JPS579879A - Dry etching apparatus - Google Patents
Dry etching apparatusInfo
- Publication number
- JPS579879A JPS579879A JP8288380A JP8288380A JPS579879A JP S579879 A JPS579879 A JP S579879A JP 8288380 A JP8288380 A JP 8288380A JP 8288380 A JP8288380 A JP 8288380A JP S579879 A JPS579879 A JP S579879A
- Authority
- JP
- Japan
- Prior art keywords
- heat
- sample
- photoresist pattern
- vacuum vessel
- temp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To inhibit a temp. rise of a sample and to prevent the deformation of a photoresist pattern by attaching materials well absorbing heat and hardly reflecting heat to the surfaces of a vacuum vessel and electrode plates.
CONSTITUTION: A chemically treated stainless steel plate 13 is attached to the inner surface of a vacuum vessel 1, and chemically treated Al plates 14, 15 are set on the surfaces of electrodes 2, 3. The materials of the structures 13, 14, 15 show high heat absorptance, low heat reflection and low heat radiation. Accordingly, the surface temp. of a sample 9 is inhibited from rising owing to heat radiated from plasma 10 formed by RF discharge, and the sample 9 hardly undergoes thermal damage. As a result, precise patterning is performed without damaging the photoresist pattern.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8288380A JPS579879A (en) | 1980-06-20 | 1980-06-20 | Dry etching apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8288380A JPS579879A (en) | 1980-06-20 | 1980-06-20 | Dry etching apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS579879A true JPS579879A (en) | 1982-01-19 |
Family
ID=13786667
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8288380A Pending JPS579879A (en) | 1980-06-20 | 1980-06-20 | Dry etching apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS579879A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61232613A (en) * | 1985-04-08 | 1986-10-16 | Semiconductor Energy Lab Co Ltd | Apparatus for vapor-phase reaction in plasma |
JPH0365299A (en) * | 1989-08-03 | 1991-03-20 | Hitachi Plant Eng & Constr Co Ltd | Oxidation ditch type sewage treatment apparatus |
-
1980
- 1980-06-20 JP JP8288380A patent/JPS579879A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61232613A (en) * | 1985-04-08 | 1986-10-16 | Semiconductor Energy Lab Co Ltd | Apparatus for vapor-phase reaction in plasma |
JPH0365299A (en) * | 1989-08-03 | 1991-03-20 | Hitachi Plant Eng & Constr Co Ltd | Oxidation ditch type sewage treatment apparatus |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4631105A (en) | Plasma etching apparatus | |
JPS5531154A (en) | Plasma etching apparatus | |
JPS57149734A (en) | Plasma applying working device | |
JPS5747876A (en) | Plasma etching apparatus and method | |
JPS56152973A (en) | Sputter etching device | |
JPS579879A (en) | Dry etching apparatus | |
JPS56123377A (en) | Plasma cleaning and etching method | |
JPS5590228A (en) | Dry etching device | |
JPS53109458A (en) | Element for elastic surface wave | |
JPS56105480A (en) | Plasma etching method | |
JPS5449073A (en) | Plasma processing unit | |
JPS5483971A (en) | Crosslinked olefinic resin film having improved heat sealability | |
JPS53110378A (en) | Plasma carrying device | |
JPS5271185A (en) | Rotating anode x-ray tube | |
JPS55154583A (en) | Etching processing apparatus | |
JPS5480080A (en) | Etching device | |
JPS5545752A (en) | Removing method of carbon and device therefor | |
JPS5477573A (en) | Operating method of plasma treating apparatus | |
JPS542670A (en) | Plasma etching method | |
JPS5421278A (en) | Plasma etching method | |
JPS545397A (en) | Bellows part protective device for plasma vacuum container | |
JPS5530827A (en) | Plasmaetching device | |
JPS5552224A (en) | Sputter etching method | |
JPS5458362A (en) | Dry etching method | |
JPS553634A (en) | Etching device |