JPH0337259B2 - - Google Patents
Info
- Publication number
- JPH0337259B2 JPH0337259B2 JP3792282A JP3792282A JPH0337259B2 JP H0337259 B2 JPH0337259 B2 JP H0337259B2 JP 3792282 A JP3792282 A JP 3792282A JP 3792282 A JP3792282 A JP 3792282A JP H0337259 B2 JPH0337259 B2 JP H0337259B2
- Authority
- JP
- Japan
- Prior art keywords
- surface roughness
- panel
- shadow mask
- locking hole
- panel pin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003746 surface roughness Effects 0.000 claims description 38
- 230000002093 peripheral effect Effects 0.000 claims description 17
- 239000011521 glass Substances 0.000 claims description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 10
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- 235000019353 potassium silicate Nutrition 0.000 claims description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 6
- 238000010586 diagram Methods 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 239000003086 colorant Substances 0.000 description 2
- 238000009863 impact test Methods 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 229910019589 Cr—Fe Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- -1 water glass Chemical compound 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/06—Screens for shielding; Masks interposed in the electron stream
- H01J29/07—Shadow masks for colour television tubes
- H01J29/073—Mounting arrangements associated with shadow masks
Landscapes
- Electrodes For Cathode-Ray Tubes (AREA)
Description
【発明の詳細な説明】
〔発明の目的〕
本発明はシヤドウマスクの支持機構に係り、特
にパネルピンと、このパネルピンに嵌合するスプ
リング片の係止孔部の周壁の表面粗度を規定する
ことにより、パネルガラス内面に極めて品位の良
好の画像を再現することが可能なシヤドウムマス
クの支持機構に関するものである。[Detailed Description of the Invention] [Object of the Invention] The present invention relates to a support mechanism for a shadow mask, and in particular, by defining the surface roughness of the peripheral wall of a locking hole of a panel pin and a spring piece that fits into the panel pin. This invention relates to a support mechanism for a shadow mask that is capable of reproducing an extremely high-quality image on the inner surface of a panel glass.
カラー受像管はパネルガラス内面に披着形成さ
れたブラツクトライプ及び赤、緑、青各色に発光
するストライプ状の蛍光体層からなる蛍光面に所
定間隔をもつてシヤドウマスクが対設され、この
シヤドウマスクは通常このシヤドウマスクのスカ
ート部を支持するマスクフレームに固定されたシ
ヤドウマスク支持構体のスプリング片の遊端部近
傍に穿設された係止孔部をパネルガラスの側壁部
内面に植設されたパネルピンに嵌合させるように
なつている。
A color picture tube has a phosphor screen made of black stripes formed on the inner surface of the panel glass and striped phosphor layers that emit light in red, green, and blue colors, and a shadow mask placed opposite it at a predetermined distance. Usually, a locking hole drilled near the free end of the spring piece of the shadow mask support structure fixed to the mask frame that supports the skirt of this shadow mask is fitted into a panel pin planted on the inner surface of the side wall of the panel glass. It's starting to match.
このようなカラー受像管の２例を第１図及び第
２図により説明する。 Two examples of such color picture tubes will be explained with reference to FIGS. 1 and 2.
即ち、第１図のものはパネルガラス１の内面に
披着形成された赤、緑、青各色に発光する蛍光体
層からなる蛍光面２に所定間隔をもつて対接され
るシヤドウマスク３はこのシヤドウマスク３のス
カート部を支持するマスクフレーム４に固定され
たバイメタル５、スプリング片６からなるシヤド
ウマスク支持構体のスプリング片６の遊端部近傍
に嵌合された係止孔部６ａをパネルガラス１の側
壁部１1の内面に植設されたパネルピン７に嵌合
するようになつている。図において×印は溶接点
である。 That is, in the one shown in FIG. 1, a shadow mask 3 is placed in contact with a phosphor screen 2 at a predetermined distance from a phosphor layer 2 formed on the inner surface of a panel glass 1 and made of phosphor layers that emit light in red, green, and blue colors. A locking hole 6a fitted in the vicinity of the free end of a spring piece 6 of a shadow mask support structure consisting of a bimetal 5 fixed to a mask frame 4 that supports the skirt portion of the shadow mask 3 and a spring piece 6 is inserted into the panel glass 1. It is adapted to fit into a panel pin 7 implanted on the inner surface of the side wall portion 11 . In the figure, the x marks are welding points.
