JPS5796207A - Measuring apparatus for pattern dimensions - Google Patents

Measuring apparatus for pattern dimensions

Info

Publication number
JPS5796207A
JPS5796207A JP17162080A JP17162080A JPS5796207A JP S5796207 A JPS5796207 A JP S5796207A JP 17162080 A JP17162080 A JP 17162080A JP 17162080 A JP17162080 A JP 17162080A JP S5796207 A JPS5796207 A JP S5796207A
Authority
JP
Japan
Prior art keywords
pattern
portion containing
edge section
dimensions
level corresponding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17162080A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6327642B2 (enrdf_load_stackoverflow
Inventor
Yoshifusa Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP17162080A priority Critical patent/JPS5796207A/ja
Publication of JPS5796207A publication Critical patent/JPS5796207A/ja
Publication of JPS6327642B2 publication Critical patent/JPS6327642B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
JP17162080A 1980-12-05 1980-12-05 Measuring apparatus for pattern dimensions Granted JPS5796207A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17162080A JPS5796207A (en) 1980-12-05 1980-12-05 Measuring apparatus for pattern dimensions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17162080A JPS5796207A (en) 1980-12-05 1980-12-05 Measuring apparatus for pattern dimensions

Publications (2)

Publication Number Publication Date
JPS5796207A true JPS5796207A (en) 1982-06-15
JPS6327642B2 JPS6327642B2 (enrdf_load_stackoverflow) 1988-06-03

Family

ID=15926543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17162080A Granted JPS5796207A (en) 1980-12-05 1980-12-05 Measuring apparatus for pattern dimensions

Country Status (1)

Country Link
JP (1) JPS5796207A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4740693A (en) * 1984-12-14 1988-04-26 Hitachi, Ltd. Electron beam pattern line width measurement system
US4741620A (en) * 1982-10-08 1988-05-03 National Research Development Corporation Irradiative probe system
JP2011192837A (ja) * 2010-03-15 2011-09-29 Toshiba Corp 評価装置および評価方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4741620A (en) * 1982-10-08 1988-05-03 National Research Development Corporation Irradiative probe system
US4740693A (en) * 1984-12-14 1988-04-26 Hitachi, Ltd. Electron beam pattern line width measurement system
JP2011192837A (ja) * 2010-03-15 2011-09-29 Toshiba Corp 評価装置および評価方法

Also Published As

Publication number Publication date
JPS6327642B2 (enrdf_load_stackoverflow) 1988-06-03

Similar Documents

Publication Publication Date Title
IL72183A0 (en) Measuring system employing a measuring method based on the triangulation principle for the non-contact measurement of a distance from the surface of a contoured object to a reference level
JPS57102017A (en) Pattern detector
ATE52331T1 (de) Verfahren und vorrichtung zur erfassung von messgroessen.
JPS643523A (en) Laser output meter
JPS5796207A (en) Measuring apparatus for pattern dimensions
JPS6412216A (en) Detection of position
JPS52127292A (en) Analyzer
JPS56107184A (en) Beam measurement
JPS5759143A (en) Measuring method for grain size of granular material
JPS57210549A (en) Method of correction attendant on deflection
JPS5578451A (en) Inspecting method of contamination in electron-optical system
JPS5582006A (en) Measuring method for thickness
JPS56138204A (en) Displacement measuring equipment
JPS56130921A (en) Adjusting method of axis of charged particle beam
JPS56107185A (en) Beam measurement
JPS61196104A (ja) レ−ザ−光線による位置検出方法および位置検出用受光装置
JPS567429A (en) Patterning device
JPS5795628A (en) Electron beam exposure device
JPS5759108A (en) Mark position detecting method for electron beam exposure
JPS57198628A (en) Inspecting device for pattern
JPS5773606A (en) Detector for tip shape of fine body
JPS5694241A (en) Blood leakage detector
JPS5541668A (en) Detecting method of character position
JPS5326194A (en) Specimen analyzer
JPS5350794A (en) Analytical apparatus of secondary electron energy