JPS6463953A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPS6463953A JPS6463953A JP22026387A JP22026387A JPS6463953A JP S6463953 A JPS6463953 A JP S6463953A JP 22026387 A JP22026387 A JP 22026387A JP 22026387 A JP22026387 A JP 22026387A JP S6463953 A JPS6463953 A JP S6463953A
- Authority
- JP
- Japan
- Prior art keywords
- obtd
- titled composition
- property
- contg
- meth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
Abstract
PURPOSE:To obtain the excellent photosensitive property, developing speed, plate wear property, fat sensitive property and stability with age of the titled composition by incorporating an diazo compd. and a polymer obtd. by using a specified (meth)acrylate oligomer (a) contg. specified hydroxyl group as an essential polymerizable monomer component in the titled composition. CONSTITUTION:The titled composition comprises the polymer A obtd. by using the (meth)acrylate oligomer (a) contg. hydroxyl group shown by formula I as the essential polymerizable monomer component and the diazo compd. B. In formula I, R is hydrogen atom. or methyl group, and may be the same or the different with each other, (n) and (p) are each an integer of 1-5. Thus, the excellent stability with age of the titled composition is obtd., and the PS plate obtd. by using the titled composition has all the satisfactory performances such as the photosensitivity, the developing speed, the plate wear property and the fat sensitivity property, etc.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22026387A JPS6463953A (en) | 1987-09-04 | 1987-09-04 | Photosensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22026387A JPS6463953A (en) | 1987-09-04 | 1987-09-04 | Photosensitive composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6463953A true JPS6463953A (en) | 1989-03-09 |
Family
ID=16748442
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22026387A Pending JPS6463953A (en) | 1987-09-04 | 1987-09-04 | Photosensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6463953A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0194338A (en) * | 1987-10-06 | 1989-04-13 | Mitsubishi Kasei Corp | Photosensitive composition |
JPH01179146A (en) * | 1988-01-08 | 1989-07-17 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS533216A (en) * | 1976-06-28 | 1978-01-12 | Fuji Photo Film Co Ltd | Diazo photosensitive composition |
JPS53120903A (en) * | 1977-03-29 | 1978-10-21 | Okamoto Kagaku Kogyo Kk | Photosensitive layer for printing plate |
JPS58221841A (en) * | 1982-06-18 | 1983-12-23 | Nippon Kayaku Co Ltd | Photosetting resin composition |
-
1987
- 1987-09-04 JP JP22026387A patent/JPS6463953A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS533216A (en) * | 1976-06-28 | 1978-01-12 | Fuji Photo Film Co Ltd | Diazo photosensitive composition |
JPS53120903A (en) * | 1977-03-29 | 1978-10-21 | Okamoto Kagaku Kogyo Kk | Photosensitive layer for printing plate |
JPS58221841A (en) * | 1982-06-18 | 1983-12-23 | Nippon Kayaku Co Ltd | Photosetting resin composition |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0194338A (en) * | 1987-10-06 | 1989-04-13 | Mitsubishi Kasei Corp | Photosensitive composition |
JPH01179146A (en) * | 1988-01-08 | 1989-07-17 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition |
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