また第２図のものは、シヤドウマスク支持構体
として熱膨張係数の異なる２枚の金属を幅方向で
溶接したいわゆるラテラルバイメタタルをそのま
まスプリング片６としたものであり、このスプリ
ング片６の係止孔部６ａをパネルピン７に嵌合す
るようになつている。他は第１図とほぼ同一であ
るので説明を省略する。 In addition, in the one shown in FIG. 2, a so-called lateral bimetallic material made by welding two metal sheets with different coefficients of thermal expansion in the width direction is used as a shadow mask support structure, and the spring piece 6 is used as it is. A panel pin 7 is fitted into the hole 6a. Since the other parts are almost the same as those in FIG. 1, the explanation will be omitted.
前述したスプリング片６の特に係止孔部６ａと
パネルピン７との嵌合部は第３図に示すようにな
つており、パネルピン７は微量の添加元素を含む
18％Cr−Feを所定の形状に加工したのち、ホー
ニング加工を行つて表面粗度を大きくし、その
後、1200℃の湿水素中で酸化処理を行ない、最終
的には表面の凹凸の最大高さRmaxが0.5〜10μｍ
である表面粗度にし、熱処理行ない使用してい
る。 Particularly, the fitting portion between the locking hole 6a of the spring piece 6 mentioned above and the panel pin 7 is as shown in FIG. 3, and the panel pin 7 contains a trace amount of an additive element.
After processing 18% Cr-Fe into a specified shape, honing is performed to increase the surface roughness, and then oxidation treatment is performed in wet hydrogen at 1200℃ to finally improve the maximum height of surface irregularities. Rmax is 0.5~10μm
It is used after it has been heat-treated and has a certain surface roughness.
パネルピン７の表面粗度をこのような値にして
いるのはパネルピン７の場合、パネルガラス１の
側壁部１1に植設するためにガラスとの接触界面
を広くし、ガラスとの接着強度を向上させるため
である。 The reason why the surface roughness of the panel pin 7 is set to such a value is that in the case of the panel pin 7, the contact interface with the glass is widened in order to be implanted in the side wall part 11 of the panel glass 1, and the adhesive strength with the glass is increased. This is to improve the results.
一方スプリング片６の係止孔部６ａの周壁はタ
ンブリング加工の経済性を考慮して適当な表面粗
度になされている。 On the other hand, the peripheral wall of the locking hole 6a of the spring piece 6 is made to have an appropriate surface roughness in consideration of the economic efficiency of tumbling.
しかるにこのようにパネルピン７にスプリング
片６の係止孔部６ａを嵌合させると、接触部８の
摩擦が大きいため、パネルガラス１内面に光吸収
層や蛍光体層を披着形成する場合、装着前後のシ
ヤドウマスク３位置に変化が生じ、いわゆる位置
再現性が悪くなる。その結果、カラー受像管とし
ては電子ビームのミスランデイングを生じる一要
因となり、ホワイトユニフオミテイ（WU）を低
下させる問題点があつた。
However, when the locking hole 6a of the spring piece 6 is fitted to the panel pin 7 in this way, the friction of the contact portion 8 is large, so when forming a light absorption layer or a phosphor layer on the inner surface of the panel glass 1, A change occurs in the position of the shadow mask 3 before and after wearing, and so-called position reproducibility deteriorates. As a result, as a color picture tube, it became a factor that caused mislanding of the electron beam, resulting in a problem of lowering white uniformity (WU).
