JPS58120254A - フオトマスク - Google Patents
フオトマスクInfo
- Publication number
- JPS58120254A JPS58120254A JP57003049A JP304982A JPS58120254A JP S58120254 A JPS58120254 A JP S58120254A JP 57003049 A JP57003049 A JP 57003049A JP 304982 A JP304982 A JP 304982A JP S58120254 A JPS58120254 A JP S58120254A
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- pattern
- transmitting part
- inner lead
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004020 conductor Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 230000000903 blocking effect Effects 0.000 claims description 2
- 238000005530 etching Methods 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57003049A JPS58120254A (ja) | 1982-01-12 | 1982-01-12 | フオトマスク |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57003049A JPS58120254A (ja) | 1982-01-12 | 1982-01-12 | フオトマスク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58120254A true JPS58120254A (ja) | 1983-07-18 |
| JPS6227383B2 JPS6227383B2 (enrdf_load_stackoverflow) | 1987-06-15 |
Family
ID=11546453
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57003049A Granted JPS58120254A (ja) | 1982-01-12 | 1982-01-12 | フオトマスク |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58120254A (enrdf_load_stackoverflow) |
-
1982
- 1982-01-12 JP JP57003049A patent/JPS58120254A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6227383B2 (enrdf_load_stackoverflow) | 1987-06-15 |
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