JPS58135111A - 窒化物薄膜の形成方法 - Google Patents

窒化物薄膜の形成方法

Info

Publication number
JPS58135111A
JPS58135111A JP1489682A JP1489682A JPS58135111A JP S58135111 A JPS58135111 A JP S58135111A JP 1489682 A JP1489682 A JP 1489682A JP 1489682 A JP1489682 A JP 1489682A JP S58135111 A JPS58135111 A JP S58135111A
Authority
JP
Japan
Prior art keywords
nitride
thin film
nitride thin
substrate
boron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1489682A
Other languages
English (en)
Japanese (ja)
Other versions
JPS629666B2 (enrdf_load_stackoverflow
Inventor
Soichi Matsuzaki
松崎 壮一
Minoru Osada
実 長田
Seiji Yasui
政治 安井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lincstech Circuit Co Ltd
Original Assignee
Hitachi Condenser Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Condenser Co Ltd filed Critical Hitachi Condenser Co Ltd
Priority to JP1489682A priority Critical patent/JPS58135111A/ja
Publication of JPS58135111A publication Critical patent/JPS58135111A/ja
Publication of JPS629666B2 publication Critical patent/JPS629666B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Lubricants (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
JP1489682A 1982-02-03 1982-02-03 窒化物薄膜の形成方法 Granted JPS58135111A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1489682A JPS58135111A (ja) 1982-02-03 1982-02-03 窒化物薄膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1489682A JPS58135111A (ja) 1982-02-03 1982-02-03 窒化物薄膜の形成方法

Publications (2)

Publication Number Publication Date
JPS58135111A true JPS58135111A (ja) 1983-08-11
JPS629666B2 JPS629666B2 (enrdf_load_stackoverflow) 1987-03-02

Family

ID=11873749

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1489682A Granted JPS58135111A (ja) 1982-02-03 1982-02-03 窒化物薄膜の形成方法

Country Status (1)

Country Link
JP (1) JPS58135111A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58132589U (ja) * 1982-02-28 1983-09-07 ヤマハ発動機株式会社 液体分離装置
JPS6365079A (ja) * 1986-09-04 1988-03-23 Mitsubishi Metal Corp 耐欠損性のすぐれた切削工具用表面被覆硬質合金
JPH03259417A (ja) * 1990-11-30 1991-11-19 Tdk Corp 磁気記録媒体
JP2007031167A (ja) * 2005-07-22 2007-02-08 National Institute For Materials Science 窒化ホウ素ナノホーンの製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58132589U (ja) * 1982-02-28 1983-09-07 ヤマハ発動機株式会社 液体分離装置
JPS6365079A (ja) * 1986-09-04 1988-03-23 Mitsubishi Metal Corp 耐欠損性のすぐれた切削工具用表面被覆硬質合金
JPH03259417A (ja) * 1990-11-30 1991-11-19 Tdk Corp 磁気記録媒体
JP2007031167A (ja) * 2005-07-22 2007-02-08 National Institute For Materials Science 窒化ホウ素ナノホーンの製造方法

Also Published As

Publication number Publication date
JPS629666B2 (enrdf_load_stackoverflow) 1987-03-02

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