JPS58164777A - 金属化合物被膜の形成方法 - Google Patents

金属化合物被膜の形成方法

Info

Publication number
JPS58164777A
JPS58164777A JP4571082A JP4571082A JPS58164777A JP S58164777 A JPS58164777 A JP S58164777A JP 4571082 A JP4571082 A JP 4571082A JP 4571082 A JP4571082 A JP 4571082A JP S58164777 A JPS58164777 A JP S58164777A
Authority
JP
Japan
Prior art keywords
substrates
vessel
plates
substrate
metal compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4571082A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0246668B2 (cs
Inventor
Takeshi Yasui
安井　毅
Masahiko Hirose
広瀬　昌彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP4571082A priority Critical patent/JPS58164777A/ja
Publication of JPS58164777A publication Critical patent/JPS58164777A/ja
Publication of JPH0246668B2 publication Critical patent/JPH0246668B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP4571082A 1982-03-24 1982-03-24 金属化合物被膜の形成方法 Granted JPS58164777A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4571082A JPS58164777A (ja) 1982-03-24 1982-03-24 金属化合物被膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4571082A JPS58164777A (ja) 1982-03-24 1982-03-24 金属化合物被膜の形成方法

Publications (2)

Publication Number Publication Date
JPS58164777A true JPS58164777A (ja) 1983-09-29
JPH0246668B2 JPH0246668B2 (cs) 1990-10-16

Family

ID=12726901

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4571082A Granted JPS58164777A (ja) 1982-03-24 1982-03-24 金属化合物被膜の形成方法

Country Status (1)

Country Link
JP (1) JPS58164777A (cs)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5953837U (ja) * 1982-09-27 1984-04-09 光洋機械産業株式会社 セメントペ−スト用のミキサ−
JPS6328871A (ja) * 1986-07-22 1988-02-06 Toshiba Corp プラズマｃｖｄ処理装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53118235A (en) * 1977-03-23 1978-10-16 Vide & Traitement Sa Plural cathode thermoion treatment furnace

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53118235A (en) * 1977-03-23 1978-10-16 Vide & Traitement Sa Plural cathode thermoion treatment furnace

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5953837U (ja) * 1982-09-27 1984-04-09 光洋機械産業株式会社 セメントペ−スト用のミキサ−
JPS6328871A (ja) * 1986-07-22 1988-02-06 Toshiba Corp プラズマｃｖｄ処理装置

Also Published As

Publication number Publication date
JPH0246668B2 (cs) 1990-10-16

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