JPS5793568A - Semiconductor image pickup element - Google Patents
Semiconductor image pickup elementInfo
- Publication number
- JPS5793568A JPS5793568A JP55170072A JP17007280A JPS5793568A JP S5793568 A JPS5793568 A JP S5793568A JP 55170072 A JP55170072 A JP 55170072A JP 17007280 A JP17007280 A JP 17007280A JP S5793568 A JPS5793568 A JP S5793568A
- Authority
- JP
- Japan
- Prior art keywords
- image pickup
- pickup element
- gate
- overflow
- diffused
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 abstract 1
- 229910021419 crystalline silicon Inorganic materials 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 229910052698 phosphorus Inorganic materials 0.000 abstract 1
- 239000011574 phosphorus Substances 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 238000001020 plasma etching Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
- H01L27/14887—Blooming suppression
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Abstract
PURPOSE:To obtain a highly integrated simiconductor image pickup element by disposing an overflow drain under an overflow control gate and reducing an area occupying the blooming preventing structure. CONSTITUTION:Boron is injected as a guard ring 202 to a P type substrate 201, and a field oxidized film 210 is formed using a selective oxidation. Then, to take a direct contact, a hole is opened, a multilayer crystalline silicon layer is formed, phosphorus is diffused, and an overflow drain 203 is formed. Thereafter, a polycrystalline layer is patterned by a photoresist pattern and a plasma etching method to form an overflow control gate 208 and a transfer gate 207. Subsequently, a BDC transfer clock gate 206, a photodiode diffused layer 204 and a light shielding aluminum 209 are formed as a semiconductor image pickup element.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55170072A JPS5793568A (en) | 1980-12-02 | 1980-12-02 | Semiconductor image pickup element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55170072A JPS5793568A (en) | 1980-12-02 | 1980-12-02 | Semiconductor image pickup element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5793568A true JPS5793568A (en) | 1982-06-10 |
JPS6320385B2 JPS6320385B2 (en) | 1988-04-27 |
Family
ID=15898110
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55170072A Granted JPS5793568A (en) | 1980-12-02 | 1980-12-02 | Semiconductor image pickup element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5793568A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59132655A (en) * | 1983-01-19 | 1984-07-30 | Matsushita Electric Ind Co Ltd | Solid-state image pickup device |
JPS59132659A (en) * | 1983-01-20 | 1984-07-30 | Matsushita Electric Ind Co Ltd | Solid-state image pickup device |
JPS60246673A (en) * | 1984-05-22 | 1985-12-06 | Nec Corp | Solid-state image pickup element |
US6195873B1 (en) * | 1999-09-08 | 2001-03-06 | Advanced Micro Devices, Inc. | Method for decreasing contact resistance |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5324795A (en) * | 1976-08-19 | 1978-03-07 | Philips Nv | Camera tube |
JPS5385187A (en) * | 1977-01-03 | 1978-07-27 | Reticon Corp | Photodiode array |
JPS5390721A (en) * | 1977-01-20 | 1978-08-09 | Sony Corp | Solid pickup element |
JPS5432089A (en) * | 1977-08-15 | 1979-03-09 | Matsushita Electronics Corp | Solid syate pickup device |
JPS5531333A (en) * | 1978-08-28 | 1980-03-05 | Sony Corp | Solid state pickup device |
JPS5558581A (en) * | 1978-10-26 | 1980-05-01 | Fujitsu Ltd | Infrared rays detector |
JPS5586274A (en) * | 1978-12-22 | 1980-06-28 | Nec Corp | Charge transfer pickup unit and its driving method |
-
1980
- 1980-12-02 JP JP55170072A patent/JPS5793568A/en active Granted
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5324795A (en) * | 1976-08-19 | 1978-03-07 | Philips Nv | Camera tube |
JPS5385187A (en) * | 1977-01-03 | 1978-07-27 | Reticon Corp | Photodiode array |
JPS5390721A (en) * | 1977-01-20 | 1978-08-09 | Sony Corp | Solid pickup element |
JPS5432089A (en) * | 1977-08-15 | 1979-03-09 | Matsushita Electronics Corp | Solid syate pickup device |
JPS5531333A (en) * | 1978-08-28 | 1980-03-05 | Sony Corp | Solid state pickup device |
JPS5558581A (en) * | 1978-10-26 | 1980-05-01 | Fujitsu Ltd | Infrared rays detector |
JPS5586274A (en) * | 1978-12-22 | 1980-06-28 | Nec Corp | Charge transfer pickup unit and its driving method |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59132655A (en) * | 1983-01-19 | 1984-07-30 | Matsushita Electric Ind Co Ltd | Solid-state image pickup device |
JPH035672B2 (en) * | 1983-01-19 | 1991-01-28 | Matsushita Electric Ind Co Ltd | |
JPS59132659A (en) * | 1983-01-20 | 1984-07-30 | Matsushita Electric Ind Co Ltd | Solid-state image pickup device |
JPS60246673A (en) * | 1984-05-22 | 1985-12-06 | Nec Corp | Solid-state image pickup element |
US6195873B1 (en) * | 1999-09-08 | 2001-03-06 | Advanced Micro Devices, Inc. | Method for decreasing contact resistance |
Also Published As
Publication number | Publication date |
---|---|
JPS6320385B2 (en) | 1988-04-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS53108390A (en) | Semiconductor device and its manufacture | |
JPS5793568A (en) | Semiconductor image pickup element | |
JPS5555559A (en) | Method of fabricating semiconductor device | |
JPS5539672A (en) | Manufacturing semiconductor device | |
JPS5583267A (en) | Method of fabricating semiconductor device | |
JPS55153325A (en) | Manufacture of semiconductor device | |
JPS5591827A (en) | Production of semiconductor device | |
JPS52141580A (en) | Manufacture of mos-type semiconductor device | |
JPS568849A (en) | Manufacture of semiconductor integrated circuit | |
JPS53144686A (en) | Production of semiconductor device | |
JPS522180A (en) | Method of fabricating mos semiconductor integrated circuit | |
JPS5591879A (en) | Electrostatic induction type transistor | |
JPS55132062A (en) | Semiconductor memory device | |
JPS5544779A (en) | Producing method for mos semiconductor device | |
JPS5491071A (en) | Manufacture of silicon gate type field effect transistor | |
JPS6489362A (en) | Manufacture of semiconductor device | |
JPS5578566A (en) | Manufacture of semiconductor device | |
JPS6413762A (en) | Manufacture of solid-state image sensing device | |
JPS5363986A (en) | Production of semiconductor device | |
JPS54142982A (en) | Field effect semiconductor device of junction type and its manufacture | |
JPS57181137A (en) | Manufacture of semiconductor device | |
JPS6444063A (en) | Manufacture of semiconductor device | |
JPS5580335A (en) | Manufacture of semiconductor device | |
JPS57121224A (en) | Formation of ohmic contact in semiconductor device | |
JPS57126163A (en) | Manufacture of solid-state image sensing device |