JPS58155628A - Holding structure of shadow mask - Google Patents

Holding structure of shadow mask

Info

Publication number
JPS58155628A
JPS58155628A JP3792282A JP3792282A JPS58155628A JP S58155628 A JPS58155628 A JP S58155628A JP 3792282 A JP3792282 A JP 3792282A JP 3792282 A JP3792282 A JP 3792282A JP S58155628 A JPS58155628 A JP S58155628A
Authority
JP
Japan
Prior art keywords
surface roughness
panel
rmax
panel pin
shadow mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3792282A
Other languages
Japanese (ja)
Other versions
JPH0337259B2 (en
Inventor
Masaharu Kanto
関東 正治
Hisato Kihara
木原 久人
Seiichiro Okura
大倉 誠一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP3792282A priority Critical patent/JPS58155628A/en
Publication of JPS58155628A publication Critical patent/JPS58155628A/en
Publication of JPH0337259B2 publication Critical patent/JPH0337259B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/06Screens for shielding; Masks interposed in the electron stream
    • H01J29/07Shadow masks for colour television tubes
    • H01J29/073Mounting arrangements associated with shadow masks

Landscapes

  • Electrodes For Cathode-Ray Tubes (AREA)

Abstract

PURPOSE:To improve positional reproducibility and to obtain a color picture tube of good quality by a method wherein surface roughness of a surrounding wall and a panel pin of a spring material catching hole part is prescribed while applying carbon fine powder to the panel pin. CONSTITUTION:Basing on an idea that positional reproducibility of a shadow mark can be improved and landing due to impact can be reduced, by applying carbon fine powder together with, for instance, water glass to a panel pin even when surface roughness of the panel pin is fairly large, surface roughness Rmax of the panel pin is varied from 25mu to 23mu, carbon powder is applied and thereto surface roughness Rmax of the surrouding wall of a catching hole part is varied as 0.3mu, 0.5mu, 0.5mu in order to find distance between the shadow mask and the glass panel before and after formation of black stripes, so to say variation of (q) value thus to obtain a broken line graph 16, which shows landing variation represented by the broken line graphs 14, 15 and impact of 50G. In said broken line graphs, roughness of the panel pin is 10mu-20mu at Rmax while surface roughness of the surounding wall of the catching hole part is not more than 0.5mu at Rmax under the highest condition.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明はシャドウマスクの支持機構に係ヤ、籍にパネル
ビンと、このパネルビンに嵌合スルスフリング片の係止
孔部の周壁の表面粗度を規定することにより、パネルガ
ラス内1111iK極めて品位の良好なI[IiI像を
再現することが可能なシャドウマスクの支持機構に関す
るものである。
[Detailed Description of the Invention] [Technical Field of the Invention] The present invention relates to a support mechanism for a shadow mask, and specifically defines the surface roughness of a peripheral wall of a locking hole portion of a panel bin and a Slus Fring piece that fits into the panel bin. This invention relates to a shadow mask support mechanism that can reproduce an extremely high-quality I[IiI image within a panel glass.

〔発明の技術的背景〕[Technical background of the invention]

カラー受像管はパネルガラス内面に被着形成され九ブラ
ックストライプ及び赤、縁、實各色に発光するストライ
プ状の螢光体層からなる螢光面に所定間隔をもって対設
されるシャドウマスクは通常この/ヤドウマスクのスカ
ート部を支持するマスクフレームに固定されたシャドウ
マスク支持構体のスプリング片の遊端部近傍に穿設され
た係止孔部をパネルガラスの側壁部内面に植設され九7
8ネルビンに嵌合させるようになっている。
Color picture tubes are formed on the inner surface of the panel glass, and usually have a shadow mask that is placed opposite to the phosphor surface at a predetermined distance from a phosphor layer consisting of nine black stripes, a stripe-shaped phosphor layer that emits light in each color, red, and red. / A locking hole drilled near the free end of a spring piece of a shadow mask support structure fixed to a mask frame that supports a skirt portion of a Yado mask is implanted into the inner surface of a side wall of a panel glass.97
It is designed to fit into 8 Nelvin.

