JPS58116531A - ネガ型レジスト材料 - Google Patents

ネガ型レジスト材料

Info

Publication number
JPS58116531A
JPS58116531A JP21481181A JP21481181A JPS58116531A JP S58116531 A JPS58116531 A JP S58116531A JP 21481181 A JP21481181 A JP 21481181A JP 21481181 A JP21481181 A JP 21481181A JP S58116531 A JPS58116531 A JP S58116531A
Authority
JP
Japan
Prior art keywords
alkali
compound
soluble
energy radiation
irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21481181A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0360109B2 (cg-RX-API-DMAC7.html
Inventor
Kazuo Toda
和男 戸田
Katsuhiro Fujino
藤野　勝裕
Satoshi Takechi
敏 武智
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP21481181A priority Critical patent/JPS58116531A/ja
Publication of JPS58116531A publication Critical patent/JPS58116531A/ja
Publication of JPH0360109B2 publication Critical patent/JPH0360109B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP21481181A 1981-12-29 1981-12-29 ネガ型レジスト材料 Granted JPS58116531A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21481181A JPS58116531A (ja) 1981-12-29 1981-12-29 ネガ型レジスト材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21481181A JPS58116531A (ja) 1981-12-29 1981-12-29 ネガ型レジスト材料

Publications (2)

Publication Number Publication Date
JPS58116531A true JPS58116531A (ja) 1983-07-11
JPH0360109B2 JPH0360109B2 (cg-RX-API-DMAC7.html) 1991-09-12

Family

ID=16661909

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21481181A Granted JPS58116531A (ja) 1981-12-29 1981-12-29 ネガ型レジスト材料

Country Status (1)

Country Link
JP (1) JPS58116531A (cg-RX-API-DMAC7.html)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49130218A (cg-RX-API-DMAC7.html) * 1973-04-14 1974-12-13
JPS52148304A (en) * 1976-06-02 1977-12-09 Agfa Gevaert Nv Photoosensitive image forming material and method of same
JPS53130747A (en) * 1977-04-20 1978-11-15 Oji Paper Co Photosensitine composition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49130218A (cg-RX-API-DMAC7.html) * 1973-04-14 1974-12-13
JPS52148304A (en) * 1976-06-02 1977-12-09 Agfa Gevaert Nv Photoosensitive image forming material and method of same
JPS53130747A (en) * 1977-04-20 1978-11-15 Oji Paper Co Photosensitine composition

Also Published As

Publication number Publication date
JPH0360109B2 (cg-RX-API-DMAC7.html) 1991-09-12

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