JPS58175451U - イオン汚染の基準を測定する装置 - Google Patents

イオン汚染の基準を測定する装置

Info

Publication number
JPS58175451U
JPS58175451U JP1983052770U JP5277083U JPS58175451U JP S58175451 U JPS58175451 U JP S58175451U JP 1983052770 U JP1983052770 U JP 1983052770U JP 5277083 U JP5277083 U JP 5277083U JP S58175451 U JPS58175451 U JP S58175451U
Authority
JP
Japan
Prior art keywords
tank
test
solution
fluid
test tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1983052770U
Other languages
English (en)
Other versions
JPH0119082Y2 (ja
Inventor
エドガ−・ダブリユ・ウエフグラム
Original Assignee
ケンコ・アロイ・アンド・ケミカル・カムパニ−・インコ−ポレ−テツド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ケンコ・アロイ・アンド・ケミカル・カムパニ−・インコ−ポレ−テツド filed Critical ケンコ・アロイ・アンド・ケミカル・カムパニ−・インコ−ポレ−テツド
Publication of JPS58175451U publication Critical patent/JPS58175451U/ja
Application granted granted Critical
Publication of JPH0119082Y2 publication Critical patent/JPH0119082Y2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2801—Testing of printed circuits, backplanes, motherboards, hybrid circuits or carriers for multichip packages [MCP]
    • G01R31/2806—Apparatus therefor, e.g. test stations, drivers, analysers, conveyors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/06—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a liquid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Electrochemistry (AREA)
  • Immunology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Engineering & Computer Science (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【図面の簡単な説明】
添付した略図によって、本考案を概略に図示す　、　゛
る。 主要部分の符号の説明、１０・・・・・・試験槽、１２
・・・・・・容量目盛、１４・・・・・・溶液貯槽、１
６・・・・・・排水線、１８・・・・・・放出線、２０
・・・・・・ポンプ、２２・・曲イオン除去塔、２６・
・・・・・電動機、２８・・・・・・攪拌機、３０・・
・・・・電子感知器、３２・・・・・・抵抗率監視回路
、３６・・・・・・清浄サイクル制御回路、４２・・・
・・・試験サイクル制御回路、４８・・・・・・試験サ
イクル記録回路、５０・・・・・・タイマ。

Claims (1)

  1. 【実用新案登録請求の範囲】 １　電子機器を入れるために成形し適合させた試験槽、
    上記の試験槽と流体回路をつくる溶液貯槽とイオン除去
    手段、上記の回路と試験槽を通し流体を循環させるポン
    プ、上記の槽の中の溶液のイオン汚染を測定する手段、
    上記のポンプが上記の試験槽、イオン除去手段および貯
    槽を通して流体を循環し更に上記のポンプが上記の試験
    槽の中に先決した静止容量の流体を入れるための手段を
    有する制御手段を有することを特徴とする電子機器のイ
    オン汚染を測定する装置。 ２　上記の測定手段が一定の間隔をおいた一対の電極の
    間で上記の溶液の抵抗率を測定する電子感知器を有する
    ことを特徴とする第（１）項記載の装置。 ３　均質な流体を準備するため上記の試験槽の中の溶液
    を攪拌する手段を有することを特徴とす、る第（１）項
    記載の装置。 ４　上記の攪拌手段は、試験槽の中に置いた磁石と、試
    験槽の外に且つ直接に磁石に隣接して置いた電動機を有
    することを特徴とする第（３）項記載の装置。 ５　上記のイオン除去手段は上記の貯槽と試験槽の間に
    並列に連結した複数のイオン塔を有することを特徴とす
    る第（１）項記載の装置。
JP1983052770U 1976-02-17 1983-04-11 イオン汚染の基準を測定する装置 Granted JPS58175451U (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US658182 1976-02-17
US05/658,182 US4023931A (en) 1976-02-17 1976-02-17 Means and method for measuring levels of ionic contamination

Publications (2)

Publication Number Publication Date
JPS58175451U true JPS58175451U (ja) 1983-11-24
JPH0119082Y2 JPH0119082Y2 (ja) 1989-06-02

Family

ID=24640230

Family Applications (2)

Application Number Title Priority Date Filing Date
JP504277A Pending JPS5299894A (en) 1976-02-17 1977-01-21 Measuring apparatus and process for standard of ion contamination
JP1983052770U Granted JPS58175451U (ja) 1976-02-17 1983-04-11 イオン汚染の基準を測定する装置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP504277A Pending JPS5299894A (en) 1976-02-17 1977-01-21 Measuring apparatus and process for standard of ion contamination

