JPS58145100A - プラズマ利用装置における高周波電極への電力制御装置 - Google Patents

プラズマ利用装置における高周波電極への電力制御装置

Info

Publication number
JPS58145100A
JPS58145100A JP57027291A JP2729182A JPS58145100A JP S58145100 A JPS58145100 A JP S58145100A JP 57027291 A JP57027291 A JP 57027291A JP 2729182 A JP2729182 A JP 2729182A JP S58145100 A JPS58145100 A JP S58145100A
Authority
JP
Japan
Prior art keywords
supply terminal
supply
plasma
electrode
bias voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57027291A
Other languages
English (en)
Japanese (ja)
Other versions
JPS645760B2 (enrdf_load_stackoverflow
Inventor
藤岡　俊昭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Nihon Shinku Gijutsu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc, Nihon Shinku Gijutsu KK filed Critical Ulvac Inc
Priority to JP57027291A priority Critical patent/JPS58145100A/ja
Publication of JPS58145100A publication Critical patent/JPS58145100A/ja
Publication of JPS645760B2 publication Critical patent/JPS645760B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Plasma Technology (AREA)
JP57027291A 1982-02-24 1982-02-24 プラズマ利用装置における高周波電極への電力制御装置 Granted JPS58145100A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57027291A JPS58145100A (ja) 1982-02-24 1982-02-24 プラズマ利用装置における高周波電極への電力制御装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57027291A JPS58145100A (ja) 1982-02-24 1982-02-24 プラズマ利用装置における高周波電極への電力制御装置

Publications (2)

Publication Number Publication Date
JPS58145100A true JPS58145100A (ja) 1983-08-29
JPS645760B2 JPS645760B2 (enrdf_load_stackoverflow) 1989-01-31

Family

ID=12216970

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57027291A Granted JPS58145100A (ja) 1982-02-24 1982-02-24 プラズマ利用装置における高周波電極への電力制御装置

Country Status (1)

Country Link
JP (1) JPS58145100A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6142096A (en) * 1996-05-16 2000-11-07 Sharp Kabushiki Kaisha Electronic device manufacturing apparatus and method for manufacturing electronic device
JP2017174526A (ja) * 2016-03-22 2017-09-28 富士フイルム株式会社 プラズマ生成装置、プラズマ生成方法およびプラズマ処理方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102517786A (zh) * 2011-12-12 2012-06-27 飞虎科技有限公司 电脑横机织针组合结构

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6142096A (en) * 1996-05-16 2000-11-07 Sharp Kabushiki Kaisha Electronic device manufacturing apparatus and method for manufacturing electronic device
USRE39064E1 (en) * 1996-05-16 2006-04-18 Sharp Kabushiki Kaisha Electronic device manufacturing apparatus and method for manufacturing electronic device
JP2017174526A (ja) * 2016-03-22 2017-09-28 富士フイルム株式会社 プラズマ生成装置、プラズマ生成方法およびプラズマ処理方法

Also Published As

Publication number Publication date
JPS645760B2 (enrdf_load_stackoverflow) 1989-01-31

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