JPS58167771A - 腐蝕液の制御方法 - Google Patents
腐蝕液の制御方法Info
- Publication number
- JPS58167771A JPS58167771A JP57048975A JP4897582A JPS58167771A JP S58167771 A JPS58167771 A JP S58167771A JP 57048975 A JP57048975 A JP 57048975A JP 4897582 A JP4897582 A JP 4897582A JP S58167771 A JPS58167771 A JP S58167771A
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- etching
- tank
- iron
- corrosive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 61
- 238000000034 method Methods 0.000 title claims abstract description 46
- 238000005530 etching Methods 0.000 title abstract description 20
- 229910052742 iron Inorganic materials 0.000 claims abstract description 45
- 238000006243 chemical reaction Methods 0.000 claims abstract description 24
- 239000000956 alloy Substances 0.000 claims abstract description 22
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 21
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 95
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 39
- 238000005260 corrosion Methods 0.000 claims description 33
- 230000007797 corrosion Effects 0.000 claims description 32
- 238000005286 illumination Methods 0.000 claims 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 claims 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 abstract description 27
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 abstract description 27
- 239000000463 material Substances 0.000 abstract description 25
- 230000005484 gravity Effects 0.000 abstract description 5
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 abstract 1
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 description 13
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 11
- 230000007423 decrease Effects 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 11
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 5
- 229910001374 Invar Inorganic materials 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- 239000011295 pitch Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 239000002023 wood Substances 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- -1 amber materials Chemical compound 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N ferric oxide Chemical compound O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 238000006386 neutralization reaction Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 101100388291 Arabidopsis thaliana DTX49 gene Proteins 0.000 description 1
- 101100388296 Arabidopsis thaliana DTX51 gene Proteins 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 101100268840 Danio rerio chrna1 gene Proteins 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 1
- 229910020101 MgC2 Inorganic materials 0.000 description 1
- 101150065731 NIC1 gene Proteins 0.000 description 1
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- PWHVEHULNLETOV-UHFFFAOYSA-N Nic-1 Natural products C12OC2C2(O)CC=CC(=O)C2(C)C(CCC2=C3)C1C2=CC=C3C(C)C1OC(O)C2(C)OC2(C)C1 PWHVEHULNLETOV-UHFFFAOYSA-N 0.000 description 1
- 229910018499 Ni—F Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 210000001177 vas deferen Anatomy 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
- H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/28—Acidic compositions for etching iron group metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57048975A JPS58167771A (ja) | 1982-03-29 | 1982-03-29 | 腐蝕液の制御方法 |
| US06/479,849 US4472236A (en) | 1982-03-29 | 1983-03-28 | Method for etching Fe-Ni alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57048975A JPS58167771A (ja) | 1982-03-29 | 1982-03-29 | 腐蝕液の制御方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58167771A true JPS58167771A (ja) | 1983-10-04 |
| JPS6337192B2 JPS6337192B2 (en, 2012) | 1988-07-25 |
Family
ID=12818258
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57048975A Granted JPS58167771A (ja) | 1982-03-29 | 1982-03-29 | 腐蝕液の制御方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US4472236A (en, 2012) |
| JP (1) | JPS58167771A (en, 2012) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1204143A (en) * | 1982-08-27 | 1986-05-06 | Kanemitsu Sato | Textured shadow mask |
| JPS60200985A (ja) * | 1984-03-26 | 1985-10-11 | Toshiba Corp | シヤドウマスクの製造方法 |
| US4747907A (en) * | 1986-10-29 | 1988-05-31 | International Business Machines Corporation | Metal etching process with etch rate enhancement |
| DE3740381A1 (de) * | 1987-11-27 | 1989-06-08 | Siemens Ag | Aetzverfahren fuer nickel |
| JPH02148690U (en, 2012) * | 1989-05-18 | 1990-12-18 | ||
| US5227010A (en) * | 1991-04-03 | 1993-07-13 | International Business Machines Corporation | Regeneration of ferric chloride etchants |
| US5456795A (en) * | 1993-05-20 | 1995-10-10 | Canon Kabushiki Kaisha | Method and apparatus for regenerating etching liquid |
| US5863681A (en) * | 1996-09-19 | 1999-01-26 | Wickeder Westgalenstahl Gmbh | Composite shadow mask |
| US5718874A (en) * | 1996-12-19 | 1998-02-17 | Thomson Consumer Electronics, Inc. | Solvent extraction method of separating ferric chloride from nickel chloride |
| US5795492A (en) * | 1997-04-30 | 1998-08-18 | Vlsi Technology, Inc. | Etching metals using chlorine gas and hydrochloric gas in de-ionized water |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54158342A (en) * | 1978-06-05 | 1979-12-14 | Sumitomo Metal Mining Co | Etching iron alloy |
-
1982
- 1982-03-29 JP JP57048975A patent/JPS58167771A/ja active Granted
-
1983
- 1983-03-28 US US06/479,849 patent/US4472236A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US4472236A (en) | 1984-09-18 |
| JPS6337192B2 (en, 2012) | 1988-07-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS58167771A (ja) | 腐蝕液の制御方法 | |
| JP2008174768A (ja) | 石炭・鉱石運搬船ホールド用耐食性鋼材 | |
| WO2011004789A1 (ja) | 銅含有材料のウエットエッチングシステム及びパターニング方法 | |
| US4514270A (en) | Process for regenerating cleaning fluid | |
| JPH10325508A (ja) | ボイラの運転方法並びに亜硫酸系脱酸素剤の注入方法およびその組成物 | |
| JPH05106065A (ja) | アルミニウム用エツチング液およびエツチング方法並びにアルミニウムエツチング製品 | |
| CN1109121C (zh) | 超薄不锈钢箔 | |
| JP2005220394A (ja) | 耐海水鋼 | |
| JP2003120904A (ja) | 蒸気ボイラ装置用水処理剤 | |
| JP2007277616A (ja) | 耐食性に優れた原油タンク底板用鋼材 | |
| KR19990072736A (ko) | 고강력스테인레스강의새로운용도 | |
| CN102575329B (zh) | 处理甲磺酸水溶液的方法 | |
| JPH0328400A (ja) | アルミニウム基材からコーティングを剥離するための電解方法及び浴 | |
| US4431447A (en) | Corrosion resistant weld overlay cladding alloy and weld deposit | |
| US4358353A (en) | Method for extending cathode life | |
| US4046655A (en) | Process for electrolytically purifying a photographic developer waste solution | |
| KR890002845B1 (ko) | 새도우 마스크의 제조방법 | |
| US10156789B2 (en) | Method for stripping resist film from metal plate and method for manufacturing etched metal plate | |
| JPS5924849A (ja) | フオトマスクの洗浄方法 | |
| JPH0379779A (ja) | 塩化第二鉄エッチング液の再生方法 | |
| US3766019A (en) | MgCO{11 {11 ADDITION TO CaSO{11 {11 CONTAINING SEA WATER TO PREVENT CORROSION | |
| US4470890A (en) | Method for preventing cathode corrosion | |
| JP4843403B2 (ja) | 油類貯蔵容器用耐食鋼材およびその製造方法ならびに油類貯蔵容器 | |
| JPS61149485A (ja) | エツチング装置 | |
| JP3083992B2 (ja) | コンクリートからの白濁析出物の除去方法および装置 |