本発明は前記従来の問題点に鑑みなされたもの
であり、スプリング材の係止孔部の周壁及びパネ
ルピンの表面粗度を規定すると共に、パネルピン
にカーボンの微粉末を披着形成することによつて
位置再現性を良好にし、品位の良好なカラー受像
管を得ることが可能なシヤドウマスクの支持機構
を提供することを目的としている。
The present invention has been made in view of the above-mentioned conventional problems, and it is possible to define the surface roughness of the peripheral wall of the locking hole portion of the spring material and the panel pin, and to coat the panel pin with fine carbon powder. It is an object of the present invention to provide a support mechanism for a shadow mask that can improve position reproducibility and obtain a color picture tube of good quality.
即ち、本発明はパネルガラス内面に植設された
複数個のパネルピンにシヤドウマスクを支持する
マスクフレームに取付けたスプリング片の遊端部
近傍の係止孔部を嵌合させるようになされたシヤ
ドウマスクの支持機構において、パネルピンの表
面粗度を表面の凹凸の最大高さ（以下Rmaxとい
う）で10乃至20μｍ、係止孔部の周壁の表面粗度
をRmaxで0.5μｍ以下とし、かつパネルピンの表
面にカーボンの微粉末を披着形成してなることを
特徴としている。
That is, the present invention provides a support for a shadow mask in which a locking hole near the free end of a spring piece attached to a mask frame supporting the shadow mask is fitted into a plurality of panel pins embedded in the inner surface of the panel glass. In the mechanism, the surface roughness of the panel pin is set to 10 to 20 μm in terms of the maximum height of surface irregularities (hereinafter referred to as Rmax), the surface roughness of the peripheral wall of the locking hole is set to 0.5 μm or less in Rmax, and carbon is applied to the surface of the panel pin. It is characterized by being formed by arranging fine powder.
発明者らは26インチ100゜偏向のカラー受像管を
使用して種々の実験を行なつた。
The inventors conducted various experiments using a 26-inch 100° polarization color picture tube.
先ずパネルピンの表面粗度をRmaxで23μｍ、
18μｍ、12μｍ、7μｍ、2.5μｍと変化させ、また係
止孔部の周壁の表面粗度をRmaxで0.7μｍ、0.5μ
ｍ、0.3μｍと変化させた時の例えばブラツクスト
ライプ形成前後のシヤドウマスクとガラスパネル
間の間隔、いわゆるｑ値の変化を求めたところ、
第４図の折線曲線１０，１１，１２が得られた。
この結果から判断するパネルピン、係止孔部の周
壁のいずれも表面粗度が小さい程、例えばパネル
ガラス内面に光吸収層を披着形成させる前後のｑ
値の変化を少なくすることが可能であることがわ
かる。 First, the surface roughness of the panel pin is Rmax 23μm,
The surface roughness of the peripheral wall of the locking hole was changed to 18μm, 12μm, 7μm, and 2.5μm, and the surface roughness of the peripheral wall of the locking hole was changed to Rmax of 0.7μm and 0.5μm.
For example, when changing the distance between the shadow mask and the glass panel before and after forming a black stripe, when changing the distance to 0.3 μm, we found that the change in the so-called q value, the distance between the shadow mask and the glass panel, was determined.
Broken line curves 10, 11, and 12 in FIG. 4 were obtained.
Judging from this result, the smaller the surface roughness of both the panel pin and the peripheral wall of the locking hole, the lower the surface roughness, for example, before and after forming the light absorption layer on the inner surface of the panel glass.
It can be seen that it is possible to reduce the change in value.
次に第４図においてｑ値の最大のものと最小の
もの、即ちパネルピンの表面粗度がRmaxで23μ
ｍのものと係止孔部の周壁の表面粗度がRmaxで
0.7μｍのものとを使用して組立てたカラー受像管
と、パネルピンの表面粗度がRmaxで、2.5μｍの
ものと係止孔部の周壁の表面粗度がRmaxで0.3μ
ｍのものとを使用して組立てたカラー受像管とを
各50個使用し、電子ビームのランデイングばらつ
きを実際に測定した結果、前者では30.5μｍであ
つたものが、後者では21.0μｍと約1/3減少するこ
とがわかつた。このようにシヤドウマスク支持構
体の支持中心部であるパネルピンと係止孔部側壁
の表面粗度を小さくすることにより、シヤドウマ
スクの位置再現性は向上し、カラー受像管にした
ときの電子ビームのランデイング特性を向上させ
ることが出来る。 Next, in Figure 4, the maximum and minimum q values, that is, the surface roughness of the panel pin is 23μ at Rmax.
m and the surface roughness of the peripheral wall of the locking hole is Rmax.
