but it is necessary to consider the balance between the epoxy groups and the functional groups of the curing agent.

次に、無機光てん剤としては、例えば、結晶性シリカ、
溶融シリカ、ケイ酸カルシウム、アルミナ、炭酸カルシ
ウム、タルク、硫酸バリウムなどの粉体、およびそれら
の繊維やガラス繊維などが挙げられる。これらは、必要
に応じて併用してもよい。通常は、結晶シリカか溶融シ
リカが用いられる。この無機光てん剤の配合比は、選択
する上記の樹脂分によっても異なるが、一般に樹脂分1
00重量部に対し150〜450重量部程度でよい。1
肴0重量部未満では、熱膨張率、成形収縮率が大きく、
また、熱伝導率が低く、450重量部を超えると流動性
低下、金型摩耗が大きくなる等の欠点がある。
Next, as the inorganic photonic agent, for example, crystalline silica,
Examples include powders of fused silica, calcium silicate, alumina, calcium carbonate, talc, barium sulfate, and their fibers and glass fibers. These may be used in combination as necessary. Usually crystalline silica or fused silica is used. The blending ratio of this inorganic photonic agent varies depending on the resin content selected, but generally the resin content is 1
The amount may be about 150 to 450 parts by weight per 00 parts by weight. 1
If the appetizer is less than 0 parts by weight, the coefficient of thermal expansion and molding shrinkage will be large;
In addition, the thermal conductivity is low, and if the amount exceeds 450 parts by weight, there are disadvantages such as decreased fluidity and increased mold wear.

本発明において配合するイオン交換体の種類としては、
有機イオン交換体と無機イオン交換体とがある。そのう
ちの有機イオン交換体としては、スルホン酸基等を有す
る強酸性陽イオン交換樹脂、カルボン酸基、ホスホン酸
基またはホスフィン酸基尋を有する弱酸性陽イオン交換
樹脂、また第四級アンモニウム基等を有する強塩基性陰
イオン交換樹脂、第一級、第二級、第三級アミン基等を
有する弱塩基性陰イオン交換樹脂などがある。また、ビ
ニルピリジン、ビニルメミダゾールなどのビニル基を有
する複素環化合物単独またはジビニルベンゼンなどとの
共重合体およびその第四級アンモニウム化したものなど
も含まれる。無機イオン交換体としては、天然または合
成ゼオライト類、リン酸ジルコニウム、酸化ジルコニウ
ムなどが挙げられる。
The types of ion exchangers to be blended in the present invention include:
There are organic ion exchangers and inorganic ion exchangers. Examples of organic ion exchangers include strongly acidic cation exchange resins having sulfonic acid groups, weakly acidic cation exchange resins having carboxylic acid groups, phosphonic acid groups, or phosphinic acid groups, and quaternary ammonium groups. There are strongly basic anion exchange resins having 1, weakly basic anion exchange resins having primary, secondary, tertiary amine groups, etc. Also included are heterocyclic compounds having a vinyl group, such as vinylpyridine and vinylmemidazole, alone or copolymers with divinylbenzene, and their quaternary ammonium compounds. Examples of inorganic ion exchangers include natural or synthetic zeolites, zirconium phosphate, zirconium oxide, and the like.

さらには、これらイオン交換体の1種又は2種以上の混
合系で用いることもできる。また、陽イオン交換体であ
れば、水素イオン型以外にもアンモニウム塩などの塩型
で、陰イオン交換体であれは、水酸イオン型もしくはフ
リー塩基型以外にもホウ酸塩、リン酸塩などの塩型を用
いてもよい。
Furthermore, it is also possible to use one type or a mixed system of two or more of these ion exchangers. In addition, for cation exchangers, in addition to the hydrogen ion type, there are salt types such as ammonium salts, and for anion exchangers, in addition to the hydroxide ion type or free base type, borates and phosphates are available. Salt forms such as may also be used.

これらイオン交換体の添加配合量は、樹脂及び無機光て
ん剤との総量100重量部に対してイオン交換体は、0
.01〜20重量部が好ましく 、0.01重量部未満
では耐湿、耐腐食性が十分でなく、20重量部を超えて
も効果が増さず、これ以上の添加量は必要としない。イ
オン交換体としての無機イオン交換体は、無機光てん剤
としても機能させることができる。そのような目的で使
用する場合の添加量は、最大450重量部まで添加機能
させることができる。添加量が45050重量部超える
と、耐湿、耐腐食性の効果は変化しないが、成形時の流
動性低下、金型摩耗が大きくなり好ましくない。なお、
これらのイオン交換体は、乾燥したもので、組成物中に
均一に分散させやすいようにできるだけ微細な粉体とし
たものが好ましい。
The amount of these ion exchangers added is 0 to 100 parts by weight of the total amount of resin and inorganic photonic agent.
.. The amount is preferably from 0.01 to 20 parts by weight, and if it is less than 0.01 part by weight, the moisture resistance and corrosion resistance will not be sufficient, and if it exceeds 20 parts by weight, the effect will not increase, so there is no need to add more than this amount. An inorganic ion exchanger as an ion exchanger can also function as an inorganic photonic agent. When used for such purposes, the added amount can be up to 450 parts by weight. If the amount added exceeds 45,050 parts by weight, the moisture resistance and corrosion resistance effects will not change, but fluidity during molding will decrease and mold wear will increase, which is not preferable. In addition,
These ion exchangers are preferably dried and made into as fine a powder as possible so that they can be easily dispersed uniformly in the composition.

