JPS58144830A - 乾式直刷り平版印刷版の製造法 - Google Patents

乾式直刷り平版印刷版の製造法

Info

Publication number
JPS58144830A
JPS58144830A JP2765182A JP2765182A JPS58144830A JP S58144830 A JPS58144830 A JP S58144830A JP 2765182 A JP2765182 A JP 2765182A JP 2765182 A JP2765182 A JP 2765182A JP S58144830 A JPS58144830 A JP S58144830A
Authority
JP
Japan
Prior art keywords
layer
printing
photocurable resin
plate
layer made
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2765182A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0356464B2 (enExample
Inventor
Sadanobu Kawasaki
河崎　定信
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP2765182A priority Critical patent/JPS58144830A/ja
Publication of JPS58144830A publication Critical patent/JPS58144830A/ja
Publication of JPH0356464B2 publication Critical patent/JPH0356464B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2765182A 1982-02-23 1982-02-23 乾式直刷り平版印刷版の製造法 Granted JPS58144830A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2765182A JPS58144830A (ja) 1982-02-23 1982-02-23 乾式直刷り平版印刷版の製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2765182A JPS58144830A (ja) 1982-02-23 1982-02-23 乾式直刷り平版印刷版の製造法

Publications (2)

Publication Number Publication Date
JPS58144830A true JPS58144830A (ja) 1983-08-29
JPH0356464B2 JPH0356464B2 (enExample) 1991-08-28

Family

ID=12226819

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2765182A Granted JPS58144830A (ja) 1982-02-23 1982-02-23 乾式直刷り平版印刷版の製造法

Country Status (1)

Country Link
JP (1) JPS58144830A (enExample)

Also Published As

Publication number Publication date
JPH0356464B2 (enExample) 1991-08-28

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