The color picture tube assembled using a 0.7μm one and the surface roughness of the panel pin is Rmax, and the surface roughness of the peripheral wall of the locking hole is 2.5μm and Rmax is 0.3μm.
As a result of actually measuring the landing variation of the electron beam using 50 color picture tubes assembled using the same color picture tubes, the former was 30.5 μm, while the latter was 21.0 μm, about 1 It was found that the amount decreased by /3. In this way, by reducing the surface roughness of the panel pin, which is the support center of the shadow mask support structure, and the side wall of the locking hole, the position reproducibility of the shadow mask is improved, and the landing characteristics of the electron beam when used as a color picture tube are improved. can be improved.
しかし、このような表面粗度の小さいパネルピ
ンと係止孔部の周壁の組合せによつて製作したカ
ラー受像管を管としての各種試験を行なつたとこ
ろ、落下試験即ち衝撃によつてランデイグ変化が
大きくなることがわかつた。即ち従来50Gの衝撃
で約50μｍあつたものが前述した組合せでは約
60μｍと変化量が大きくなる現象がある。この原
因は表面粗度が小さいもの同志の嵌合により落下
試験時回転がよりなり、スプリング片などに微少
な変形が起るためと考えられる。 However, when various tests were conducted on a color picture tube manufactured by combining a panel pin with a small surface roughness and a peripheral wall of the locking hole, it was found that the landing change did not occur during a drop test, that is, due to impact. I knew it was going to get bigger. In other words, what would have been about 50μm with a conventional 50G impact would be about 50μm with the above combination.
There is a phenomenon in which the amount of change is as large as 60 μm. The reason for this is thought to be that due to the fitting of the pieces with small surface roughness, the rotation becomes stronger during the drop test, causing slight deformation of the spring pieces and the like.
そこで発明者らは種々な検討を加えた結果、予
め、パネルピンにカーボンの微粉末を例えば水ガ
ラスなどと共に塗布することにより、パネルピン
の表面粗度がかなり大きくてもシヤドウマスクの
位置再現性が向上し、かつ衝撃によるランデイン
グ変化も小さく出来るとの考えを基にして、パネ
ルピンの表面粗度をRmaxで2.5μｍ乃至23μｍと
変化させ、カーボンの微粉末を塗布し、これに係
止孔部の周壁の表面粗度をRmaxで0.3μｍ、0.5μ
ｍ、0.7μｍと変化させてブラツクストライプ形成
前後のｑ値の変化を求め、第５図に示す折線グラ
フ１４，１５を得、さらに50Gの衝撃によるラン
デイング変化を求め、第６図による折線グラフ１
６を得た。 As a result of various studies, the inventors found that by applying fine carbon powder, such as water glass, to the panel pins in advance, the position reproducibility of the shadow mask could be improved even if the surface roughness of the panel pins was quite large. Based on the idea that the landing change due to impact can also be minimized, the surface roughness of the panel pin is varied from 2.5 μm to 23 μm at Rmax, and fine carbon powder is applied to the surface of the peripheral wall of the locking hole. Surface roughness Rmax: 0.3μm, 0.5μ
m and 0.7 μm to determine the change in q value before and after the formation of the black stripe to obtain the line graphs 14 and 15 shown in FIG.
I got 6.