本発明に係る成形材料には、必要に応じてイミダゾール
や第3級アミンなどの硬化促進剤、カルナバワックス、
モンタンワックス、ステアリン酸などのam剤、ハロゲ
ン化エポキシ樹脂や三酸化アンチモンなどの難燃化剤、
カーボンブラックなどの着色材、シランカッシリング剤
などの表面処理剤シリコーン化合物など組可とう性行与
剤などを適宜添加配合することもできる。
The molding material according to the present invention may optionally contain a curing accelerator such as imidazole or tertiary amine, carnauba wax,
AM agents such as montan wax and stearic acid, flame retardants such as halogenated epoxy resins and antimony trioxide,
A coloring agent such as carbon black, a surface treatment agent such as a silane cassilling agent, an agent for imparting assembly flexibility such as a silicone compound, and the like may be appropriately added and blended.

本発明に係る成形材料の製造は、所定の組成比の原料を
ミキサーなどによって充分混合後、さらに熱ロールやニ
ーダ−などによる溶融混合処理を加えることによって容
易に行ないうる。
The molding material according to the present invention can be easily produced by thoroughly mixing raw materials having a predetermined composition ratio using a mixer or the like, and then further melting and mixing the mixture using a heated roll, kneader, or the like.

このように本発明に係るエポキシ樹脂系成形材料は、例
えば、半導体素子の封正に適用した場合などに高い信頼
性を与える。即ち、樹脂封止した半導体素子は、例えば
高温、高圧水蒸気中での耐湿試験においても、アルミニ
ウム配線の腐食による断線などの不良発生が著しく、□
低減乃至抑制され、長期間に亘って所要の性能を維持、
発揮させることができる。この理由は、成形体に含まれ
るナトリウムイオンや塩素イオンなどの腐食を引き起こ
すイオン性不純物が、特に添加配合しであるイオン交換
体によって捕捉され、アルミニウム配純表面に達し得な
くなるためと考えられる。
As described above, the epoxy resin molding material according to the present invention provides high reliability when applied to, for example, encapsulation of semiconductor elements. In other words, resin-sealed semiconductor elements are subject to significant defects such as disconnection due to corrosion of aluminum wiring, even in moisture resistance tests under high temperature and high pressure steam.
Reduced or suppressed, maintaining the required performance over a long period of time,
It can be demonstrated. The reason for this is thought to be that ionic impurities that cause corrosion, such as sodium ions and chloride ions, contained in the molded body are captured by the ion exchanger, which is especially added, and cannot reach the aluminum distribution surface.

次に本発明を実施例によりさらに具体的に説明する。な
お以下において部とあるのは重量部を示す。
Next, the present invention will be explained in more detail with reference to Examples. In addition, in the following, parts indicate parts by weight.

実施例1〜8 エポキシ当量220のクレゾールノボラ゛Aボキシ樹脂
170部、エポキシ当量280の臭素化ノボラックエポ
キシ樹脂60部、フェノールノボラック樹脂100部、
2−ウンデシルイミダゾール4部、カルナバワックス5
部、シランカップリング剤(γ−グリシドオキシゾロビ
゛ルトリメトキシラン)6部、カーボンブラック2部、
三酸化アンチモン8部、結晶シリカ700部からなる組
成物に、表に示すような穐類及び量のイオン交換体を添
加配合し、ミキーーで混合し、さらに加熱ロールで混練
し、そして冷却後粉砕して成形材料を調製した。
Examples 1 to 8 170 parts of cresol novolac A boxy resin with an epoxy equivalent weight of 220, 60 parts of a brominated novolac epoxy resin with an epoxy equivalent weight of 280, 100 parts of a phenol novolak resin,
4 parts of 2-undecyl imidazole, 5 parts of carnauba wax
parts, 6 parts of silane coupling agent (γ-glycidoxyzolobyltrimethoxylane), 2 parts of carbon black,
A composition consisting of 8 parts of antimony trioxide and 700 parts of crystalline silica was mixed with the ion exchanger in the amount shown in the table, mixed with a mixer, kneaded with heated rolls, cooled, and then pulverized. A molding material was prepared.

この様にして調製した各成形材料を用い、トランスファ
ー成形法で対向するアルミニウム配線を有する評価用シ
リコン素子を封止した。そしてこの封止素子に温度12
5℃の水蒸気加圧下で、電極間忙直流20Vのバイアス
電圧を印加し、耐湿試験B−POT(バイアスプレッシ
ャーワラカーテスト)を行ない、50チの素子がオープ
ン不良となる時間を比較することによって評価した結果
を表に示す。
Using each of the molding materials prepared in this way, a silicon element for evaluation having opposing aluminum wiring was sealed by transfer molding. And this sealing element has a temperature of 12
By applying a bias voltage of 20 V direct current between the electrodes under steam pressure at 5°C and performing a moisture resistance test B-POT (bias pressure wallaker test), we compared the time it takes for 50-chi elements to become open. The evaluation results are shown in the table.

