JPS5778042A - Method for printing of photomask - Google Patents
Method for printing of photomaskInfo
- Publication number
- JPS5778042A JPS5778042A JP15423080A JP15423080A JPS5778042A JP S5778042 A JPS5778042 A JP S5778042A JP 15423080 A JP15423080 A JP 15423080A JP 15423080 A JP15423080 A JP 15423080A JP S5778042 A JPS5778042 A JP S5778042A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- pressure
- masks
- chambers
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Abstract
PURPOSE:To make a good tight contact state over the entire surface of a master mask and a work mask and obtain the work mask having faithful pattern images by adjusting the change of the pressure acting upon the rear surfaces of both masks with time. CONSTITUTION:A master mask 1 and a work mask 2 coated with a photosensitive material are brought into contact with the windows of partitioned chambers 6, 7 via O-rings 3, 4, and the inside of the chambers 6, 7 located on the rear surfaces of the masks 1, 2 is evacuated to a vacuum, whereby the masks are held. Thence, the surface of the mask 1 and the surface of the mask 2 are brought into contact with each other and the pressure is gently boosted from the start pressure P0 of pressurizing acting in a vacuum state from the chambers 6, 7 once to relatively low pressure P1. They are held in that state for t1-t2 times unde the pressure P1, and during this time, the vacuum in the spacing 8 between the mask 1 and the mask 2 is improved as far as possible, after which the pressure is increased up to the set pressure P2 at a much higher pressurizing speed (graph II), to develop the tight contact between the masks 1 and 2, thence the masks are exposed by the light radiated from a light source 9.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15423080A JPS5778042A (en) | 1980-10-31 | 1980-10-31 | Method for printing of photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15423080A JPS5778042A (en) | 1980-10-31 | 1980-10-31 | Method for printing of photomask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5778042A true JPS5778042A (en) | 1982-05-15 |
Family
ID=15579687
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15423080A Pending JPS5778042A (en) | 1980-10-31 | 1980-10-31 | Method for printing of photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5778042A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5996730A (en) * | 1982-11-26 | 1984-06-04 | Hitachi Ltd | Mark aligner |
-
1980
- 1980-10-31 JP JP15423080A patent/JPS5778042A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5996730A (en) * | 1982-11-26 | 1984-06-04 | Hitachi Ltd | Mark aligner |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5223936A (en) | Exposure control process for photography printing | |
JPS5274341A (en) | Electrophotographic process | |
JPS5778042A (en) | Method for printing of photomask | |
JPS51114120A (en) | Photographic material | |
JPS5354239A (en) | Method of bonding photosensitive flexographic plate and rubber backingmaterial | |
JPS5732966A (en) | Endless type ultraviolet polish coating machine | |
JPS53147531A (en) | Forming method for thin film pattern | |
JPS5240339A (en) | Electrophotographic printing machine | |
JPS52152218A (en) | Picture printer | |
JPS53128277A (en) | Projection exposure method for negative resist | |
JPS5549834A (en) | Diagrammatic powder-applied layer forming method | |
JPS51124380A (en) | Photo mask | |
JPS6424252A (en) | Pattern forming method | |
JPS53145477A (en) | Electron beam exposure method | |
JPS51113628A (en) | Film negative shaping method in photoprinting of curved object | |
JPS52109941A (en) | Printing of roll paper | |
JPS542675A (en) | Exposure device | |
JPS5255381A (en) | Photo exposure method | |
JPS5366173A (en) | Light exposure method | |
JPS5229215A (en) | Method for preparing photographic paper | |
JPS57112745A (en) | Formation of image | |
JPS51138434A (en) | Method of rapidly printing transparent positive | |
JPS53135322A (en) | Photographic image formation method | |
JPS5299817A (en) | Exposure control method for photographic printing | |
JPS5744150A (en) | Photomask |