JPS5794600A - Method for replenishing anode material in copper sulfate plating bath - Google Patents

Method for replenishing anode material in copper sulfate plating bath

Info

Publication number
JPS5794600A
JPS5794600A JP16948380A JP16948380A JPS5794600A JP S5794600 A JPS5794600 A JP S5794600A JP 16948380 A JP16948380 A JP 16948380A JP 16948380 A JP16948380 A JP 16948380A JP S5794600 A JPS5794600 A JP S5794600A
Authority
JP
Japan
Prior art keywords
plating bath
anode material
copper sulfate
replenishing
sulfate plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16948380A
Other languages
Japanese (ja)
Other versions
JPS6361399B2 (en
Inventor
Seiichi Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Anritsu Corp
Original Assignee
Anritsu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anritsu Corp filed Critical Anritsu Corp
Priority to JP16948380A priority Critical patent/JPS5794600A/en
Publication of JPS5794600A publication Critical patent/JPS5794600A/en
Publication of JPS6361399B2 publication Critical patent/JPS6361399B2/ja
Granted legal-status Critical Current

Links

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  • Electroplating And Plating Baths Therefor (AREA)

Abstract

PURPOSE: To improve durability of through-hole plating against thermal impact by preelectrolyzing a replenishing anode material in a copper sulfate plating bath at a specific chlorine ion concn. in the presence of a brightener used in the regular plating bath and forming a synthetic film then using the same.
CONSTITUTION: At the state of replenishing a copper anode material contg. phosphorus in a coppe sulfate plating bath, the replenishing anode material is preelectrolyzed in the copper sulfate plating bath at 5W50mg/l chlorine ion concns. in the presence of the brightener used in regular plating bath. The synthetic film of a blackish brown color consisting of copper, phosphorus and org. material is formed on the fresh surface of the anode material. If the anode material stuck with such synthetic film is replenished in the copper sulfate plating bath, the brightener concn. in the plating bath is properly controlled and the through-hole plating of high reliability is obtained.
COPYRIGHT: (C)1982,JPO&Japio
JP16948380A 1980-12-03 1980-12-03 Method for replenishing anode material in copper sulfate plating bath Granted JPS5794600A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16948380A JPS5794600A (en) 1980-12-03 1980-12-03 Method for replenishing anode material in copper sulfate plating bath

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16948380A JPS5794600A (en) 1980-12-03 1980-12-03 Method for replenishing anode material in copper sulfate plating bath

Publications (2)

Publication Number Publication Date
JPS5794600A true JPS5794600A (en) 1982-06-12
JPS6361399B2 JPS6361399B2 (en) 1988-11-29

Family

ID=15887368

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16948380A Granted JPS5794600A (en) 1980-12-03 1980-12-03 Method for replenishing anode material in copper sulfate plating bath

Country Status (1)

Country Link
JP (1) JPS5794600A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6503375B1 (en) 2000-02-11 2003-01-07 Applied Materials, Inc Electroplating apparatus using a perforated phosphorus doped consumable anode
JP2019044248A (en) * 2017-09-06 2019-03-22 電気興業株式会社 Method for producing metal product

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6503375B1 (en) 2000-02-11 2003-01-07 Applied Materials, Inc Electroplating apparatus using a perforated phosphorus doped consumable anode
JP2019044248A (en) * 2017-09-06 2019-03-22 電気興業株式会社 Method for producing metal product

Also Published As

Publication number Publication date
JPS6361399B2 (en) 1988-11-29

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