このようなカラー受像管の2例を#!1図及び第2図に
より説明する。
Here are two examples of such color picture tubes! This will be explained with reference to FIGS. 1 and 2.

即ち、第1図のものは・ぞネルガラス(1)の内面に被
着形成された赤、縁、青各色に発光する螢光体層からな
る螢光面(2)K所定間隔をもって対設されるシャドウ
マスク(3)はこのシャドウマスク(3)のスカート部
を支持するマスクフレーム(4)に固定されたバイメタ
ル(5)スプリング片(6)からなる7ヤドウマスク支
持構体のスプリング片(6)の道端部近傍に穿設され丸
係止孔部(6畠)をパネルガラス(1)の匈壁部(11
)の内面に植設されたパネルビン(7)K嵌合するよう
になっている。図においてに)印は溶接点である。
That is, the one in Fig. 1 has fluorescent surfaces (2) K consisting of phosphor layers that emit light in red, edge, and blue colors adhered to the inner surface of the channel glass (1), which are arranged oppositely at a predetermined distance. The shadow mask (3) consists of a bimetallic (5) spring piece (6) fixed to a mask frame (4) that supports the skirt portion of this shadow mask (3). The circular locking holes (6 holes) drilled near the roadside are connected to the wall section (11) of the panel glass (1).
) is designed to fit into the panel bin (7)K installed on the inner surface of the panel bin (7)K. In the figure, the ) marks are welding points.

また第2図のものは、シャドウマスク支持構体として熱
崖張係数の異なる2枚の金層を幅方向で溶接したいわゆ
るラテラルバイメタルをそのままスプリング片(6)と
したものであ)、このスプリング片(6)の係止孔部(
6a)を・パネルビン(7)に嵌合するようになってい
る。他は第1図と#1ぼ同一であるので説明は省略する
The one in Figure 2 is a shadow mask support structure in which a so-called lateral bimetal, in which two gold layers with different thermal tensile coefficients are welded in the width direction, is used as a spring piece (6). (6) Locking hole (
6a) is adapted to fit into the panel bin (7). Since the other parts are the same as those in FIG. 1, the explanation will be omitted.

前述し九スプリング片(6)の特に係止孔部(6m)と
パネルビン(7)との嵌合部は第3図に示すようになっ
ており、パネルビン(7)は微量の添加元素を含む18
*Cr  reを所定の層状に加工し九のち、ホーニン
グ加Tを行ない表面粗度を大きくシ、その後、1200
℃の湿水素中で酸化処理を行ない最終的にはRmax 
O,5〜10μの表面粗度にし、熱処理を行ない便用し
ている。
The above-mentioned nine spring pieces (6), especially the fitting part between the locking hole (6m) and the panel bottle (7), are shown in Fig. 3, and the panel bottle (7) contains a small amount of additive elements. 18
*After processing Cr re into a predetermined layer, honing is performed to greatly increase the surface roughness, and then 1200
Oxidation treatment is performed in wet hydrogen at ℃, and finally Rmax
The surface roughness is 0.5 to 10 μm, and heat treatment is performed for convenient use.

パネルビン(刀の表面粗度をこのような値にしているの
は・ξネルピン(7)の場合、パネルガラス(1)のM
壁部(11)に41設するためにガラスとの接触界面を
広くしガラスとの接層強度を向上させるためである。
Panel bottle (The reason why the surface roughness of the sword is set to this value is ξNelpin (7), M of the panel glass (1)
This is to widen the contact interface with the glass and improve the contact strength with the glass since 41 are provided on the wall portion (11).

一方スノリング片(6)の係止孔部(61)の周壁はタ
ンプリング加1の経済性を考慮して適当な表向粗度にな
されている。
On the other hand, the peripheral wall of the locking hole (61) of the snoring piece (6) is made to have an appropriate surface roughness in consideration of the economic efficiency of tampling.

