JPS581500B2 - shadow mask - Google Patents

shadow mask

Info

Publication number
JPS581500B2
JPS581500B2 JP49032659A JP3265974A JPS581500B2 JP S581500 B2 JPS581500 B2 JP S581500B2 JP 49032659 A JP49032659 A JP 49032659A JP 3265974 A JP3265974 A JP 3265974A JP S581500 B2 JPS581500 B2 JP S581500B2
Authority
JP
Japan
Prior art keywords
shadow mask
bridge
effective surface
hole
holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49032659A
Other languages
Japanese (ja)
Other versions
JPS50126373A (en
Inventor
安留修
藤原優
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP49032659A priority Critical patent/JPS581500B2/en
Publication of JPS50126373A publication Critical patent/JPS50126373A/ja
Publication of JPS581500B2 publication Critical patent/JPS581500B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 本発明は、シャドウマスクの特に有効面の変形を防止す
るように改良したものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention is an improvement that prevents deformation of the shadow mask, especially the effective surface.

従来のシャドウマスク1は第1図a及び第1図bに示す
ように矩形状の有効面2に長方形状の多数の透孔3が設
けられている。
As shown in FIGS. 1a and 1b, a conventional shadow mask 1 has a rectangular effective surface 2 and a large number of rectangular through holes 3.

この長方形状の透孔3は従来の丸孔に比して電子ビーム
透過率が高いので明るい画面が得られるという特徴を持
っている。
This rectangular through hole 3 has a characteristic that it has a higher electron beam transmittance than a conventional round hole, so that a bright screen can be obtained.

しかし一方ではその機械的強度が弱いので有効面2が第
2図に示すようにその一部が変形を起すという不都合が
起る。
However, on the other hand, since its mechanical strength is weak, a disadvantage arises in that a part of the effective surface 2 is deformed as shown in FIG.

この現象は特に有効面の周辺にのみ発生する。This phenomenon particularly occurs only around the effective surface.

この原因を調べてみると長形状の透孔の長手方向に配列
された透孔3と透孔3との間のブリッジ4の機械的強度
が極端に弱いためである。
The reason for this is that the mechanical strength of the bridges 4 between the through holes 3 arranged in the longitudinal direction of the elongated through holes is extremely weak.

従ってこの部分がネックとなって変形が起る。Therefore, this part becomes a bottleneck and deformation occurs.

さてこのシャドウマスクと組合される螢光面は第3図に
示すようにこのシャドウマスクの長手力向に連続して形
成されたストライプ状の螢光体5R,5G,5Bによる
螢光面6が形成される。
Now, as shown in FIG. 3, the fluorescent surface combined with this shadow mask is a fluorescent surface 6 made up of striped phosphors 5R, 5G, and 5B formed continuously in the longitudinal direction of this shadow mask. It is formed.

この螢光面6の形成は当然組合される上記シャドウマス
ク1によって形成されるのである。
Naturally, the fluorescent surface 6 is formed by the shadow mask 1 that is combined with the shadow mask 1.

そこで次の点を考慮しなければならない。Therefore, the following points must be considered.

即ち、上記ブリッジ4の幅を広くすると、螢光面の形成
の際、このブリッジ部分が周知のように露光の際に影と
なってしまって第4図に示すようにそのストライプ状螢
光体5Rが部分的にくびれ7を生じて正常なストライプ
が形成されなくなる。
That is, if the width of the bridge 4 is widened, when forming a phosphor surface, this bridge portion becomes a shadow during exposure as is well known, and as shown in FIG. 5R is partially constricted 7 and normal stripes cannot be formed.

そのため電子ビームのランデイング等に対して好ましく
ない結果を招く。
This results in unfavorable results regarding the landing of the electron beam.

したがって、上記ブリッジ4は螢光面の形成或いは電子
ビームの透過率を向上させて明るい画面を得るため等に
対しては不用とするか又は極めて狭くすることが好適で
ある。
Therefore, it is preferable that the bridge 4 is unnecessary or made extremely narrow for purposes such as forming a fluorescent surface or improving electron beam transmittance to obtain a bright screen.

しかし、上記シャドウマスクの有効面は、螢光面の形成
されているパネル面に合致させるために所定曲率を持っ
て湾曲される。
However, the effective surface of the shadow mask is curved with a predetermined curvature in order to match the panel surface on which the fluorescent surface is formed.

これは通常プレスによって成形されるが、その際ブリッ
ジ変形いわゆる伸びが生ずる。
This is usually formed by pressing, during which bridging deformation, so-called elongation, occurs.

