JPS58130275A - 真空蒸着用焼結体 - Google Patents
真空蒸着用焼結体Info
- Publication number
- JPS58130275A JPS58130275A JP57011245A JP1124582A JPS58130275A JP S58130275 A JPS58130275 A JP S58130275A JP 57011245 A JP57011245 A JP 57011245A JP 1124582 A JP1124582 A JP 1124582A JP S58130275 A JPS58130275 A JP S58130275A
- Authority
- JP
- Japan
- Prior art keywords
- sintered body
- vacuum deposition
- film
- electron beam
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57011245A JPS58130275A (ja) | 1982-01-27 | 1982-01-27 | 真空蒸着用焼結体 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57011245A JPS58130275A (ja) | 1982-01-27 | 1982-01-27 | 真空蒸着用焼結体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58130275A true JPS58130275A (ja) | 1983-08-03 |
| JPS6151281B2 JPS6151281B2 (enrdf_load_stackoverflow) | 1986-11-08 |
Family
ID=11772550
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57011245A Granted JPS58130275A (ja) | 1982-01-27 | 1982-01-27 | 真空蒸着用焼結体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58130275A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63192857A (ja) * | 1987-02-05 | 1988-08-10 | Sumitomo Electric Ind Ltd | 超電導薄膜の作製法 |
-
1982
- 1982-01-27 JP JP57011245A patent/JPS58130275A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63192857A (ja) * | 1987-02-05 | 1988-08-10 | Sumitomo Electric Ind Ltd | 超電導薄膜の作製法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6151281B2 (enrdf_load_stackoverflow) | 1986-11-08 |
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