〔背It4il術の問題点〕 しかるにこのような、P:ネルビン(力とスプリング片
(6)の係止孔部(6m)を嵌合させると接触部(8)
の摩擦が大きいため、パネルガラス(1)内面に光吸収
層や螢元捧層を被着形成する場合、装着前後のシャドウ
マスク(3)位置に変化が生じ、いわゆる位置書埃性が
悪くなる。その結果、カラー受像管としては電子ビーム
のきスランデイングを生じる一要因となりホワイトユニ
フオミテイ(WU)を低下させる間亀点があった、 〔発明の目的〕 本発明は前記従来の問題点に鑑みなされたものであり、
スプリング材の係止孔部の周壁及びパネルビンの表向粗
度を規矩すると共にパネルビンにカーボンの微粉末を被
着形成することKよって位t1再塊性を良好にし、品位
の良好なカラー受像管を得ることがOT能なシャドウマ
スクの支持機構を提供することを目的としている。
[Problems with the back It4il technique] However, when the locking hole (6m) of the spring piece (6) is fitted with the P:Nelvin (force), the contact part (8)
Because of the large friction, when a light absorbing layer or a fluorocarbon layer is deposited on the inner surface of the panel glass (1), the position of the shadow mask (3) changes before and after installation, which worsens the so-called positional dust resistance. . As a result, as a color picture tube, there was a problem in that it became one of the causes of slanting of the electron beam and lowered the white uniformity (WU). This was done in consideration of the
By regulating the surface roughness of the peripheral wall of the locking hole portion of the spring material and the panel bin, and by coating the panel bin with fine carbon powder, the re-agglomeration property is improved and the color picture tube is of good quality. The object of the present invention is to provide a support mechanism for a shadow mask that can be over-the-counter.

〔発明の概要〕[Summary of the invention]

即ち、本発明は・ぞネルガラス内面に植設された複数個
のペネルビンにシャドウマス〉を支持するマスクフレー
ムに取付は九スプリング片の道端部近傍の係止孔部を嵌
合させるようになされたシャドウマスクの支持81柳に
おいて、・ぞネルピンの表向粗度Rmaxを10乃至2
0#、係止孔部の周壁の表面粗度Rmaxを0.5以下
とし、かつパネル270表面にカーボンの微粉末を被着
形成してなることを特徴としている。
That is, in the present invention, the mask frame supporting the shadow mass is attached to a plurality of penel bins embedded in the inner surface of the channel glass by fitting the locking holes near the end of the nine spring pieces. In the shadow mask support 81 willow, the surface roughness Rmax of the nelpin is set to 10 to 2.
0#, the surface roughness Rmax of the peripheral wall of the locking hole is 0.5 or less, and fine carbon powder is deposited on the surface of the panel 270.

〔発明の実施例〕[Embodiments of the invention]

発明者らは26インチioo’偏向のカラー受像管を便
用して椎々の実験を行なった。
The inventors conducted a series of experiments using a 26 inch ioo' deflection color picture tube.

先ずパネルビンの表面粗度をRmaxで23μ、18μ
First, the surface roughness of the panel bin is set to Rmax of 23μ and 18μ.
.

12μ、7μ、2.5μと変化させ、また係止孔部の周
壁の表向粗度をRmaxで0.7μ、0.5μ、0.3
μと変化させた時の例えばプフツクストライプ形成前体
のシャドウマスクとガラスパネル間の間隔、いわゆるq
値の変化を求めたところ第4図の折−曲Hun Lll
l U4が得られた。この結果から判断すると・パネル
ビン、係止孔部の周壁のいずれも表向粗度が小さい程、
レリえばノミネルガラス内面に光吸収)−を板層形成さ
せる前後のq im変化を少なくすることがOr症であ
ることがわかる。
12μ, 7μ, 2.5μ, and the surface roughness of the peripheral wall of the locking hole Rmax was 0.7μ, 0.5μ, 0.3
For example, when changing μ, the distance between the shadow mask of the Puftsk stripe formation precursor and the glass panel, so-called q
When the change in value was calculated, the bend in Figure 4 was found.
lU4 was obtained. Judging from this result, the smaller the surface roughness of both the panel bin and the surrounding wall of the locking hole, the
It can be seen that Or disease is caused by reducing the change in q im before and after forming a plate layer of light absorption) on the inner surface of the Nominelle glass.