Country Status (6)

Country Link
US (1) US4023931A (ja)
JP (2) JPS5299894A (ja)
DE (1) DE2706834C2 (ja)
FR (1) FR2342005A1 (ja)
GB (1) GB1516812A (ja)
NL (1) NL7701496A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004077378A (ja) * 2002-08-21 2004-03-11 Somakkusu Kk 電解洗浄液の劣化測定装置及び該装置を用いた電解洗浄液の劣化度評価方法

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4434233A (en) 1981-03-03 1984-02-28 Carrier Corporation Method of testing oil for ionic contaminants
GB2128335A (en) * 1982-08-13 1984-04-26 Omnium Assets Trust Syndicate Measuring conductivity of a soil sample
JPS59214750A (ja) * 1983-05-20 1984-12-04 Mitsubishi Electric Corp ナトリウムイオン物質濃度の連続モニタ−装置
US4731154A (en) * 1986-06-23 1988-03-15 The Dow Chemical Company Method and apparatus for quantitative measurement of organic contaminants remaining on cleaned surfaces
WO1988004962A1 (en) * 1986-12-24 1988-07-14 Fry Metals Inc. Apparatus and method for determining surface ionic contamination levels of electronic assemblies such as printed circuit assemblies
US4996160A (en) * 1987-06-09 1991-02-26 The Dow Chemical Company Method and apparatus for quantitative measurement of ionic and organic contaminants remaining on cleaned surfaces
US4922205A (en) * 1989-06-08 1990-05-01 Rikagaku Kenkyusho Apparatus for detecting contamination on probe surface
US5359282A (en) * 1990-11-16 1994-10-25 Nichimen Kabushiki Kaisha Plasma diagnosing apparatus
US5201958A (en) * 1991-11-12 1993-04-13 Electronic Controls Design, Inc. Closed-loop dual-cycle printed circuit board cleaning apparatus and method
JPH08211592A (ja) * 1995-02-07 1996-08-20 Nikon Corp 洗浄乾燥方法及び洗浄乾燥装置
DE19607795C2 (de) * 1996-03-01 1999-09-02 Temic Semiconductor Gmbh Verfahren zur Untersuchung von ionischen Verunreinigungen im Innern gemoldeter elektronischer Bauelemente
US6177279B1 (en) * 1998-11-12 2001-01-23 Memc Electronic Materials, Inc. Ion extraction process for single side wafers
US6367679B1 (en) * 2000-06-28 2002-04-09 Advanced Micro Devices, Inc. Detection of flux residue
KR101240333B1 (ko) * 2007-08-24 2013-03-07 삼성전자주식회사 마스크 표면에 흡착된 이온 분석 장치 및 방법
CN101334432B (zh) * 2008-07-10 2010-06-09 广东正业科技有限公司 一种离子污染检测装置
WO2010030505A1 (en) * 2008-09-10 2010-03-18 Austin American Technology Corporation Cleaning and testing ionic cleanliness of electronic assemblies
DE102016113072A1 (de) * 2016-07-15 2018-01-18 Microtronic Produktions Gmbh Kontaminationstester zum Prüfen einer ionischen Kontamination von Leiterplatten

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3366554A (en) * 1964-01-06 1968-01-30 Boeing Co Method for evaluating coating discontinuities
US3490873A (en) * 1965-08-10 1970-01-20 United Aircraft Corp Method and composition for inspecting semiconductor devices
US3459505A (en) * 1965-10-11 1969-08-05 United Carr Inc Method of testing the porosity of coated articles
JPS5221916B2 (ja) * 1972-04-26 1977-06-14
DE2514905A1 (de) * 1974-04-10 1975-10-23 Philips Nv Konduktometrische analyse

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004077378A (ja) * 2002-08-21 2004-03-11 Somakkusu Kk 電解洗浄液の劣化測定装置及び該装置を用いた電解洗浄液の劣化度評価方法

Also Published As

Publication number Publication date
NL7701496A (nl) 1977-08-19
JPS5299894A (en) 1977-08-22
DE2706834C2 (de) 1986-06-19
FR2342005B1 (ja) 1980-11-14
JPH0119082Y2 (ja) 1989-06-02
DE2706834A1 (de) 1977-08-18
US4023931A (en) 1977-05-17
FR2342005A1 (fr) 1977-09-16
GB1516812A (en) 1978-07-05

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