JPS58170532A - 真空用加熱装置 - Google Patents

真空用加熱装置

Info

Publication number
JPS58170532A
JPS58170532A JP5215282A JP5215282A JPS58170532A JP S58170532 A JPS58170532 A JP S58170532A JP 5215282 A JP5215282 A JP 5215282A JP 5215282 A JP5215282 A JP 5215282A JP S58170532 A JPS58170532 A JP S58170532A
Authority
JP
Japan
Prior art keywords
vacuum
heating
flat plate
sintered body
heater
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5215282A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0327259B2 (cg-RX-API-DMAC7.html
Inventor
Takao Oota
多禾夫 太田
Yuichi Mikata
見方　裕一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP5215282A priority Critical patent/JPS58170532A/ja
Publication of JPS58170532A publication Critical patent/JPS58170532A/ja
Publication of JPH0327259B2 publication Critical patent/JPH0327259B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Resistance Heating (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP5215282A 1982-03-30 1982-03-30 真空用加熱装置 Granted JPS58170532A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5215282A JPS58170532A (ja) 1982-03-30 1982-03-30 真空用加熱装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5215282A JPS58170532A (ja) 1982-03-30 1982-03-30 真空用加熱装置

Publications (2)

Publication Number Publication Date
JPS58170532A true JPS58170532A (ja) 1983-10-07
JPH0327259B2 JPH0327259B2 (cg-RX-API-DMAC7.html) 1991-04-15

Family

ID=12906882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5215282A Granted JPS58170532A (ja) 1982-03-30 1982-03-30 真空用加熱装置

Country Status (1)

Country Link
JP (1) JPS58170532A (cg-RX-API-DMAC7.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62234539A (ja) * 1986-04-04 1987-10-14 Hitachi Ltd 真空処理装置
NL9300458A (nl) * 1992-08-03 1994-03-01 Leybold Ag Inrichting voor het aanbrengen van een bekledingslaag op substraten.

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62234539A (ja) * 1986-04-04 1987-10-14 Hitachi Ltd 真空処理装置
NL9300458A (nl) * 1992-08-03 1994-03-01 Leybold Ag Inrichting voor het aanbrengen van een bekledingslaag op substraten.

Also Published As

Publication number Publication date
JPH0327259B2 (cg-RX-API-DMAC7.html) 1991-04-15

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