次に第4図においてq値の最大のものと最小のもの節ち
・・ネルピンの表面粗度がRmaxで23μのものと保
止孔部の嵐壁の表面粗度がnmaxで0.7μのものを
1史用して組立てたカラー受像管と、バネルビ、ンの衣
tim度がRmaxで2.5μのものと係止孔部の周壁
の表向粗度がRmaxで0.3μのものを使用して組立
てたカラー受像管とを各50個便用し、′−電子ビーム
ランディングばらつきを実際Kl#111定した結果、
1者では30.5岸であったものが後者では21.0μ
と約1/3減少することがゎかっ友。
Next, in Fig. 4, the maximum and minimum q values are shown: the surface roughness of the nelpin is Rmax of 23μ, and the surface roughness of the storm wall at the retaining hole is nmax of 0.7μ. A color picture tube assembled by using one color picture tube, one with a coating thickness Rmax of 2.5μ, and one with a surface roughness Rmax of 0.3μ of the peripheral wall of the locking hole. As a result of using 50 color picture tubes and assembling them, we actually determined the variation in electron beam landing using Kl#111.
What was 30.5μ for the first party was 21.0μ for the latter.
It's great that it decreases by about 1/3.

このようにシャドウマスク支持構体の支持中心部である
パネルピンと係止孔sm壁の表面粗度を小さくすること
により、シャドウマスクの位置再現性は向上し、カラー
受儂管にしたときの電子ビームのランディング特性を向
上させることが出来る、しかし、このような表面粗度の
小さいパネルピンと保止孔部の周壁の組合せによって製
作したカラー受1蒙管を譬としての各m試験を行なった
ところ、落下試験すなわち衝*によってランディング変
化が大きくなることがわかった。即ち従来50Gの衝撃
で約50声あったものが前述した組合せでは約60μと
変化量が大きくなる現象がある。この原因は表面粗度が
小さいもの同志の鎖着にょ抄洛下賦験時回転がよくなり
、スプリング片などに微少な変形を起すためと考えられ
る。
In this way, by reducing the surface roughness of the panel pin, which is the support center of the shadow mask support structure, and the wall of the locking hole sm, the position reproducibility of the shadow mask is improved, and the electron beam when used as a color receiver tube is improved. However, when we conducted various tests using a collar receiver made from a combination of a panel pin with a small surface roughness and a peripheral wall of the retaining hole, we found that It was found that the drop test, that is, the impact*, increased the landing change. That is, there is a phenomenon in which the amount of change increases from about 50 tones in the conventional shock of 50G to about 60μ in the above-mentioned combination. The reason for this is thought to be that when the surface roughness is small, the rotation of the comrades becomes better during the chain attachment, causing slight deformation in the spring pieces, etc.

