JPS5785234A - Pattern formation - Google Patents

Pattern formation

Info

Publication number
JPS5785234A
JPS5785234A JP16229880A JP16229880A JPS5785234A JP S5785234 A JPS5785234 A JP S5785234A JP 16229880 A JP16229880 A JP 16229880A JP 16229880 A JP16229880 A JP 16229880A JP S5785234 A JPS5785234 A JP S5785234A
Authority
JP
Japan
Prior art keywords
thin film
resist
negative
radiation sensitive
type radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16229880A
Other languages
Japanese (ja)
Inventor
Hiroyuki Shigemura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP16229880A priority Critical patent/JPS5785234A/en
Publication of JPS5785234A publication Critical patent/JPS5785234A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To improve resolving power by a method wherein two kinds of negative-type radiation sensitive resists having different solubility are used to form double structure by using the resist with low solubility as the lower layer. CONSTITUTION:The thin film 2 of the first negative-type radiation sensitive resist with a film thickness of about 1,000-3,000Angstrom is formed on a substrate 1. Next, the thin film 3 of the second negative-type radiation sensitive resist with a film thickness of about 2,000-6,000Angstrom is formed on the thin film 2. At that time, as the first and the second reists, if the conditions that the resist having different solubility, equal sensitivity and low solubility to the same solvent is used as the lower layer are satisfied, any resist is acceptable. Next, radiations 4 are aimed at the thin film 3 and development processing is applied to the thin film 3 and then a convex pattern is formed with the first and the second thin films.
JP16229880A 1980-11-18 1980-11-18 Pattern formation Pending JPS5785234A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16229880A JPS5785234A (en) 1980-11-18 1980-11-18 Pattern formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16229880A JPS5785234A (en) 1980-11-18 1980-11-18 Pattern formation

Publications (1)

Publication Number Publication Date
JPS5785234A true JPS5785234A (en) 1982-05-27

Family

ID=15751831

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16229880A Pending JPS5785234A (en) 1980-11-18 1980-11-18 Pattern formation

Country Status (1)

Country Link
JP (1) JPS5785234A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05152199A (en) * 1991-11-27 1993-06-18 Nec Kansai Ltd Method for forming resist pattern

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05152199A (en) * 1991-11-27 1993-06-18 Nec Kansai Ltd Method for forming resist pattern

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