JPS577121A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS577121A
JPS577121A JP8203280A JP8203280A JPS577121A JP S577121 A JPS577121 A JP S577121A JP 8203280 A JP8203280 A JP 8203280A JP 8203280 A JP8203280 A JP 8203280A JP S577121 A JPS577121 A JP S577121A
Authority
JP
Japan
Prior art keywords
film
mask
injected
layer
prevent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8203280A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6258529B2 (member.php
Inventor
Seiichiro Kawamura
Tsutomu Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8203280A priority Critical patent/JPS577121A/ja
Publication of JPS577121A publication Critical patent/JPS577121A/ja
Publication of JPS6258529B2 publication Critical patent/JPS6258529B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P30/20—

Landscapes

  • Formation Of Insulating Films (AREA)
JP8203280A 1980-06-17 1980-06-17 Manufacture of semiconductor device Granted JPS577121A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8203280A JPS577121A (en) 1980-06-17 1980-06-17 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8203280A JPS577121A (en) 1980-06-17 1980-06-17 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS577121A true JPS577121A (en) 1982-01-14
JPS6258529B2 JPS6258529B2 (member.php) 1987-12-07

Family

ID=13763179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8203280A Granted JPS577121A (en) 1980-06-17 1980-06-17 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS577121A (member.php)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63114121A (ja) * 1986-07-07 1988-05-19 Nec Corp 半導体装置の製造方法
US4761423A (en) * 1984-01-06 1988-08-02 Chinoin Gyogyszer Es Vegyeszeti Termekek Gyara Rt. Seed dressing additive

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5343473A (en) * 1976-09-30 1978-04-19 Nec Corp Impurity driving-in method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5343473A (en) * 1976-09-30 1978-04-19 Nec Corp Impurity driving-in method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4761423A (en) * 1984-01-06 1988-08-02 Chinoin Gyogyszer Es Vegyeszeti Termekek Gyara Rt. Seed dressing additive
JPS63114121A (ja) * 1986-07-07 1988-05-19 Nec Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS6258529B2 (member.php) 1987-12-07

Similar Documents

Publication Publication Date Title
JPS5530846A (en) Method for manufacturing fixed memory
US3541676A (en) Method of forming field-effect transistors utilizing doped insulators as activator source
JPS577121A (en) Manufacture of semiconductor device
JPS5582458A (en) Preparation of semiconductor device
JPS56155531A (en) Manufacture of semiconductor device
JPS5688358A (en) Manufacture of semiconductor device
JPS54141585A (en) Semiconductor integrated circuit device
JPS56103445A (en) Production of semiconductor device
JPS5754333A (en) Semiconductor device and preparation thereof
JPS56125846A (en) Surface treatment of semiconductor
JPS5498572A (en) Surface stablization processing method for transistor
JPS5654070A (en) Method of manufacturing semiconductor device
JPS5766671A (en) Semiconductor device
JPS572576A (en) Semiconductor device
JPS5690528A (en) Surface treatment of semiconductor device
JPS55110056A (en) Semiconductor device
JPS5793574A (en) Manufacture of mis type semiconductor device
KR950021210A (ko) 반도체 소자의 산화막 형성방법
JPS5513951A (en) Manufacturing method of semiconductor device
JPS5739582A (en) Manufacture of inversion type insulated gate field effect transistor
JPS572579A (en) Manufacture of junction type field effect transistor
JPS54109385A (en) Field effect semiconductor device of high dielectric strength
JPS6449266A (en) Transistor
JPS561572A (en) Manufacture of semiconductor device
JPS5780778A (en) Manufacture of semiconductor device