JPS5794600A - Method for replenishing anode material in copper sulfate plating bath - Google Patents
Method for replenishing anode material in copper sulfate plating bathInfo
- Publication number
- JPS5794600A JPS5794600A JP16948380A JP16948380A JPS5794600A JP S5794600 A JPS5794600 A JP S5794600A JP 16948380 A JP16948380 A JP 16948380A JP 16948380 A JP16948380 A JP 16948380A JP S5794600 A JPS5794600 A JP S5794600A
- Authority
- JP
- Japan
- Prior art keywords
- plating bath
- anode material
- copper sulfate
- replenishing
- sulfate plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007747 plating Methods 0.000 title abstract 10
- 239000010405 anode material Substances 0.000 title abstract 6
- 229910000365 copper sulfate Inorganic materials 0.000 title abstract 4
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 title abstract 4
- 238000000034 method Methods 0.000 title 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 abstract 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract 2
- 239000010949 copper Substances 0.000 abstract 2
- 229910052802 copper Inorganic materials 0.000 abstract 2
- 239000011574 phosphorus Substances 0.000 abstract 2
- 229910052698 phosphorus Inorganic materials 0.000 abstract 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16948380A JPS5794600A (en) | 1980-12-03 | 1980-12-03 | Method for replenishing anode material in copper sulfate plating bath |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16948380A JPS5794600A (en) | 1980-12-03 | 1980-12-03 | Method for replenishing anode material in copper sulfate plating bath |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5794600A true JPS5794600A (en) | 1982-06-12 |
| JPS6361399B2 JPS6361399B2 (enrdf_load_stackoverflow) | 1988-11-29 |
Family
ID=15887368
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16948380A Granted JPS5794600A (en) | 1980-12-03 | 1980-12-03 | Method for replenishing anode material in copper sulfate plating bath |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5794600A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6503375B1 (en) | 2000-02-11 | 2003-01-07 | Applied Materials, Inc | Electroplating apparatus using a perforated phosphorus doped consumable anode |
| JP2019044248A (ja) * | 2017-09-06 | 2019-03-22 | 電気興業株式会社 | 金属作製物の製造方法 |
-
1980
- 1980-12-03 JP JP16948380A patent/JPS5794600A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6503375B1 (en) | 2000-02-11 | 2003-01-07 | Applied Materials, Inc | Electroplating apparatus using a perforated phosphorus doped consumable anode |
| JP2019044248A (ja) * | 2017-09-06 | 2019-03-22 | 電気興業株式会社 | 金属作製物の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6361399B2 (enrdf_load_stackoverflow) | 1988-11-29 |
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