JPS579036A - Formation of pattern by using photosensitive compound - Google Patents

Formation of pattern by using photosensitive compound

Info

Publication number
JPS579036A
JPS579036A JP8288280A JP8288280A JPS579036A JP S579036 A JPS579036 A JP S579036A JP 8288280 A JP8288280 A JP 8288280A JP 8288280 A JP8288280 A JP 8288280A JP S579036 A JPS579036 A JP S579036A
Authority
JP
Japan
Prior art keywords
compound
fluorescent surface
aromatic diazonium
photosensitive
represent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8288280A
Other languages
English (en)
Inventor
Hajime Morishita
Takahiro Kobashi
Nobuaki Hayashi
Motoo Akagi
Masaichi Uchino
Saburo Nonogaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8288280A priority Critical patent/JPS579036A/ja
Priority to KR1019810002104A priority patent/KR860000069B1/ko
Priority to DE8181302620T priority patent/DE3169355D1/de
Priority to EP81302620A priority patent/EP0042704B1/en
Publication of JPS579036A publication Critical patent/JPS579036A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/54—Diazonium salts or diazo anhydrides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
    • H01J29/18—Luminescent screens
    • H01J29/22—Luminescent screens characterised by the binder or adhesive for securing the luminescent material to its support, e.g. vessel
    • H01J29/225—Luminescent screens characterised by the binder or adhesive for securing the luminescent material to its support, e.g. vessel photosensitive adhesive
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0071—Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
    • C09B67/0079—Azoic dyestuff preparations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/28—Processing photosensitive materials; Apparatus therefor for obtaining powder images
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
    • H01J29/18—Luminescent screens
    • H01J29/22—Luminescent screens characterised by the binder or adhesive for securing the luminescent material to its support, e.g. vessel

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP8288280A 1980-06-20 1980-06-20 Formation of pattern by using photosensitive compound Pending JPS579036A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP8288280A JPS579036A (en) 1980-06-20 1980-06-20 Formation of pattern by using photosensitive compound
KR1019810002104A KR860000069B1 (ko) 1980-06-20 1981-06-11 감광성조성물(感光性組成物)
DE8181302620T DE3169355D1 (en) 1980-06-20 1981-06-12 Method of forming a pattern employing a photosensitive composition
EP81302620A EP0042704B1 (en) 1980-06-20 1981-06-12 Method of forming a pattern employing a photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8288280A JPS579036A (en) 1980-06-20 1980-06-20 Formation of pattern by using photosensitive compound

Publications (1)

Publication Number Publication Date
JPS579036A true JPS579036A (en) 1982-01-18

Family

ID=13786639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8288280A Pending JPS579036A (en) 1980-06-20 1980-06-20 Formation of pattern by using photosensitive compound

Country Status (4)

Country Link
EP (1) EP0042704B1 (ja)
JP (1) JPS579036A (ja)
KR (1) KR860000069B1 (ja)
DE (1) DE3169355D1 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5929245A (ja) * 1982-08-11 1984-02-16 Hitachi Ltd 感光性組成物及びそれを用いたパタ−ン形成方法
JPS60156785A (ja) * 1984-01-25 1985-08-16 Hitachi Ltd パタ−ン形成方法
JPS61258242A (ja) * 1985-04-17 1986-11-15 Hitachi Ltd 感光性組成物及びそれを用いたパタ−ン形成方法
IT1241115B (it) * 1990-04-12 1993-12-29 Vidoecolor Metodo per la realizzazione di una struttura a schermo di visualizzazione per un tubo a raggi catodici
KR19980020317A (ko) * 1996-09-06 1998-06-25 손욱 감광성 수지 조성물 및 이를 이용한 패턴의 형성방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5050914A (ja) * 1973-09-04 1975-05-07
JPS50125723A (ja) * 1974-03-20 1975-10-03
JPS552201A (en) * 1978-06-19 1980-01-09 Hitachi Ltd Photosensitive composition
JPS5534205A (en) * 1978-08-30 1980-03-10 Hitachi Ltd Photosensitive composition
JPS5538510A (en) * 1978-09-11 1980-03-18 Hitachi Ltd Photosensitive composition

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2166264C3 (de) * 1971-08-24 1978-04-06 K.K. Ricoh, Tokio Ein- oder Zweikomponenten-Diazotypiematerial und Verfahren zur Herstellung von Kopien
US4273842A (en) * 1977-04-13 1981-06-16 Hitachi, Ltd. Process for forming patternwise coated powder layer

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5050914A (ja) * 1973-09-04 1975-05-07
JPS50125723A (ja) * 1974-03-20 1975-10-03
JPS552201A (en) * 1978-06-19 1980-01-09 Hitachi Ltd Photosensitive composition
JPS5534205A (en) * 1978-08-30 1980-03-10 Hitachi Ltd Photosensitive composition
JPS5538510A (en) * 1978-09-11 1980-03-18 Hitachi Ltd Photosensitive composition

Also Published As

Publication number Publication date
EP0042704A3 (en) 1982-08-25
EP0042704A2 (en) 1981-12-30
KR860000069B1 (ko) 1986-02-06
DE3169355D1 (en) 1985-04-25
EP0042704B1 (en) 1985-03-20
KR830006805A (ko) 1983-10-06

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