この折線グラフ１４，１５及び１６から得られ
ることは、係止孔部の周壁の表面粗度が0.3μｍ、
0.5μｍの場合にはブラツクストライプ形成時のｑ
値変化量がパネルピンの表面粗度ほRmaxで18μ
ｍ以上において次第に増加する。この場合Rmax
で20μｍまでは充分使用できるが、0.7μｍの場合
には18μｍ以上で急に変化量が増化しはじめ、
20μｍでは規格はずれになるし、また50Gの衝撃
試験によるランデイング変化量は0.3μｍ、0.5μ
ｍ、0.7μｍともにパネルピンの表面粗度12μｍ付
近から多くなるが、10μｍでは規格内に入つてい
る。 What can be obtained from these line graphs 14, 15, and 16 is that the surface roughness of the peripheral wall of the locking hole is 0.3 μm,
In the case of 0.5 μm, q at the time of black stripe formation
The amount of change in value is 18μ at Rmax due to the surface roughness of the panel pin.
It gradually increases above m. In this case Rmax
However, in the case of 0.7μm, the amount of change suddenly starts to increase at 18μm or more.
At 20μm, the standard is exceeded, and the amount of landing change in the 50G impact test is 0.3μm and 0.5μm.
Both m and 0.7 μm increase when the surface roughness of the panel pin is around 12 μm, but at 10 μm, it is within the standard.
即ちパネルピンの表面粗度はRmaxで10μｍ乃
至20μｍ、係止孔部の周壁の表面粗度はRmaxで
0.5μｍ以下が最良の条件となつている。 In other words, the surface roughness of the panel pin is Rmax of 10 μm to 20 μm, and the surface roughness of the peripheral wall of the locking hole is Rmax.
The best condition is 0.5 μm or less.
上述のようにパネルピンの表面粗度をRmaxで
10μｍ乃至20μｍ、係止孔部の周壁の表面粗度を
Rmaxで0.5μｍ以下にし、かつパネルピンにカー
ボンの微粉末を塗布することにより、ｑ値の変化
が少なく、ミスランデイングの変化、特に衝撃試
験後のミスランデイングの変化も少ない品位良好
なカラー受像管を得ることが可能となつた。
As mentioned above, the surface roughness of the panel pin is determined by Rmax.
The surface roughness of the peripheral wall of the locking hole is 10μm to 20μm.
By setting Rmax to 0.5 μm or less and applying fine carbon powder to the panel pins, we have created a color picture tube with good quality, with little change in q value and little change in mislanding, especially in mislanding after impact tests. It became possible to obtain it.
第１図及び第２図はそれぞれ異なるシヤドウマ
スク支持構体を有するカラー受像管の要部断面
図、第３図はスプリング片の係止孔部とパネルピ
ンの関係を示す要部断面図、第４図とパネルピン
表面粗度、係止孔部の表面粗度とｑ値との関係を
示す折線図、第５図はパネルピンにカーボンの微
粉末を披着形成したときのパネルピンの表面粗度
及び係止孔部の周壁の表面粗度とブラツクストラ
イプ形成前後のｑ値変化との関係を示す折線図、
第６図はパネルピンにカーボンの微粉末を披着形
成したときのパネルピンの表面粗度、係止孔部の
周壁の表面粗度と50Gの衝撃によるランデイング
変化との関係を示す折線図である。
１……ガラスパネル、２……蛍光面、３……シ
ヤドウマスク、４……マスクフレーム、５……バ
イメタル、６……スプリング片、６ａ……係止孔
部、７……パネルピン。
1 and 2 are sectional views of the main parts of color picture tubes having different shadow mask support structures, FIG. 3 is a sectional view of the main parts showing the relationship between the locking hole of the spring piece and the panel pin, and FIG. A line diagram showing the relationship between the surface roughness of the panel pin, the surface roughness of the locking hole, and the q value. Figure 5 shows the surface roughness of the panel pin and the locking hole when fine carbon powder is deposited on the panel pin. A line diagram showing the relationship between the surface roughness of the peripheral wall of the part and the change in q value before and after the formation of black stripes,
FIG. 6 is a line diagram showing the relationship between the surface roughness of the panel pin, the surface roughness of the peripheral wall of the locking hole, and the landing change due to an impact of 50 G when the panel pin is coated with fine carbon powder. DESCRIPTION OF SYMBOLS 1... Glass panel, 2... Fluorescent screen, 3... Shadow mask, 4... Mask frame, 5... Bimetal, 6... Spring piece, 6a... Locking hole, 7... Panel pin.
