JPS578460B2 - - Google Patents
Info
- Publication number
- JPS578460B2 JPS578460B2 JP7674576A JP7674576A JPS578460B2 JP S578460 B2 JPS578460 B2 JP S578460B2 JP 7674576 A JP7674576 A JP 7674576A JP 7674576 A JP7674576 A JP 7674576A JP S578460 B2 JPS578460 B2 JP S578460B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/0166—Diazonium salts or compounds characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7674576A JPS533216A (en) | 1976-06-28 | 1976-06-28 | Diazo photosensitive composition |
| US05/810,699 US4172729A (en) | 1976-06-28 | 1977-06-28 | Photosensitive diazo lithographic printing plate with oxalic acid as stabilizer |
| GB27077/77A GB1548344A (en) | 1976-06-28 | 1977-06-28 | Photosensitive diazo pre-sensitized printing plates |
| DE19772729173 DE2729173A1 (de) | 1976-06-28 | 1977-06-28 | Lichtempfindliche diazomasse |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7674576A JPS533216A (en) | 1976-06-28 | 1976-06-28 | Diazo photosensitive composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS533216A JPS533216A (en) | 1978-01-12 |
| JPS578460B2 true JPS578460B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1982-02-16 |
Family
ID=13614130
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7674576A Granted JPS533216A (en) | 1976-06-28 | 1976-06-28 | Diazo photosensitive composition |
Country Status (4)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61119949A (ja) * | 1984-10-03 | 1986-06-07 | バリー エル．バトラー | 太陽熱集熱装置 |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5538510A (en) * | 1978-09-11 | 1980-03-18 | Hitachi Ltd | Photosensitive composition |
| JPS5647411A (en) * | 1979-09-28 | 1981-04-30 | Nippon Oil & Fats Co Ltd | Polymer of polyoxyalkylene glycol monoacrylate or monomethacrylate and lubricant, antistatic and cosmetic agent therefrom |
| JPS5997136A (ja) * | 1982-11-26 | 1984-06-04 | Fuji Photo Film Co Ltd | 感光性組成物 |
| JPS59101651A (ja) * | 1982-12-02 | 1984-06-12 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JPS603632A (ja) * | 1983-06-21 | 1985-01-10 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JPS6238471A (ja) * | 1985-08-14 | 1987-02-19 | Fuji Photo Film Co Ltd | 感光性平版印刷版の製造方法 |
| US4877711A (en) * | 1986-05-19 | 1989-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group |
| JP2550346B2 (ja) * | 1987-05-18 | 1996-11-06 | 光陽化学工業株式会社 | 平版製版用感光性組成物 |
| JPS6463953A (en) * | 1987-09-04 | 1989-03-09 | Nippon Catalytic Chem Ind | Photosensitive composition |
| JP2604770B2 (ja) * | 1987-12-28 | 1997-04-30 | 工業技術院長 | 感光性樹脂組成物 |
| US4914000A (en) * | 1988-02-03 | 1990-04-03 | Hoechst Celanese Corporation | Three dimensional reproduction material diazonium condensates and use in light sensitive |
| DE69230237T2 (de) * | 1991-07-04 | 2000-02-17 | Mitsubishi Chemical Corp., Tokio/Tokyo | Licht empfindliche Zusammensetzung |
| JP2652100B2 (ja) * | 1991-12-17 | 1997-09-10 | 富士写真フイルム株式会社 | 感光性組成物 |
| EP0583962B1 (en) * | 1992-08-17 | 1997-07-16 | Konica Corporation | Light-sensitive composition |
| KR20020077948A (ko) | 2001-04-03 | 2002-10-18 | 삼성에스디아이 주식회사 | 칼라음극선관용 포토레지스트 제조용 단량체,칼라음극선관용 포토레지스트 중합체, 칼라음극선관용포토레지스트 조성물 및 칼라음극선관용 형광막 조성물 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE540601A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1950-12-06 | |||
| US2703756A (en) * | 1951-12-12 | 1955-03-08 | Gen Aniline & Film Corp | Vesicular prints and process of making same |
| US2937085A (en) * | 1954-01-11 | 1960-05-17 | Ditto Inc | Composite photosensitive plate, and method of making printing plate therefrom |
| US2871119A (en) * | 1955-02-21 | 1959-01-27 | Dietzgen Co Eugene | Diazotype reproduction material and method |
| US2922715A (en) * | 1956-03-26 | 1960-01-26 | Polychrome Corp | Presensitized printing plate and method for preparing same |
| DE1183919B (de) * | 1958-12-29 | 1964-12-23 | Polychrome Corp | Verfahren zur Herstellung einer vorsensibilisierten Flachdruckplatte mit metallischer Grundschicht unter Verwendung einer Haftschicht |
| US3064562A (en) * | 1959-01-12 | 1962-11-20 | Lithoplate Inc | Acrylic acid monomer coatings for metal bases |
| NL267931A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1960-08-05 | 1900-01-01 | ||
| US3334584A (en) * | 1962-09-24 | 1967-08-08 | William C Toland | Production of lithographic printing plates |
| US3181461A (en) * | 1963-05-23 | 1965-05-04 | Howard A Fromson | Photographic plate |
| US3615532A (en) * | 1963-12-09 | 1971-10-26 | Union Carbide Corp | Printing plate compositions |
| US3408192A (en) * | 1964-06-10 | 1968-10-29 | Ibm | Light-sensitive diazotype compositions and elements |
| US3615484A (en) * | 1966-12-26 | 1971-10-26 | Ricoh Kk | Two-component diazo-type photoprinting material for use in wet development |
| JPS4825050B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1968-11-07 | 1973-07-26 | ||
| US3679419A (en) * | 1969-05-20 | 1972-07-25 | Azoplate Corp | Light-sensitive diazo condensate containing reproduction material |
| US3759711A (en) * | 1970-09-16 | 1973-09-18 | Eastman Kodak Co | Er compositions and elements nitrogen linked apperding quinone diazide light sensitive vinyl polym |
| US3700480A (en) * | 1971-01-06 | 1972-10-24 | Memorex Corp | Vesicular film |
| US3841874A (en) * | 1971-03-15 | 1974-10-15 | Xidex Corp | Method for improving the photographic characteristics of vesicular photographic materials |
| JPS527364B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1973-07-23 | 1977-03-02 | ||
| US4123276A (en) * | 1974-02-28 | 1978-10-31 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
| JPS5534929B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1974-02-28 | 1980-09-10 |
-
1976
- 1976-06-28 JP JP7674576A patent/JPS533216A/ja active Granted
-
1977
- 1977-06-28 US US05/810,699 patent/US4172729A/en not_active Expired - Lifetime
- 1977-06-28 GB GB27077/77A patent/GB1548344A/en not_active Expired
- 1977-06-28 DE DE19772729173 patent/DE2729173A1/de not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61119949A (ja) * | 1984-10-03 | 1986-06-07 | バリー エル．バトラー | 太陽熱集熱装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS533216A (en) | 1978-01-12 |
| US4172729A (en) | 1979-10-30 |
| DE2729173A1 (de) | 1978-01-05 |
| GB1548344A (en) | 1979-07-11 |