JPS58114763A - 薄膜形成方法 - Google Patents

薄膜形成方法

Info

Publication number
JPS58114763A
JPS58114763A JP56210228A JP21022881A JPS58114763A JP S58114763 A JPS58114763 A JP S58114763A JP 56210228 A JP56210228 A JP 56210228A JP 21022881 A JP21022881 A JP 21022881A JP S58114763 A JPS58114763 A JP S58114763A
Authority
JP
Japan
Prior art keywords
paint
substrate
film
thin film
viscosity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56210228A
Other languages
English (en)
Japanese (ja)
Other versions
JPS613545B2 (OSRAM
Inventor
Yoshiyuki Kagoki
楮木　美行
Katsuo Uta
宇多　克夫
Hidekazu Takasago
高砂　英一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56210228A priority Critical patent/JPS58114763A/ja
Publication of JPS58114763A publication Critical patent/JPS58114763A/ja
Publication of JPS613545B2 publication Critical patent/JPS613545B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56210228A 1981-12-29 1981-12-29 薄膜形成方法 Granted JPS58114763A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56210228A JPS58114763A (ja) 1981-12-29 1981-12-29 薄膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56210228A JPS58114763A (ja) 1981-12-29 1981-12-29 薄膜形成方法

Publications (2)

Publication Number Publication Date
JPS58114763A true JPS58114763A (ja) 1983-07-08
JPS613545B2 JPS613545B2 (OSRAM) 1986-02-03

Family

ID=16585900

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56210228A Granted JPS58114763A (ja) 1981-12-29 1981-12-29 薄膜形成方法

Country Status (1)

Country Link
JP (1) JPS58114763A (OSRAM)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60193339A (ja) * 1984-03-14 1985-10-01 Fujitsu Ltd レジスト膜塗布方法
JPS61161174A (ja) * 1984-12-29 1986-07-21 Nordson Kk 回転中の被塗体に対する液体スプレイ塗布方法
JPS62114683A (ja) * 1985-11-15 1987-05-26 Hitachi Tokyo Electron Co Ltd 塗布方法および装置
US5393584A (en) * 1992-02-21 1995-02-28 Tdk Corporation Magnetic disc
KR100324645B1 (ko) * 1999-01-15 2002-02-27 박호군 용액의 점도 변화를 이용한 박막의 두께 조절 방법
KR20170057136A (ko) * 2015-11-16 2017-05-24 도쿄엘렉트론가부시키가이샤 도포막 형성 방법, 도포막 형성 장치 및 기억 매체
JP2017092392A (ja) * 2015-11-16 2017-05-25 東京エレクトロン株式会社 塗布膜形成方法、塗布膜形成装置及び記憶媒体

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6238558A (ja) * 1985-08-12 1987-02-19 Konishiroku Photo Ind Co Ltd 磁気シ−トジヤケツト装着装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60193339A (ja) * 1984-03-14 1985-10-01 Fujitsu Ltd レジスト膜塗布方法
JPS61161174A (ja) * 1984-12-29 1986-07-21 Nordson Kk 回転中の被塗体に対する液体スプレイ塗布方法
JPS62114683A (ja) * 1985-11-15 1987-05-26 Hitachi Tokyo Electron Co Ltd 塗布方法および装置
US5393584A (en) * 1992-02-21 1995-02-28 Tdk Corporation Magnetic disc
KR100324645B1 (ko) * 1999-01-15 2002-02-27 박호군 용액의 점도 변화를 이용한 박막의 두께 조절 방법
KR20170057136A (ko) * 2015-11-16 2017-05-24 도쿄엘렉트론가부시키가이샤 도포막 형성 방법, 도포막 형성 장치 및 기억 매체
JP2017092392A (ja) * 2015-11-16 2017-05-25 東京エレクトロン株式会社 塗布膜形成方法、塗布膜形成装置及び記憶媒体
CN107051831A (zh) * 2015-11-16 2017-08-18 东京毅力科创株式会社 涂敷膜形成方法和涂敷膜形成装置
US10672606B2 (en) 2015-11-16 2020-06-02 Tokyo Electron Limited Coating film forming method, coating film forming apparatus, and storage medium

Also Published As

Publication number Publication date
JPS613545B2 (OSRAM) 1986-02-03

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