そこで発明佇らは撞々な検討を卯えた結果、予め、バネ
ルビ/にカーボンの微粉末を例えば水ガラスなどと共に
塗布するととKより・七ネルピンの表向粗度が、かなり
大きくてもシャドウマスクの位置再現性が向上し、かつ
衝撃によるランディングも少なく出来るとの考えを基に
して、パネルピンの表面粗[Rmaxで25声乃至23
μと変化させ、カーボンの微粉末を塗布し、これに係止
孔部の周壁の表1粗f Rmmxで0.3声、0.5μ
、α5μと変化させブラックストライプ形成前後のq値
の変化を求め第5図に示す折線グラフI(19及び50
Gの衝撃によるランディング変化を求め第5図による折
線グラフ四を得九。
As a result of extensive research, Inventor and Co., Ltd. have found that if fine carbon powder is applied to Banelvin in advance along with water glass, etc., even if the surface roughness of Nelpin is considerably large, it becomes a shadow mask. Based on the idea that the position repeatability of the panel pins can be improved and the landing caused by impact can be reduced, the surface roughness of the panel pins [from 25 to 23 pitches in Rmax] has been improved.
Apply fine carbon powder to the surface of the peripheral wall of the locking hole.
, α5μ, and the change in q value before and after the formation of black stripes was calculated using the line graph I (19 and 50) shown in Figure 5.
Find the landing change due to G impact and obtain the line graph 4 according to Figure 5.

この折蝕グラフa□41−及び(IIから得られること
は、係止孔部の周壁の表面粗度が0.3μ、0.5μの
場合にはブラックストライプ形成時のq値変化量が、J
ネルビンの表面粗度はRmaxで18β以上において次
第に増加する。この場合Rmmxで20声までは充分使
用できるが0.7μの場合には18声以上で急に変化量
が増化しはじめ20μでは規格はずれになるし、また5
0Gの衝撃試験によるランディング変化量し0.3μ、
0.5μ、0,7μともに7ぞネルビンの表面粗度12
声附近から多くなるが10βでは規格内に入っている。
What can be obtained from the erosion graphs a□41- and (II) is that when the surface roughness of the peripheral wall of the locking hole is 0.3μ and 0.5μ, the amount of change in q value when forming black stripes is J
The surface roughness of Nelvin gradually increases when Rmax is 18β or more. In this case, with Rmmx, up to 20 voices can be used satisfactorily, but with 0.7 μ, the amount of change will suddenly increase at 18 voices or more, and with 20 μ, it will be out of specification, and with 5
The amount of landing change due to 0G impact test was 0.3μ,
Both 0.5μ and 0.7μ are 7.Nelvin surface roughness is 12.
It increases from the vicinity of the voice, but it is within the standard at 10β.

即ちパネルピンの表面粗度はRmaxで104乃至20
μ、係止孔部の周壁の表向粗度はRmaxで0.5声以
下が最為の条件となっている。
In other words, the surface roughness of the panel pin is Rmax 104 to 20.
μ, the surface roughness of the peripheral wall of the locking hole Rmax is 0.5 tones or less, which is the optimum condition.

〔発明の効果〕〔Effect of the invention〕

上述のようにパネルピンO表面粗度を8μmaxで10
声乃至20μ、係止孔部の周撞の表面粗度をRmaxで
0.5以下にし、かつパネルピンにカーボンの微粉末を
塗布することによ委、9値の変化も少なく、ミスランデ
ィング変化、特に負零試験価のミスランディング変化も
少ない品位の喪好なカラー受儂管を得ることが1ITi
@となつ九。
As mentioned above, the surface roughness of the panel pin O is 8μmax and 10
By setting the surface roughness of the circumference of the locking hole to 0.5 or less at Rmax and applying fine carbon powder to the panel pin, the change in the 9 value is small, and the change in mislanding is reduced. In particular, it is important to obtain a high-quality color-receiving tube with little negative zero test value mislanding change.
@tonatsuku.

【図面の簡単な説明】[Brief explanation of drawings]

