JPS58168560U - プラズマcvd装置 - Google Patents
プラズマcvd装置Info
- Publication number
- JPS58168560U JPS58168560U JP6412682U JP6412682U JPS58168560U JP S58168560 U JPS58168560 U JP S58168560U JP 6412682 U JP6412682 U JP 6412682U JP 6412682 U JP6412682 U JP 6412682U JP S58168560 U JPS58168560 U JP S58168560U
- Authority
- JP
- Japan
- Prior art keywords
- discharge field
- plasma
- plasma cvd
- cvd equipment
- plasma discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6412682U JPS58168560U (ja) | 1982-04-30 | 1982-04-30 | プラズマcvd装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6412682U JPS58168560U (ja) | 1982-04-30 | 1982-04-30 | プラズマcvd装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58168560U true JPS58168560U (ja) | 1983-11-10 |
| JPS6140771Y2 JPS6140771Y2 (enExample) | 1986-11-20 |
Family
ID=30074174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6412682U Granted JPS58168560U (ja) | 1982-04-30 | 1982-04-30 | プラズマcvd装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58168560U (enExample) |
-
1982
- 1982-04-30 JP JP6412682U patent/JPS58168560U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6140771Y2 (enExample) | 1986-11-20 |
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