JPS629666B2 - - Google Patents

Info

Publication number
JPS629666B2
JPS629666B2 JP1489682A JP1489682A JPS629666B2 JP S629666 B2 JPS629666 B2 JP S629666B2 JP 1489682 A JP1489682 A JP 1489682A JP 1489682 A JP1489682 A JP 1489682A JP S629666 B2 JPS629666 B2 JP S629666B2
Authority
JP
Japan
Prior art keywords
boron
thin film
nitride thin
nitride
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1489682A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58135111A (ja
Inventor
Soichi Matsuzaki
Minoru Osada
Seiji Yasui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lincstech Circuit Co Ltd
Original Assignee
Hitachi Condenser Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Condenser Co Ltd filed Critical Hitachi Condenser Co Ltd
Priority to JP1489682A priority Critical patent/JPS58135111A/ja
Publication of JPS58135111A publication Critical patent/JPS58135111A/ja
Publication of JPS629666B2 publication Critical patent/JPS629666B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Lubricants (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
JP1489682A 1982-02-03 1982-02-03 窒化物薄膜の形成方法 Granted JPS58135111A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1489682A JPS58135111A (ja) 1982-02-03 1982-02-03 窒化物薄膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1489682A JPS58135111A (ja) 1982-02-03 1982-02-03 窒化物薄膜の形成方法

Publications (2)

Publication Number Publication Date
JPS58135111A JPS58135111A (ja) 1983-08-11
JPS629666B2 true JPS629666B2 (enrdf_load_stackoverflow) 1987-03-02

Family

ID=11873749

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1489682A Granted JPS58135111A (ja) 1982-02-03 1982-02-03 窒化物薄膜の形成方法

Country Status (1)

Country Link
JP (1) JPS58135111A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58132589U (ja) * 1982-02-28 1983-09-07 ヤマハ発動機株式会社 液体分離装置
JPH0788569B2 (ja) * 1986-09-04 1995-09-27 三菱マテリアル株式会社 耐欠損性のすぐれた切削工具用表面被覆硬質合金
JPH03259417A (ja) * 1990-11-30 1991-11-19 Tdk Corp 磁気記録媒体
JP4706077B2 (ja) * 2005-07-22 2011-06-22 独立行政法人物質・材料研究機構 窒化ホウ素ナノホーンの製造方法

Also Published As

Publication number Publication date
JPS58135111A (ja) 1983-08-11

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