JPS58142338A - 画像形成法 - Google Patents

画像形成法

Info

Publication number
JPS58142338A
JPS58142338A JP2277882A JP2277882A JPS58142338A JP S58142338 A JPS58142338 A JP S58142338A JP 2277882 A JP2277882 A JP 2277882A JP 2277882 A JP2277882 A JP 2277882A JP S58142338 A JPS58142338 A JP S58142338A
Authority
JP
Japan
Prior art keywords
acid
polyester
group
component
represented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2277882A
Other languages
English (en)
Japanese (ja)
Other versions
JPH035574B2 (enrdf_load_stackoverflow
Inventor
Tsuneo Hagiwara
恒夫 萩原
Hiroshi Matsuzawa
松沢 博志
Kaoru Iwata
薫 岩田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP2277882A priority Critical patent/JPS58142338A/ja
Publication of JPS58142338A publication Critical patent/JPS58142338A/ja
Publication of JPH035574B2 publication Critical patent/JPH035574B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0384Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2277882A 1982-02-17 1982-02-17 画像形成法 Granted JPS58142338A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2277882A JPS58142338A (ja) 1982-02-17 1982-02-17 画像形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2277882A JPS58142338A (ja) 1982-02-17 1982-02-17 画像形成法

Publications (2)

Publication Number Publication Date
JPS58142338A true JPS58142338A (ja) 1983-08-24
JPH035574B2 JPH035574B2 (enrdf_load_stackoverflow) 1991-01-25

Family

ID=12092120

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2277882A Granted JPS58142338A (ja) 1982-02-17 1982-02-17 画像形成法

Country Status (1)

Country Link
JP (1) JPS58142338A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59159156A (ja) * 1983-03-01 1984-09-08 Teijin Ltd 平版印刷版材
CN106050444A (zh) * 2015-04-14 2016-10-26 株式会社电装 发动机停止起动控制装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59159156A (ja) * 1983-03-01 1984-09-08 Teijin Ltd 平版印刷版材
CN106050444A (zh) * 2015-04-14 2016-10-26 株式会社电装 发动机停止起动控制装置

Also Published As

Publication number Publication date
JPH035574B2 (enrdf_load_stackoverflow) 1991-01-25

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