JPS5776147A - Production of sintered powdery article - Google Patents
Production of sintered powdery articleInfo
- Publication number
- JPS5776147A JPS5776147A JP15195880A JP15195880A JPS5776147A JP S5776147 A JPS5776147 A JP S5776147A JP 15195880 A JP15195880 A JP 15195880A JP 15195880 A JP15195880 A JP 15195880A JP S5776147 A JPS5776147 A JP S5776147A
- Authority
- JP
- Japan
- Prior art keywords
- powder
- additional
- sintered
- additional powder
- mother
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Powder Metallurgy (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15195880A JPS5776147A (en) | 1980-10-28 | 1980-10-28 | Production of sintered powdery article |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15195880A JPS5776147A (en) | 1980-10-28 | 1980-10-28 | Production of sintered powdery article |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5776147A true JPS5776147A (en) | 1982-05-13 |
| JPS6138257B2 JPS6138257B2 (https=) | 1986-08-28 |
Family
ID=15529923
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15195880A Granted JPS5776147A (en) | 1980-10-28 | 1980-10-28 | Production of sintered powdery article |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5776147A (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6127242A (en) * | 1994-02-10 | 2000-10-03 | Micron Technology, Inc. | Method for semiconductor device isolation using oxygen and nitrogen ion implantations to reduce lateral encroachment |
-
1980
- 1980-10-28 JP JP15195880A patent/JPS5776147A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6127242A (en) * | 1994-02-10 | 2000-10-03 | Micron Technology, Inc. | Method for semiconductor device isolation using oxygen and nitrogen ion implantations to reduce lateral encroachment |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6138257B2 (https=) | 1986-08-28 |
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