表から明らかな様に本発明の係る成形材料によれば、半
導体素子を封止した場合など勢、秀れた耐湿、耐食性を
付与しうることがわかる。
As is clear from the table, it can be seen that the molding material of the present invention can provide excellent moisture resistance and corrosion resistance when a semiconductor element is encapsulated.

比較例1〜ろ エポキシ樹脂組成物にイオン交換体を添加しないもの、
また、イオン交換体を表に示す添加量とし、その他は実
施例と同様の操作を行い、かつ評価試験を行った。その
結果を表に示す。
Comparative Example 1 - No ion exchanger added to the epoxy resin composition,
In addition, the ion exchanger was added in the amount shown in the table, and the other operations were the same as in the examples, and an evaluation test was conducted. The results are shown in the table.

Claims (1)

【特許請求の範囲】[Claims] エポキシ樹脂、硬化剤および無機光てん剤を主成分とす
る組成物に、11g又は2種以上のイオン交換体を添加
してなることを特徴とするエポキシ樹脂系成形材料。
An epoxy resin molding material characterized in that it is made by adding 11 g or two or more types of ion exchangers to a composition whose main components are an epoxy resin, a curing agent, and an inorganic photonic agent.
JP5922382A 1982-04-09 1982-04-09 Epoxy resin molding material Granted JPS58176237A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5922382A JPS58176237A (en) 1982-04-09 1982-04-09 Epoxy resin molding material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5922382A JPS58176237A (en) 1982-04-09 1982-04-09 Epoxy resin molding material

Publications (2)

Publication Number Publication Date
JPS58176237A true JPS58176237A (en) 1983-10-15
JPH044328B2 JPH044328B2 (en) 1992-01-28

Family

ID=13107159

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5922382A Granted JPS58176237A (en) 1982-04-09 1982-04-09 Epoxy resin molding material

Country Status (1)

Country Link
JP (1) JPS58176237A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4716184A (en) * 1986-03-14 1987-12-29 Matsushita Electric Works, Ltd. Epoxy resin encapsulating composition with enhanced moisture resistance and method for producing the same
JPH036213A (en) * 1989-06-01 1991-01-11 Matsushita Electric Ind Co Ltd Ultraviolet-curable resin
JPH07126494A (en) * 1993-11-02 1995-05-16 Mitsui Petrochem Ind Ltd Epoxy resin composition, jointing member for airtight sealing coated therewith as adhesive, package for semiconductor device molded therefrom, and semiconductor device using them
WO1996031574A1 (en) * 1995-04-04 1996-10-10 Hitachi Chemical Company, Ltd. Adhesive, adhesive film and adhesive-backed metal foil
WO1997033932A1 (en) * 1996-03-15 1997-09-18 Sony Chemicals Corporation Epoxy resin composition and optical information recording medium made by using the same
JP2006344651A (en) * 2005-06-07 2006-12-21 Hitachi Chem Co Ltd Thermosetting resin paste and flexible wiring board using the same

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4716184A (en) * 1986-03-14 1987-12-29 Matsushita Electric Works, Ltd. Epoxy resin encapsulating composition with enhanced moisture resistance and method for producing the same
JPH036213A (en) * 1989-06-01 1991-01-11 Matsushita Electric Ind Co Ltd Ultraviolet-curable resin
JPH07126494A (en) * 1993-11-02 1995-05-16 Mitsui Petrochem Ind Ltd Epoxy resin composition, jointing member for airtight sealing coated therewith as adhesive, package for semiconductor device molded therefrom, and semiconductor device using them
WO1996031574A1 (en) * 1995-04-04 1996-10-10 Hitachi Chemical Company, Ltd. Adhesive, adhesive film and adhesive-backed metal foil
CN1089356C (en) * 1995-04-04 2002-08-21 日立化成工业株式会社 Adhesive, adhesive film and adhesive-backed metal foll
WO1997033932A1 (en) * 1996-03-15 1997-09-18 Sony Chemicals Corporation Epoxy resin composition and optical information recording medium made by using the same
AU713122B2 (en) * 1996-03-15 1999-11-25 Sony Chemicals Corporation Epoxy resin composition and optical information recording medium using the same
US6121339A (en) * 1996-03-15 2000-09-19 Sony Chemicals Corporation Cationically polymerizable epoxy resins and optical information recording medium made therefrom
US6447867B1 (en) 1996-03-15 2002-09-10 Sony Chemicals Corporation Epoxy resin composition and optical information recording medium using the same
CN1092680C (en) * 1996-03-15 2002-10-16 索尼化学株式会社 Epoxy resin compsn. and optical information recording medium made by using the same
JP2006344651A (en) * 2005-06-07 2006-12-21 Hitachi Chem Co Ltd Thermosetting resin paste and flexible wiring board using the same

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JPH044328B2 (en) 1992-01-28

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