JPS58173257U - semiconductor diode - Google Patents
semiconductor diodeInfo
- Publication number
- JPS58173257U JPS58173257U JP7036082U JP7036082U JPS58173257U JP S58173257 U JPS58173257 U JP S58173257U JP 7036082 U JP7036082 U JP 7036082U JP 7036082 U JP7036082 U JP 7036082U JP S58173257 U JPS58173257 U JP S58173257U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor layer
- layer
- inner diameter
- semiconductor
- metal layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は従来の半導体ダイオードの一例を示す断面図、
第2図は本考案の一実施例を示す断面図である。
1.2・・・・・・半導体層(第1の半導体層)、3・
・・・・・pn接合、4・・・・・・半導体領域、5・
・・・・・電極、6・・・・・・絶縁層、7.・・・・
・・阻止金属層(第2の金属層)、8・・・・・・中間
釜属層(第1の金属層)、11・・・・・・電 、子
ビーム等の高エネルギー照射線。FIG. 1 is a cross-sectional view showing an example of a conventional semiconductor diode.
FIG. 2 is a sectional view showing an embodiment of the present invention. 1.2... Semiconductor layer (first semiconductor layer), 3.
... pn junction, 4 ... semiconductor region, 5.
... Electrode, 6 ... Insulating layer, 7.・・・・・・
. . . Blocking metal layer (second metal layer), 8 . . . Intermediate metal layer (first metal layer), 11 .
Claims (1)
半導体層に部分的に形成され第1の半導体層と共にダイ
オードを構成する第2の導電特性を有する第2の半導体
層と、第1の半導体層の第2の半導体層と同じ側の表面
上でかつ第2の半導体層以外の部分に形成された環状の
絶縁層と、第2の半導゛体層と絶縁層との接触部上に両
者と接触するように形成された環状の第1の金属層と、
この第1の金属層上に形成された環状の第2の金属層と
を備え、第2の半導体層を通して第1の半導′体層内に
照射される電子ビーム等の高エネルギー照射線の照射量
に応じた出力電流が取出せる半導体ダイオードにおいて
、前記第1の金属層の内径を第2の金属層の内径よりも
小さくすると共に、第2の半導体層周縁部に外径が絶縁
層の内径より大きくかつ内径が少なくとも第2の金属層
の内径よりも小さくなるようなガードリングを設けたこ
とを特徴とする半導体ダイオード。a first semiconductor layer having a first conductive property; a second semiconductor layer having a second conductive property, which is partially formed on the first semiconductor layer and forms a diode together with the first semiconductor layer; a ring-shaped insulating layer formed on the same side of the surface of the first semiconductor layer as the second semiconductor layer and in a portion other than the second semiconductor layer; an annular first metal layer formed on the contact portion so as to be in contact with both;
an annular second metal layer formed on the first metal layer; In a semiconductor diode that can extract an output current according to the amount of irradiation, the inner diameter of the first metal layer is made smaller than the inner diameter of the second metal layer, and the outer diameter of the insulating layer is formed at the periphery of the second semiconductor layer. A semiconductor diode comprising a guard ring having an inner diameter larger than the inner diameter and smaller than at least the inner diameter of the second metal layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7036082U JPS58173257U (en) | 1982-05-14 | 1982-05-14 | semiconductor diode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7036082U JPS58173257U (en) | 1982-05-14 | 1982-05-14 | semiconductor diode |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58173257U true JPS58173257U (en) | 1983-11-19 |
JPS6240452Y2 JPS6240452Y2 (en) | 1987-10-16 |
Family
ID=30080035
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7036082U Granted JPS58173257U (en) | 1982-05-14 | 1982-05-14 | semiconductor diode |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58173257U (en) |
-
1982
- 1982-05-14 JP JP7036082U patent/JPS58173257U/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6240452Y2 (en) | 1987-10-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS58173257U (en) | semiconductor diode | |
JPS5936264U (en) | Shock barrier semiconductor device | |
JPH0265359U (en) | ||
JPS5829852U (en) | Zener diode incorporated into semiconductor integrated circuit | |
JPS6099550U (en) | semiconductor equipment | |
JPS58111955U (en) | diode | |
JPS58173249U (en) | high voltage diode | |
JPH0197568U (en) | ||
JPS6113955U (en) | Zener diode incorporated into integrated circuit | |
JPS62118459U (en) | ||
JPS59115651U (en) | semiconductor equipment | |
JPS5981047U (en) | semiconductor element | |
JPS5829850U (en) | Composite semiconductor device | |
JPS5860951U (en) | semiconductor equipment | |
JPS59101449U (en) | semiconductor equipment | |
JPS6139959U (en) | semiconductor equipment | |
JPH0279064U (en) | ||
JPS5866654U (en) | Glass packaging type semiconductor device | |
JPS5974745U (en) | darlington transistor | |
JPS5878472A (en) | Semiconductor device | |
JPS5981046U (en) | darlington transistor | |
JPS6194361U (en) | ||
JPH0351854U (en) | ||
JPS60158755U (en) | Beam lead type shotgun diode | |
JPS60125747U (en) | capacitor |