JPS58120511A - シランの精製法 - Google Patents
シランの精製法Info
- Publication number
- JPS58120511A JPS58120511A JP145382A JP145382A JPS58120511A JP S58120511 A JPS58120511 A JP S58120511A JP 145382 A JP145382 A JP 145382A JP 145382 A JP145382 A JP 145382A JP S58120511 A JPS58120511 A JP S58120511A
- Authority
- JP
- Japan
- Prior art keywords
- silane
- impurities
- adsorbent
- gas
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title claims abstract description 33
- 229910000077 silane Inorganic materials 0.000 title claims abstract description 33
- 238000000034 method Methods 0.000 title claims abstract description 16
- 239000012535 impurity Substances 0.000 claims abstract description 27
- 239000001257 hydrogen Substances 0.000 claims abstract description 19
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 19
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000007769 metal material Substances 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims abstract description 6
- 238000006356 dehydrogenation reaction Methods 0.000 claims abstract description 4
- 239000003463 adsorbent Substances 0.000 claims description 20
- 238000000746 purification Methods 0.000 claims description 12
- 238000003860 storage Methods 0.000 claims description 8
- 229910052987 metal hydride Inorganic materials 0.000 claims description 5
- 150000004681 metal hydrides Chemical class 0.000 claims description 5
- 238000001179 sorption measurement Methods 0.000 abstract description 12
- 230000004913 activation Effects 0.000 abstract description 5
- 238000005984 hydrogenation reaction Methods 0.000 abstract description 3
- 150000004678 hydrides Chemical class 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 23
- 230000000694 effects Effects 0.000 description 8
- 239000002994 raw material Substances 0.000 description 8
- 239000000843 powder Substances 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000010926 purge Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- 229910000914 Mn alloy Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 101100002917 Caenorhabditis elegans ash-2 gene Proteins 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- 229910010389 TiMn Inorganic materials 0.000 description 1
- 229910008357 ZrMn2 Inorganic materials 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- WLQSSCFYCXIQDZ-UHFFFAOYSA-N arsanyl Chemical compound [AsH2] WLQSSCFYCXIQDZ-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000013138 pruning Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- -1 siloxanes Chemical class 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP145382A JPS58120511A (ja) | 1982-01-07 | 1982-01-07 | シランの精製法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP145382A JPS58120511A (ja) | 1982-01-07 | 1982-01-07 | シランの精製法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58120511A true JPS58120511A (ja) | 1983-07-18 |
| JPS621566B2 JPS621566B2 (enrdf_load_stackoverflow) | 1987-01-14 |
Family
ID=11501860
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP145382A Granted JPS58120511A (ja) | 1982-01-07 | 1982-01-07 | シランの精製法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58120511A (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6163518A (ja) * | 1984-09-03 | 1986-04-01 | Mitsui Toatsu Chem Inc | 高純度モノシラン |
| JPS6163515A (ja) * | 1984-09-03 | 1986-04-01 | Mitsui Toatsu Chem Inc | モノシランの製造方法 |
| US4976942A (en) * | 1988-09-26 | 1990-12-11 | Japan Pionics, Ltd. | Method for purifying gaseous hydrides |
| JPH03215310A (ja) * | 1990-01-19 | 1991-09-20 | Osaka Titanium Co Ltd | 多結晶シリコンの製造方法 |
| US5182089A (en) * | 1990-02-20 | 1993-01-26 | Mannesmann Aktiengesellschaft | Chemisorptive metal alloy and method of using the same |
| CN109908892A (zh) * | 2017-12-12 | 2019-06-21 | 中国科学院大连化学物理研究所 | 一种超纯氢气纯化吸附剂材料及应用 |
-
1982
- 1982-01-07 JP JP145382A patent/JPS58120511A/ja active Granted
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6163518A (ja) * | 1984-09-03 | 1986-04-01 | Mitsui Toatsu Chem Inc | 高純度モノシラン |
| JPS6163515A (ja) * | 1984-09-03 | 1986-04-01 | Mitsui Toatsu Chem Inc | モノシランの製造方法 |
| US4976942A (en) * | 1988-09-26 | 1990-12-11 | Japan Pionics, Ltd. | Method for purifying gaseous hydrides |
| JPH03215310A (ja) * | 1990-01-19 | 1991-09-20 | Osaka Titanium Co Ltd | 多結晶シリコンの製造方法 |
| US5182089A (en) * | 1990-02-20 | 1993-01-26 | Mannesmann Aktiengesellschaft | Chemisorptive metal alloy and method of using the same |
| CN109908892A (zh) * | 2017-12-12 | 2019-06-21 | 中国科学院大连化学物理研究所 | 一种超纯氢气纯化吸附剂材料及应用 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS621566B2 (enrdf_load_stackoverflow) | 1987-01-14 |
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