特に機械的強度を必要とする有効面の周面が中央部に比
べて変形が太きい。
In particular, the peripheral surface of the effective surface, which requires mechanical strength, is more deformed than the central portion.

これは透孔を有する有効部と透孔のない非有効部との機
械的強度の差による。
This is due to the difference in mechanical strength between the effective part with through holes and the ineffective part without through holes.

なお、マスクの機械的強度をあげるにはマスクを厚くす
ることも考えられるが、マスクの中央部と周辺部の相対
的強度はそのままであり、上記変形を防市することには
ならない。
Although it is conceivable to make the mask thicker to increase its mechanical strength, the relative strength of the center and peripheral parts of the mask remains the same, and this does not prevent the above deformation.

本発明は、以上の点から一方では強度を維持するために
ブリッジの幅を広くする必要があり、他方では螢光面の
形成等によるそのブリッジ4の幅を狭くする必要と夫々
逆の関係となってそのブリッジ4の寸法が極めて重要な
存在となって来る。
From the above points, the present invention has the opposite relationship between, on the one hand, the need to widen the width of the bridge in order to maintain strength, and on the other hand, the need to narrow the width of the bridge 4 due to the formation of a fluorescent surface, etc. Therefore, the dimensions of the bridge 4 become extremely important.

本発明者等はこの点を重視して改良に改良を重ねた結果
、強度及び螢光面の形成を共に両立させることに成功す
ることができたものである。
The inventors of the present invention focused on this point and made repeated improvements, and as a result, they succeeded in achieving both strength and formation of a fluorescent surface.

則ち、有効面の中央部は出来るだけ上記ブリッジの幅を
狭くして電子ビームの透過率及び螢光面に形成されるス
トライプ螢光体に充分に寄与するようにし、有効面の周
辺に機械的強度を充分にするためブリッジの幅を上記中
央部に対して広く形成する。
In other words, the width of the bridge should be made as narrow as possible in the center of the effective surface so as to sufficiently contribute to the transmittance of the electron beam and the striped phosphor formed on the phosphor surface, and mechanical In order to provide sufficient mechanical strength, the width of the bridge is made wider than the central portion.

つまり有効面の周辺部のブリッジ断面積を中央部より大
きくし、中央部より機械的強度を大きくするものである
In other words, the bridge cross-sectional area at the periphery of the effective surface is made larger than that at the center, and the mechanical strength is made greater than at the center.

しかしこの広さは螢光面のストライプが上記した“くび
れ”の現出が出来ない程度に広くすることが重要であり
、この幅の最大限を0.25mmを限度に形成したもの
である。
However, it is important that this width is wide enough to prevent the above-mentioned "constriction" from appearing in the stripes on the fluorescent surface, and the maximum width is set to 0.25 mm.

逆に中央部のブリッジ幅はプレス時の変形あるいは完成
後の変形防止のため0.05mmを最小限としたもので
ある。
On the other hand, the bridge width at the center is set to a minimum of 0.05 mm to prevent deformation during pressing or after completion.

更に、もう一つの方法として、上記最大幅を維持させて
ブリッジの数を増大することによって有効面周辺におけ
るブリッジの形成密度を増大し、実質的に機械的強度を
強くするようにしたものである。
Furthermore, another method is to increase the number of bridges while maintaining the maximum width, thereby increasing the density of bridge formation around the effective surface and substantially increasing the mechanical strength. .

ブリッジが、マスク成形時のブリッジ部伸び量が有効面
全面にわたって容認できるもので、十分なる機械的強度
を有するとともに画面の明るさ、螢光面のムラが良好な
範囲であれば透孔の大きさ、ストライプと直角方向の透
孔ピツチは従来と同様で良い。
If the bridge has an acceptable amount of elongation over the entire effective surface during mask molding, has sufficient mechanical strength, and has good screen brightness and fluorescent surface unevenness, the size of the through hole can be adjusted. The hole pitch in the direction perpendicular to the stripe may be the same as the conventional one.

すなわち、本願はマスク有効面の中央部と周辺部の強度
を相対的に変える(周辺部を強くする)ためにブリッジ
幅を変えるものであり、ここで透孔の大きさ、ストライ
プと直角方向の透孔ピツチはブリッジ方向の機械的強度
についての重要なパラメーターとはならない。
In other words, in this application, the bridge width is changed in order to relatively change the strength of the central part and the peripheral part of the mask effective surface (strengthen the peripheral part), and here the size of the through hole and the direction perpendicular to the stripe are changed. The hole pitch is not an important parameter for the mechanical strength in the bridge direction.

次に、本発明の実施例を第5図を参照して説明する。Next, an embodiment of the present invention will be described with reference to FIG.

