JPS5810824A - 電子ビ−ム露光方法 - Google Patents
電子ビ−ム露光方法Info
- Publication number
- JPS5810824A JPS5810824A JP10776781A JP10776781A JPS5810824A JP S5810824 A JPS5810824 A JP S5810824A JP 10776781 A JP10776781 A JP 10776781A JP 10776781 A JP10776781 A JP 10776781A JP S5810824 A JPS5810824 A JP S5810824A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- electron beam
- corrected
- exposure
- correction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Analytical Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10776781A JPS5810824A (ja) | 1981-07-10 | 1981-07-10 | 電子ビ−ム露光方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10776781A JPS5810824A (ja) | 1981-07-10 | 1981-07-10 | 電子ビ−ム露光方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5810824A true JPS5810824A (ja) | 1983-01-21 |
| JPS6262047B2 JPS6262047B2 (enExample) | 1987-12-24 |
Family
ID=14467480
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10776781A Granted JPS5810824A (ja) | 1981-07-10 | 1981-07-10 | 電子ビ−ム露光方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5810824A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6041220A (ja) * | 1983-08-17 | 1985-03-04 | Fujitsu Ltd | 露光パタ−ンの検査方法 |
-
1981
- 1981-07-10 JP JP10776781A patent/JPS5810824A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6041220A (ja) * | 1983-08-17 | 1985-03-04 | Fujitsu Ltd | 露光パタ−ンの検査方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6262047B2 (enExample) | 1987-12-24 |
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