JPS5810824A - 電子ビ−ム露光方法 - Google Patents

電子ビ−ム露光方法

Info

Publication number
JPS5810824A
JPS5810824A JP10776781A JP10776781A JPS5810824A JP S5810824 A JPS5810824 A JP S5810824A JP 10776781 A JP10776781 A JP 10776781A JP 10776781 A JP10776781 A JP 10776781A JP S5810824 A JPS5810824 A JP S5810824A
Authority
JP
Japan
Prior art keywords
pattern
electron beam
correction
exposure
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10776781A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6262047B2 (enrdf_load_stackoverflow
Inventor
Yasuhide Machida
町田　泰秀
Shigeru Furuya
茂 古谷
Noriaki Nakayama
中山　範明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10776781A priority Critical patent/JPS5810824A/ja
Publication of JPS5810824A publication Critical patent/JPS5810824A/ja
Publication of JPS6262047B2 publication Critical patent/JPS6262047B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP10776781A 1981-07-10 1981-07-10 電子ビ−ム露光方法 Granted JPS5810824A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10776781A JPS5810824A (ja) 1981-07-10 1981-07-10 電子ビ−ム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10776781A JPS5810824A (ja) 1981-07-10 1981-07-10 電子ビ−ム露光方法

Publications (2)

Publication Number Publication Date
JPS5810824A true JPS5810824A (ja) 1983-01-21
JPS6262047B2 JPS6262047B2 (enrdf_load_stackoverflow) 1987-12-24

Family

ID=14467480

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10776781A Granted JPS5810824A (ja) 1981-07-10 1981-07-10 電子ビ−ム露光方法

Country Status (1)

Country Link
JP (1) JPS5810824A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6041220A (ja) * 1983-08-17 1985-03-04 Fujitsu Ltd 露光パタ−ンの検査方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6041220A (ja) * 1983-08-17 1985-03-04 Fujitsu Ltd 露光パタ−ンの検査方法

Also Published As

Publication number Publication date
JPS6262047B2 (enrdf_load_stackoverflow) 1987-12-24

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