厚さ約0.18mmの軟鉄板より成るシャドウマスク1
0の有効面11の周辺部12においては長方形状の各電
子ビーム透過孔13の長手方向(Y軸方向)の間に並ん
だ各ブリッジ14の幅Wは約0.25mmに形成し、こ
れから有効面中央部のY軸線に近づくにしたがってW1
は約0. 1 8 mm、W2は約0.15mmそして
W3は0.07mmに形成し、電子ビーム透過孔13の
大きさは全て一定に形成してある。
Shadow mask 1 made of a soft iron plate with a thickness of about 0.18 mm
In the periphery 12 of the effective surface 11 of 0, the width W of each bridge 14 arranged between the rectangular electron beam transmission holes 13 in the longitudinal direction (Y-axis direction) is approximately 0.25 mm. W1 as you approach the Y axis at the center of the plane
is about 0. 18 mm, W2 is approximately 0.15 mm, and W3 is approximately 0.07 mm, and the sizes of the electron beam transmission holes 13 are all constant.

従って、透孔のビッチPが周辺と中央で異る。Therefore, the pitch P of the through hole is different between the periphery and the center.

このようにして形成された上記シャドウヤスク10の周
辺は、ブリッジ14の幅を広くしてその機械的強度を増
大することができ、この部分の変形を防止しストライプ
螢光体にくびれのない螢光面を形成することを可能とし
た。
The periphery of the shadow yask 10 formed in this way can widen the width of the bridge 14 and increase its mechanical strength, preventing deformation of this area and allowing the striped phosphor to fluoresce without constriction. This made it possible to form a surface.

また、第6図は本発明の他の実施例を示すもので、有効
面11の周辺部における電子ビームの透過孔13のピツ
チPと、中央部の透過孔13のビッチPとは一定である
が、透過孔13の長さが中央部の透孔に対して周辺部の
透孔の長さを短かくしてありこれによってブリッジの幅
を周辺で広くW中央で狭くv形成したものである。
FIG. 6 shows another embodiment of the present invention, in which the pitch P of the electron beam transmission hole 13 in the peripheral part of the effective surface 11 and the pitch P of the transmission hole 13 in the central part are constant. However, the length of the through hole 13 is made shorter in the peripheral part than that in the central part, so that the width of the bridge is wide at the periphery and narrow at the W center.

本発明は上記のように構成したもので、シャドウマスク
10の周辺部における機械的強度の低下によるマスクの
有効面の変形を防止することができ、しかも周辺部での
電子ビームの透過量の減小を最小限にすることができて
螢光面での有効画面周辺の暗部を極力押えることができ
た。
The present invention, configured as described above, can prevent deformation of the effective surface of the shadow mask 10 due to a decrease in mechanical strength at the periphery, and can also reduce the amount of electron beam transmission at the periphery. We were able to minimize the dark areas around the effective screen on the fluorescent surface.

そして更にストライブ螢光光の形状への影響もほとんど
なく良好なストライプ螢光面を形成できるという効果が
ある。
Furthermore, there is an effect that a good striped fluorescent surface can be formed with almost no influence on the shape of the striped fluorescent light.

以上のように、本発明においてはシャドウマスクを湾曲
成形する際に起る上記有効面の変形が防正されたもので
、これが受像管内に装着されて螢光面に対向された場合
有効面全体にわたって管のパネル面に対して一定の間隔
(約10%)に保持されるので、このシャドウマスクの
透孔と螢光体との相対的関係が正確に維持されるので動
作中の温度変化に対しても有利であり、スミランデイン
グ等による色ずれ現象がほとんどなくなったという種々
の改良効果がある。
As described above, in the present invention, the deformation of the effective surface that occurs when the shadow mask is curved is prevented, and when this shadow mask is installed in the picture tube and faces the fluorescent surface, the entire effective surface is Since the shadow mask is maintained at a constant distance (approximately 10%) from the tube panel surface over the entire period, the relative relationship between the through hole of the shadow mask and the phosphor is maintained accurately, so it is not affected by temperature changes during operation. It also has various improvement effects, such as almost eliminating color shift phenomena such as smearlanding.

々おブリッジ14の幅Wを0.25mm以上にするとス
トライプ螢光体被膜の形状が第4図に示すように変形し
てしまって発光輝度むらを起したりするので好ましくな
い。
If the width W of the bridge 14 is set to 0.25 mm or more, the shape of the striped phosphor coating will be deformed as shown in FIG. 4, resulting in uneven luminance, which is not preferable.

