JPH0158267B2 - - Google Patents
Info
- Publication number
- JPH0158267B2 JPH0158267B2 JP62250298A JP25029887A JPH0158267B2 JP H0158267 B2 JPH0158267 B2 JP H0158267B2 JP 62250298 A JP62250298 A JP 62250298A JP 25029887 A JP25029887 A JP 25029887A JP H0158267 B2 JPH0158267 B2 JP H0158267B2
- Authority
- JP
- Japan
- Prior art keywords
- oxide
- cerium oxide
- sputtering
- cerium
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25029887A JPH0192365A (ja) | 1987-10-02 | 1987-10-02 | 真空蒸着又はスパッタ用酸化セリウム組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25029887A JPH0192365A (ja) | 1987-10-02 | 1987-10-02 | 真空蒸着又はスパッタ用酸化セリウム組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0192365A JPH0192365A (ja) | 1989-04-11 |
| JPH0158267B2 true JPH0158267B2 (enrdf_load_stackoverflow) | 1989-12-11 |
Family
ID=17205824
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25029887A Granted JPH0192365A (ja) | 1987-10-02 | 1987-10-02 | 真空蒸着又はスパッタ用酸化セリウム組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0192365A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0339467A (ja) * | 1989-07-06 | 1991-02-20 | Matsushita Electric Ind Co Ltd | スパッタ用ターゲットの製造方法 |
| TWI249164B (en) | 2001-11-22 | 2006-02-11 | Tdk Corp | Optical recording medium |
-
1987
- 1987-10-02 JP JP25029887A patent/JPH0192365A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0192365A (ja) | 1989-04-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3836163B2 (ja) | 高屈折率膜の形成方法 | |
| Randhawa et al. | SnO2 films prepared by activated reactive evaporation | |
| US4187340A (en) | Method of forming patterned transparent electro-conductive film on the substrate of liquid crystal display | |
| KR19990014682A (ko) | 혼합 산화물 고굴절률 광학 코팅 재료 및 방법 | |
| US2964427A (en) | Ultra-violet filter | |
| US5415946A (en) | Vapor-deposition material for the production of optical coatings of medium refractive index | |
| CN1792929B (zh) | 用于生产高折射率层的汽相沉积材料 | |
| GB1584898A (en) | Liquid crystal cells | |
| US5776847A (en) | Stabilized vapour-deposition materials based on titanium oxide | |
| JP2011084819A (ja) | 高屈折率光学層を製造するための蒸着材料 | |
| JP4964584B2 (ja) | 高屈折率の光学的層を製造するための蒸着材料の使用、その蒸着材料、及びその蒸着材料を調製する方法 | |
| JP2005256175A (ja) | ターゲットおよび該ターゲットによる高屈折率膜の製造方法 | |
| JPH0158267B2 (enrdf_load_stackoverflow) | ||
| WO1997047564A1 (fr) | Corps antireflets photo-absorbant et procede de production correspondant | |
| JP5008807B2 (ja) | 高屈折率光学層製造用蒸着材料および蒸着材料の製造方法 | |
| JPS6128027B2 (enrdf_load_stackoverflow) | ||
| JP2008057045A (ja) | 酸化物焼結体スパッタリングターゲット | |
| JPH08277462A (ja) | 中屈折率の光学被膜 | |
| Kawamata et al. | KMS (keep-molecules sputtering) deposition of optical MgF2 thin films | |
| JP3160309B2 (ja) | 薄膜形成方法 | |
| JPS6151281B2 (enrdf_load_stackoverflow) | ||
| JP2565936B2 (ja) | クラッド容器 | |
| JP3781398B2 (ja) | Ｉ．ｔ．ｏ焼結体、その製造方法及びｉ．ｔ．ｏ薄膜 | |
| JPS6151282B2 (enrdf_load_stackoverflow) | ||
| JP2743707B2 (ja) | 混合被膜付きガラス及びその製造方法 |