JPS5771812A - Fine powder of high-purity silicon carbide with high dispersibility, its production and composite plating therwith - Google Patents

Fine powder of high-purity silicon carbide with high dispersibility, its production and composite plating therwith

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Publication number
JPS5771812A
JPS5771812A JP55146800A JP14680080A JPS5771812A JP S5771812 A JPS5771812 A JP S5771812A JP 55146800 A JP55146800 A JP 55146800A JP 14680080 A JP14680080 A JP 14680080A JP S5771812 A JPS5771812 A JP S5771812A
Authority
JP
Japan
Prior art keywords
fine powder
silicon carbide
acid
composite plating
therwith
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55146800A
Other languages
Japanese (ja)
Other versions
JPH0116764B2 (en
Inventor
Akira Enomoto
Kazuhisa Hara
Yoshiyuki Iwata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IBIGAWA DENKI KOGYO KK
Ibiden Co Ltd
Ibigawa Electric Industry Co Ltd
Original Assignee
IBIGAWA DENKI KOGYO KK
Ibiden Co Ltd
Ibigawa Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IBIGAWA DENKI KOGYO KK, Ibiden Co Ltd, Ibigawa Electric Industry Co Ltd filed Critical IBIGAWA DENKI KOGYO KK
Priority to JP55146800A priority Critical patent/JPS5771812A/en
Publication of JPS5771812A publication Critical patent/JPS5771812A/en
Publication of JPH0116764B2 publication Critical patent/JPH0116764B2/ja
Granted legal-status Critical Current

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Abstract

PURPOSE: Starting fine powder of silicon carbide, from which impurities are removed by treating with an acid, is dipped in a basic aqueous solution and separated into solid and liquid phases and the pH value, then the acid content are adjusted to produce the titled fine powder of high dispersibility.
CONSTITUTION: A fine powder of silicon carbide of more than 5m2/g specific surface area, less than 1μ average particle size and 1.1W1.7 average aspect ratio is treated with an acid to elute impurities, then dipped in a basic aqueous solution of 0.01W1N and separated into solid phase and liquid one to produce a high-quality silicon carbide fine powder containing less than 0.3wt% acid of 4.5W8pH. Then, the resultant fine powder of silicon carbide is added to a nickel matrix so as to become 70W250g/l and the substrate is made the anode to effect the composite plating under conditions of 5.0W6.5pH, 50W70°C bath temperature and 10W30A/dm2 current density.
COPYRIGHT: (C)1982,JPO&Japio
JP55146800A 1980-10-22 1980-10-22 Fine powder of high-purity silicon carbide with high dispersibility, its production and composite plating therwith Granted JPS5771812A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55146800A JPS5771812A (en) 1980-10-22 1980-10-22 Fine powder of high-purity silicon carbide with high dispersibility, its production and composite plating therwith

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55146800A JPS5771812A (en) 1980-10-22 1980-10-22 Fine powder of high-purity silicon carbide with high dispersibility, its production and composite plating therwith

Publications (2)

Publication Number Publication Date
JPS5771812A true JPS5771812A (en) 1982-05-04
JPH0116764B2 JPH0116764B2 (en) 1989-03-27

Family

ID=15415809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55146800A Granted JPS5771812A (en) 1980-10-22 1980-10-22 Fine powder of high-purity silicon carbide with high dispersibility, its production and composite plating therwith

Country Status (1)

Country Link
JP (1) JPS5771812A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61149499A (en) * 1984-12-25 1986-07-08 Suzuki Motor Co Ltd Dispersion-plated film
JPS62107098A (en) * 1985-11-05 1987-05-18 Teikoku Piston Ring Co Ltd Plated composite ni-p alloy film having superior wear resistance
US4917866A (en) * 1987-11-12 1990-04-17 Toyota Jidosha Kabushiki Kaisha Production process of silicon carbide short fibers
JPH05148690A (en) * 1991-11-27 1993-06-15 C Uyemura & Co Ltd Composite plating method, composite material for composite plating and composite plated film
US5342502A (en) * 1992-08-31 1994-08-30 Industrial Technology Research Institute Method of preparing silicon carbide particles dispersed in an electrolytic bath for composite electroplating of metals
JP2009179726A (en) * 2008-01-31 2009-08-13 Tkx:Kk Manufacturing method of silicon carbide powder for grinding/polishing, and silicon carbide powder for grinding/polishing, and slurry for grinding/polishing
JP2009293086A (en) * 2008-06-05 2009-12-17 Honda Motor Co Ltd Composite plating treatment method
CN101913605A (en) * 2010-07-14 2010-12-15 中平能化集团易成新材料有限公司 Method for separating silicon carbide from silicon carbide micro-powder graded byproducts
CN105621415A (en) * 2016-03-21 2016-06-01 平顶山市国邦新材料有限公司 Silicon carbide slurry sedimentation homogenization system
JP2021063249A (en) * 2019-10-11 2021-04-22 三菱マテリアル株式会社 Terminal material for connectors

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61149499A (en) * 1984-12-25 1986-07-08 Suzuki Motor Co Ltd Dispersion-plated film
JPS62107098A (en) * 1985-11-05 1987-05-18 Teikoku Piston Ring Co Ltd Plated composite ni-p alloy film having superior wear resistance
US4917866A (en) * 1987-11-12 1990-04-17 Toyota Jidosha Kabushiki Kaisha Production process of silicon carbide short fibers
JPH05148690A (en) * 1991-11-27 1993-06-15 C Uyemura & Co Ltd Composite plating method, composite material for composite plating and composite plated film
US5342502A (en) * 1992-08-31 1994-08-30 Industrial Technology Research Institute Method of preparing silicon carbide particles dispersed in an electrolytic bath for composite electroplating of metals
JP2009179726A (en) * 2008-01-31 2009-08-13 Tkx:Kk Manufacturing method of silicon carbide powder for grinding/polishing, and silicon carbide powder for grinding/polishing, and slurry for grinding/polishing
JP2009293086A (en) * 2008-06-05 2009-12-17 Honda Motor Co Ltd Composite plating treatment method
CN101913605A (en) * 2010-07-14 2010-12-15 中平能化集团易成新材料有限公司 Method for separating silicon carbide from silicon carbide micro-powder graded byproducts
CN105621415A (en) * 2016-03-21 2016-06-01 平顶山市国邦新材料有限公司 Silicon carbide slurry sedimentation homogenization system
JP2021063249A (en) * 2019-10-11 2021-04-22 三菱マテリアル株式会社 Terminal material for connectors

Also Published As

Publication number Publication date
JPH0116764B2 (en) 1989-03-27

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