JPS6463953A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS6463953A
JPS6463953A JP22026387A JP22026387A JPS6463953A JP S6463953 A JPS6463953 A JP S6463953A JP 22026387 A JP22026387 A JP 22026387A JP 22026387 A JP22026387 A JP 22026387A JP S6463953 A JPS6463953 A JP S6463953A
Authority
JP
Japan
Prior art keywords
obtd
titled composition
property
contg
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22026387A
Other languages
Japanese (ja)
Inventor
Kiyoshi Kawamura
Nobuaki Otsuki
Sadanori Sano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Shokubai Co Ltd
Original Assignee
Nippon Shokubai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Shokubai Co Ltd filed Critical Nippon Shokubai Co Ltd
Priority to JP22026387A priority Critical patent/JPS6463953A/en
Publication of JPS6463953A publication Critical patent/JPS6463953A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To obtain the excellent photosensitive property, developing speed, plate wear property, fat sensitive property and stability with age of the titled composition by incorporating an diazo compd. and a polymer obtd. by using a specified (meth)acrylate oligomer (a) contg. specified hydroxyl group as an essential polymerizable monomer component in the titled composition. CONSTITUTION:The titled composition comprises the polymer A obtd. by using the (meth)acrylate oligomer (a) contg. hydroxyl group shown by formula I as the essential polymerizable monomer component and the diazo compd. B. In formula I, R is hydrogen atom. or methyl group, and may be the same or the different with each other, (n) and (p) are each an integer of 1-5. Thus, the excellent stability with age of the titled composition is obtd., and the PS plate obtd. by using the titled composition has all the satisfactory performances such as the photosensitivity, the developing speed, the plate wear property and the fat sensitivity property, etc.
JP22026387A 1987-09-04 1987-09-04 Photosensitive composition Pending JPS6463953A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22026387A JPS6463953A (en) 1987-09-04 1987-09-04 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22026387A JPS6463953A (en) 1987-09-04 1987-09-04 Photosensitive composition

Publications (1)

Publication Number Publication Date
JPS6463953A true JPS6463953A (en) 1989-03-09

Family

ID=16748442

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22026387A Pending JPS6463953A (en) 1987-09-04 1987-09-04 Photosensitive composition

Country Status (1)

Country Link
JP (1) JPS6463953A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0194338A (en) * 1987-10-06 1989-04-13 Mitsubishi Kasei Corp Photosensitive composition
JPH01179146A (en) * 1988-01-08 1989-07-17 Tokyo Ohka Kogyo Co Ltd Photosensitive composition

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS533216A (en) * 1976-06-28 1978-01-12 Fuji Photo Film Co Ltd Diazo photosensitive composition
JPS53120903A (en) * 1977-03-29 1978-10-21 Okamoto Kagaku Kogyo Kk Photosensitive layer for printing plate
JPS58221841A (en) * 1982-06-18 1983-12-23 Nippon Kayaku Co Ltd Photosetting resin composition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS533216A (en) * 1976-06-28 1978-01-12 Fuji Photo Film Co Ltd Diazo photosensitive composition
JPS53120903A (en) * 1977-03-29 1978-10-21 Okamoto Kagaku Kogyo Kk Photosensitive layer for printing plate
JPS58221841A (en) * 1982-06-18 1983-12-23 Nippon Kayaku Co Ltd Photosetting resin composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0194338A (en) * 1987-10-06 1989-04-13 Mitsubishi Kasei Corp Photosensitive composition
JPH01179146A (en) * 1988-01-08 1989-07-17 Tokyo Ohka Kogyo Co Ltd Photosensitive composition

Similar Documents

Publication Publication Date Title
SE7906120L (en) FOR LENS MANUFACTURING DEDICATED COPOLYMES WITH HIGH REFERENCE INDEX
JPS55118030A (en) Photopolymerizable composition
ES8204754A1 (en) Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-triazine.
JPS5666841A (en) Photographic material
EP0313665A4 (en) Actinic radiation-curable composition for cast polymerization and product of cast polymerization.
EP0358871A3 (en) Radiation-sensitive positive resist composition
KR920006382A (en) Method for Controlling Particle Size in Preparation of Expandable Styrene Polymer by Suspension Polymerization
JPS564144A (en) Photosensitive composition
JPS6463953A (en) Photosensitive composition
JPS53111399A (en) Amorphous dicyclopentadiene ring-opening polymer
DK395083A (en) PHYSICAL SENSITIVE ELASTOMES, SPECIFICALLY USED FOR FLEXOGRAPHIC REPRODUCTION
KR840003851A (en) Photoresist composition
JPS5614232A (en) Negative type resist resin
JPS531284A (en) Photosensitive compositions
JPS5762047A (en) Image-forming material
JPS64948A (en) Photosensitive resin composition
JPS56122028A (en) Alkali-soluble photosensitive resin composition
JPS6413540A (en) Photosensitive composition and pattern forming method using same
JPS6446747A (en) Photoresist composition
JPS5361643A (en) Photosensitive compositions
JPS52117987A (en) Production of methyl methacrylate polymer
JPS5352588A (en) Preparation of developers for electrostatic
KR960024670A (en) Photosensitive Resin Composition
JPS56161550A (en) Leucotriphenylmethane polymer and photoconductive composition using it
JPS5316792A (en) Novel copolymer resin and its polymerization