従って、上記周辺部におけるブリッジ14の幅Wは約0
.25%乃至0.18%程度がよく、中央部においては
0.12乃至0.05%程度が機械的強度、ストライプ
螢光体の形成及び発光輝度の低下防止を共に満足できる
値であることが判っている。
Therefore, the width W of the bridge 14 at the periphery is approximately 0.
.. A value of about 25% to 0.18% is good, and a value of about 0.12 to 0.05% in the central part is sufficient to satisfy both mechanical strength, formation of striped phosphors, and prevention of reduction in luminance. I understand.

【図面の簡単な説明】[Brief explanation of drawings]

第1図aは従来のシャドウマスクの斜視図、第1図bは
その一部の拡大斜視図、第2図は第1図のシャドウマス
クの変形状態の一部を示す断面図第3図及び第4図は本
発明を説明するためのシャドウマスクと螢光面との関係
を説明するための断面図及び断面斜視図、第5図及び第
6図は本発明シャドウマスクの一部の正面図である。 10・・・・・・シャドウマスク、11・・・・・・有
効面、12・・・・・・周辺部、13・・・・・・透過
孔、14・・・・・・ブリッジ。
FIG. 1a is a perspective view of a conventional shadow mask, FIG. 1b is an enlarged perspective view of a part thereof, and FIG. 2 is a sectional view showing a part of the shadow mask in FIG. 1 in a deformed state. FIG. 4 is a sectional view and a sectional perspective view for explaining the relationship between a shadow mask and a fluorescent surface for explaining the present invention, and FIGS. 5 and 6 are front views of a part of the shadow mask of the present invention. It is. 10...Shadow mask, 11...Effective surface, 12...Peripheral area, 13...Transmission hole, 14...Bridge.

Claims (1)

【特許請求の範囲】 1 長形状の透孔を有し、との透孔の長手方向の長さが
有効面にわたって一定でその中央部のピッチより周辺部
のピッチが大きく、長手方向の透孔間の最大間隔が0.
2 5 mm、最小間隔が0.05mmであることを
特徴とするシャドウマスク。 2 長形状の透孔を有し、との透孔のピッチが有効画面
全面にわたって一定でその長手方向の透孔間々隔が有効
面の中央で狭く周辺部で広くなるように順次変化され透
孔間の最大間隔が0.25mm、最小間隔が0.05m
mであることを特徴とするシャドウマスク。
[Scope of Claims] 1. A through hole having an elongated shape, the length of the through hole in the longitudinal direction being constant over the effective surface, and the pitch of the peripheral part being larger than the pitch of the central part, and the through hole in the longitudinal direction. The maximum interval between is 0.
2 5 mm, and a minimum interval of 0.05 mm. 2. It has elongated through holes, and the pitch of the through holes is constant over the entire effective surface, and the distance between the through holes in the longitudinal direction is changed sequentially so that it is narrower at the center of the effective surface and wider at the periphery. The maximum interval between them is 0.25mm, the minimum interval is 0.05m
A shadow mask characterized by m.
JP49032659A 1974-03-25 1974-03-25 shadow mask Expired JPS581500B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP49032659A JPS581500B2 (en) 1974-03-25 1974-03-25 shadow mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49032659A JPS581500B2 (en) 1974-03-25 1974-03-25 shadow mask

Publications (2)

Publication Number Publication Date
JPS50126373A JPS50126373A (en) 1975-10-04
JPS581500B2 true JPS581500B2 (en) 1983-01-11

Family

ID=12364980

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49032659A Expired JPS581500B2 (en) 1974-03-25 1974-03-25 shadow mask

Country Status (1)

Country Link
JP (1) JPS581500B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190129823A (en) 2018-05-11 2019-11-20 가부시키가이샤 아루박 Sputtering method
KR20200093604A (en) 2018-06-19 2020-08-05 가부시키가이샤 아루박 Sputtering method, sputtering device

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5128479A (en) * 1974-09-04 1976-03-10 Hitachi Ltd KARAAJUZOKAN
JPS5278362A (en) * 1975-11-20 1977-07-01 Matsushita Electronics Corp Shadow mask for color picture tube
JPS58152349A (en) * 1982-03-04 1983-09-09 Mitsubishi Electric Corp Slot mask for color cathode-ray tube
JPS5918550A (en) * 1982-07-22 1984-01-30 Mitsubishi Electric Corp Color cathode-ray tube

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4877756A (en) * 1972-01-19 1973-10-19

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4877756A (en) * 1972-01-19 1973-10-19

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190129823A (en) 2018-05-11 2019-11-20 가부시키가이샤 아루박 Sputtering method
KR20200093604A (en) 2018-06-19 2020-08-05 가부시키가이샤 아루박 Sputtering method, sputtering device

Also Published As

Publication number Publication date
JPS50126373A (en) 1975-10-04

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