Claims (1)
ルピンにシヤドウマスクを支持するマスクフレー
ムに取付けたスプリング片の遊端部近傍の係止孔
部を嵌合させるようになされたシヤドウマスクの
支持機構において、前記パネルピンの表面粗度を
表面の凹凸の最大高さで10乃至20μｍ、係止孔部
の周壁の表面粗度を表面の凹凸の最大高さで0.5μ
ｍ以下とし、かつ前記パネルピンの表面にカーボ
ンの微粉末を披着形成してなることを特徴とする
シヤドウマスクの支持機構。 ２ カーボンの微粉末の形成がこのカーボンの微
粉末に水ガラスを添加した部材の塗布によつてな
されていることを特徴とする特許請求の範囲第１
項記載のシヤドウマスクの支持機構。[Claims] 1. A shadow mask in which a locking hole near the free end of a spring piece attached to a mask frame supporting the shadow mask is fitted into a plurality of panel pins embedded in the inner surface of the panel glass. In this support mechanism, the surface roughness of the panel pin is 10 to 20 μm in terms of the maximum height of the surface irregularities, and the surface roughness of the peripheral wall of the locking hole is 0.5 μm in terms of the maximum height of the surface irregularities.
A support mechanism for a shadow mask, characterized in that the support mechanism has a diameter of less than m, and is formed by depositing fine carbon powder on the surface of the panel pin. 2. Claim 1, characterized in that the formation of the fine carbon powder is achieved by applying a member to which water glass is added to the fine carbon powder.
Support mechanism for the shadow mask described in Section 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3792282A JPS58155628A (en) | 1982-03-12 | 1982-03-12 | Holding structure of shadow mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3792282A JPS58155628A (en) | 1982-03-12 | 1982-03-12 | Holding structure of shadow mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58155628A JPS58155628A (en) | 1983-09-16 |
| JPH0337259B2 true JPH0337259B2 (en) | 1991-06-05 |
Family
ID=12511032
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3792282A Granted JPS58155628A (en) | 1982-03-12 | 1982-03-12 | Holding structure of shadow mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58155628A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH071675B2 (en) * | 1990-08-22 | 1995-01-11 | 大日本スクリーン製造株式会社 | Shadow mask manufacturing method and shadow mask plate material |
-
1982
- 1982-03-12 JP JP3792282A patent/JPS58155628A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58155628A (en) | 1983-09-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0666135B2 (en) | Shadow mask type color cathode ray tube | |
| JPH0337259B2 (en) | ||
| JP3035983B2 (en) | Manufacturing method of cathode ray tube | |
| JP3276105B2 (en) | Color picture tube | |
| EP0176344B1 (en) | Colour picture tube | |
| JPS581500B2 (en) | shadow mask | |
| KR100605760B1 (en) | Color cathode-ray tube | |
| JPH10172460A (en) | Double layer phosphor film, and manufacture thereof | |
| JP3573436B2 (en) | Display surface and method of manufacturing the same | |
| JPH064523Y2 (en) | Shadow mask for color cathode ray tube | |
| JPS5835343B2 (en) | color picture tube | |
| JP2569261B2 (en) | Shadow mask type color CRT | |
| KR0123992Y1 (en) | Cathode ray tube | |
| US3835347A (en) | Colour picture tube with improved color purity | |
| US20040032199A1 (en) | CRT having internal neutral density filter field of use | |
| JPH0456871B2 (en) | ||
| KR20030019119A (en) | Color crt | |
| JPH0685305B2 (en) | Color picture tube | |
| JPH06243805A (en) | Cathode-ray tube | |
| JPH03201340A (en) | Forming of fluorescent screen for color cathode-ray tube | |
| KR19990085098A (en) | Prewet liquid composition of color cathode ray tube | |
| JPS59165342A (en) | Color cathode ray tube | |
| JPH08306323A (en) | Color cathode-ray tube | |
| JPH06260096A (en) | Color picture tube | |
| JPH03272543A (en) | Manufacture of phosphor surface of color cathode-ray tube |