JPS579004B2 - - Google Patents
Info
- Publication number
- JPS579004B2 JPS579004B2 JP12910475A JP12910475A JPS579004B2 JP S579004 B2 JPS579004 B2 JP S579004B2 JP 12910475 A JP12910475 A JP 12910475A JP 12910475 A JP12910475 A JP 12910475A JP S579004 B2 JPS579004 B2 JP S579004B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Projection-Type Copiers In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50129104A JPS5252579A (en) | 1975-10-27 | 1975-10-27 | Clearance adjusng method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50129104A JPS5252579A (en) | 1975-10-27 | 1975-10-27 | Clearance adjusng method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5252579A JPS5252579A (en) | 1977-04-27 |
JPS579004B2 true JPS579004B2 (enrdf_load_html_response) | 1982-02-19 |
Family
ID=15001156
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50129104A Granted JPS5252579A (en) | 1975-10-27 | 1975-10-27 | Clearance adjusng method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5252579A (enrdf_load_html_response) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS562630A (en) * | 1979-06-22 | 1981-01-12 | Hitachi Ltd | Installing of wafer position in projection aligner |
JPS6144427Y2 (enrdf_load_html_response) * | 1980-05-08 | 1986-12-15 | ||
JPS6144428Y2 (enrdf_load_html_response) * | 1980-05-08 | 1986-12-15 | ||
JPS6218033Y2 (enrdf_load_html_response) * | 1980-06-23 | 1987-05-09 | ||
JPS6144429Y2 (enrdf_load_html_response) * | 1980-08-13 | 1986-12-15 | ||
JPS57204547A (en) * | 1981-06-12 | 1982-12-15 | Hitachi Ltd | Exposing method |
JPS5875834A (ja) * | 1981-10-30 | 1983-05-07 | Hitachi Ltd | プロキシミティ露光装置 |
JPS58103136A (ja) * | 1981-12-16 | 1983-06-20 | Nippon Kogaku Kk <Nikon> | 基板の傾き設定装置 |
JPS58156937A (ja) * | 1982-03-12 | 1983-09-19 | Hitachi Ltd | 露光装置 |
JPS58175631U (ja) * | 1982-05-18 | 1983-11-24 | 株式会社東芝 | 平行出し装置 |
JPS5917247A (ja) * | 1982-07-21 | 1984-01-28 | Hitachi Ltd | 露光装置 |
US4472824A (en) * | 1982-08-04 | 1984-09-18 | The Perkin-Elmer Corporation | Apparatus for effecting alignment and spacing control of a mask and wafer for use in X-ray lithography |
JPS5975625A (ja) * | 1982-10-22 | 1984-04-28 | Fujitsu Ltd | 基板支持方法 |
JPS60100005A (ja) * | 1983-11-04 | 1985-06-03 | Canon Inc | 間隔調整装置 |
JPS6099671A (ja) * | 1983-11-04 | 1985-06-03 | Canon Inc | 熱転写記録装置 |
US4932781A (en) * | 1983-11-04 | 1990-06-12 | Canon Kabushiki Kaisha | Gap measuring apparatus using interference fringes of reflected light |
JPS60100004A (ja) * | 1983-11-04 | 1985-06-03 | Canon Inc | 間隔調整装置 |
JPS611021A (ja) * | 1985-05-13 | 1986-01-07 | Hitachi Ltd | 露光装置における位置設定方法 |
JPH0628222B2 (ja) * | 1986-05-28 | 1994-04-13 | 株式会社日立製作所 | プロキシミテイ方式の露光装置 |
JPH0789047B2 (ja) * | 1986-08-20 | 1995-09-27 | 富士通株式会社 | ウエハ・マスク間ギャップ合わせ方法 |
JP2017032308A (ja) * | 2015-07-29 | 2017-02-09 | 三菱重工業株式会社 | 隙間計測装置、及び、隙間管理システム |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5123609Y2 (enrdf_load_html_response) * | 1971-04-09 | 1976-06-17 | ||
JPS5243692B2 (enrdf_load_html_response) * | 1973-03-26 | 1977-11-01 |
-
1975
- 1975-10-27 JP JP50129104A patent/JPS5252579A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5252579A (en) | 1977-04-27 |