JPS5638467A - Aluminum oxide composition for deposition - Google Patents
Aluminum oxide composition for depositionInfo
- Publication number
- JPS5638467A JPS5638467A JP11310079A JP11310079A JPS5638467A JP S5638467 A JPS5638467 A JP S5638467A JP 11310079 A JP11310079 A JP 11310079A JP 11310079 A JP11310079 A JP 11310079A JP S5638467 A JPS5638467 A JP S5638467A
- Authority
- JP
- Japan
- Prior art keywords
- aluminum oxide
- substrate
- production
- chemically stable
- titanium oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title abstract 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 title abstract 3
- 230000008021 deposition Effects 0.000 title 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 2
- 238000004519 manufacturing process Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 abstract 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 238000005137 deposition process Methods 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- 239000005304 optical glass Substances 0.000 abstract 1
- 238000003825 pressing Methods 0.000 abstract 1
- 238000005245 sintering Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Compositions Of Oxide Ceramics (AREA)
Abstract
PURPOSE:To provide the titled aluminum composition suited to the production of an optical lens antireflection layer which is chemically stable and strongly bonded to a substrate by mixing a specific amount of titanium oxide with aluminum oxide and sintering the mixture. CONSTITUTION:To aluminum oxide, 0.1-6wt% of titanium oxide is added, thoroughly mixed, formed by pressing, and sintered at a specified temperature and time to provide tablets used in an electron beam heated deposition process. When heated by an electron gun, this composition allows the production of an optical glass antireflection film without being broken and splashed as occurring in conventional ones. The so deposited film strongly adheres on the substrate and is chemically stable to provide a long service life.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11310079A JPS5638467A (en) | 1979-09-04 | 1979-09-04 | Aluminum oxide composition for deposition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11310079A JPS5638467A (en) | 1979-09-04 | 1979-09-04 | Aluminum oxide composition for deposition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5638467A true JPS5638467A (en) | 1981-04-13 |
| JPS6128027B2 JPS6128027B2 (en) | 1986-06-28 |
Family
ID=14603475
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11310079A Granted JPS5638467A (en) | 1979-09-04 | 1979-09-04 | Aluminum oxide composition for deposition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5638467A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54102441U (en) * | 1977-12-08 | 1979-07-19 | ||
| JPS54118364U (en) * | 1978-02-08 | 1979-08-18 | ||
| JPS5922661A (en) * | 1982-07-09 | 1984-02-04 | グレ−タ−・マンチエスタ−・カウンシル | Method of disposing garbage and its plant |
| JPS63144466U (en) * | 1987-03-11 | 1988-09-22 | ||
| US6903375B1 (en) | 1999-07-13 | 2005-06-07 | Matsushita Electric Industrial Co., Ltd. | Solid-state image device, camera using the same, and method of manufacturing the same |
| CN109503149A (en) * | 2018-11-27 | 2019-03-22 | 北京富兴凯永兴光电技术有限公司 | A kind of high refractive index optical filming material and preparation method, optical anti-reflective film |
| GB2565190B (en) * | 2017-06-02 | 2020-11-04 | Sensata Technologies Inc | Alumina diffusion barrier for sensing elements |
-
1979
- 1979-09-04 JP JP11310079A patent/JPS5638467A/en active Granted
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54102441U (en) * | 1977-12-08 | 1979-07-19 | ||
| JPS5634615Y2 (en) * | 1977-12-08 | 1981-08-15 | ||
| JPS54118364U (en) * | 1978-02-08 | 1979-08-18 | ||
| JPS5922661A (en) * | 1982-07-09 | 1984-02-04 | グレ−タ−・マンチエスタ−・カウンシル | Method of disposing garbage and its plant |
| JPS63144466U (en) * | 1987-03-11 | 1988-09-22 | ||
| US6903375B1 (en) | 1999-07-13 | 2005-06-07 | Matsushita Electric Industrial Co., Ltd. | Solid-state image device, camera using the same, and method of manufacturing the same |
| GB2565190B (en) * | 2017-06-02 | 2020-11-04 | Sensata Technologies Inc | Alumina diffusion barrier for sensing elements |
| CN109503149A (en) * | 2018-11-27 | 2019-03-22 | 北京富兴凯永兴光电技术有限公司 | A kind of high refractive index optical filming material and preparation method, optical anti-reflective film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6128027B2 (en) | 1986-06-28 |
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