第1図及び第2図はそれぞれ異なるシャドり!スフ支持
構体を有するカラー受惨管の要部断面図、第3図はスプ
リング片の係止孔部と・ぞネルビンの関係を示す要部断
面図、第4図は/セネルピン表向粗度、係止孔部の表面
粗度及びq値変化の関係を示す折線図、第5図はパネル
ピンにカーボンの微粉末を像層形成したときのパネルピ
ンの表面粗度と係止孔部の周壁の表面粗度及びブラック
ストライプ形成前後のq値変化を示す折線図、第6図は
パネルピンにカーボンの微粉末を被着形成し九ときの/
ぞネルビンの表向粗度と、係止孔部の周壁の表向粗度及
び50Gの負零によるランディング変化を示す折線図で
ある。 1・・・カラス・七ネル   2・・・螢光面3・・・
シャドウマスク  4・−・マスクフレーム5・・・バ
イメタル    6・・・スプリング片6m・・・係止
孔部    7・・・パネルピン代理人 弁理士 井 
上 −男 第1図 第2図 第3図 第4図
Figures 1 and 2 have different shadows! Fig. 3 is a cross-sectional view of the main part of the collar tube having a sufu support structure, Fig. 3 is a cross-sectional view of the main part showing the relationship between the locking hole of the spring piece and the channel nelvin, and Fig. 4 is the surface roughness of the /senel pin. A line diagram showing the relationship between the surface roughness of the locking hole and the change in q value. Figure 5 shows the surface roughness of the panel pin and the surface of the peripheral wall of the locking hole when an image layer of fine carbon powder is formed on the panel pin. A line diagram showing roughness and changes in q value before and after the formation of black stripes.
FIG. 3 is a line diagram showing the surface roughness of the groove, the surface roughness of the peripheral wall of the locking hole portion, and the landing change due to a negative zero of 50G. 1...Crow/Nananel 2...Fluorescent surface 3...
Shadow mask 4... Mask frame 5... Bimetal 6... Spring piece 6m... Locking hole portion 7... Panel pin agent Patent attorney I
Top - Male Figure 1 Figure 2 Figure 3 Figure 4

Claims (2)

【特許請求の範囲】[Claims] (1)  /#ネルガラス内11に植設されえ複数個の
パネルビンにシャドウマスタ*支持fhqxlyv −
ムに取付は九スプリング片O遊端部近傍O係止孔部を嵌
合させるようになされえシャドウマスクの支持機構にお
いて、前記パネルピンO表面粗度Bmaxを10乃至2
0s1係止孔部O周壁011−粗度Rmaxを0.5声
以下とし、かつ前記・セネルピン011面にカーボンの
微粉末を被着形成してなることを特徴とするシャドウマ
スクの支持機構。
(1) /#Shadow master *support fhqxlyv − in multiple panel bins that can be planted in the flannel glass 11
In the shadow mask support mechanism, the surface roughness Bmax of the panel pin O is set to 10 to 2.
0s1 Locking hole O peripheral wall 011 - Roughness Rmax is set to 0.5 tones or less, and fine carbon powder is deposited on the Senel pin 011 surface.A support mechanism for a shadow mask.
(2)  カーボンの微粉末の形成がこのカーボンO黴
持機構。
(2) Formation of fine carbon powder is the carbon O mold retention mechanism.
JP3792282A 1982-03-12 1982-03-12 Holding structure of shadow mask Granted JPS58155628A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3792282A JPS58155628A (en) 1982-03-12 1982-03-12 Holding structure of shadow mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3792282A JPS58155628A (en) 1982-03-12 1982-03-12 Holding structure of shadow mask

Publications (2)

Publication Number Publication Date
JPS58155628A true JPS58155628A (en) 1983-09-16
JPH0337259B2 JPH0337259B2 (en) 1991-06-05

Family

ID=12511032

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3792282A Granted JPS58155628A (en) 1982-03-12 1982-03-12 Holding structure of shadow mask

Country Status (1)

Country Link
JP (1) JPS58155628A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5180322A (en) * 1990-08-22 1993-01-19 Dainippon Screen Mfg. Co., Ltd. Manufacturing process of shadow mask and shadow mask plate therefor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5180322A (en) * 1990-08-22 1993-01-19 Dainippon Screen Mfg. Co., Ltd. Manufacturing process of shadow mask and shadow mask plate therefor

Also Published As

Publication number Publication date
JPH0337259B2 (en) 1991-06-05

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