JPS613545B2 - - Google Patents
Info
- Publication number
- JPS613545B2 JPS613545B2 JP56210228A JP21022881A JPS613545B2 JP S613545 B2 JPS613545 B2 JP S613545B2 JP 56210228 A JP56210228 A JP 56210228A JP 21022881 A JP21022881 A JP 21022881A JP S613545 B2 JPS613545 B2 JP S613545B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56210228A JPS58114763A (ja) | 1981-12-29 | 1981-12-29 | 薄膜形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56210228A JPS58114763A (ja) | 1981-12-29 | 1981-12-29 | 薄膜形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58114763A JPS58114763A (ja) | 1983-07-08 |
| JPS613545B2 true JPS613545B2 (OSRAM) | 1986-02-03 |
Family
ID=16585900
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56210228A Granted JPS58114763A (ja) | 1981-12-29 | 1981-12-29 | 薄膜形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58114763A (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6238558A (ja) * | 1985-08-12 | 1987-02-19 | Konishiroku Photo Ind Co Ltd | 磁気シ−トジヤケツト装着装置 |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60193339A (ja) * | 1984-03-14 | 1985-10-01 | Fujitsu Ltd | レジスト膜塗布方法 |
| JPS61161174A (ja) * | 1984-12-29 | 1986-07-21 | Nordson Kk | 回転中の被塗体に対する液体スプレイ塗布方法 |
| JPS62114683A (ja) * | 1985-11-15 | 1987-05-26 | Hitachi Tokyo Electron Co Ltd | 塗布方法および装置 |
| JPH05234074A (ja) * | 1992-02-21 | 1993-09-10 | Tdk Corp | 磁気ディスクの製造方法および磁気ディスク |
| KR100324645B1 (ko) * | 1999-01-15 | 2002-02-27 | 박호군 | 용액의 점도 변화를 이용한 박막의 두께 조절 방법 |
| JP6465000B2 (ja) * | 2015-11-16 | 2019-02-06 | 東京エレクトロン株式会社 | 塗布膜形成方法、塗布膜形成装置及び記憶媒体 |
| TWI666684B (zh) * | 2015-11-16 | 2019-07-21 | 日商東京威力科創股份有限公司 | 塗佈膜形成方法、塗佈膜形成裝置及記憶媒體 |
-
1981
- 1981-12-29 JP JP56210228A patent/JPS58114763A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6238558A (ja) * | 1985-08-12 | 1987-02-19 | Konishiroku Photo Ind Co Ltd | 磁気シ−トジヤケツト装着装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58114763A (ja) | 1983-07-08 |