JPS5770272A - Apparatus for controlling high frequency exciting type ion plating - Google Patents

Apparatus for controlling high frequency exciting type ion plating

Info

Publication number
JPS5770272A
JPS5770272A JP55144704A JP14470480A JPS5770272A JP S5770272 A JPS5770272 A JP S5770272A JP 55144704 A JP55144704 A JP 55144704A JP 14470480 A JP14470480 A JP 14470480A JP S5770272 A JPS5770272 A JP S5770272A
Authority
JP
Japan
Prior art keywords
high frequency
speed
ion plating
type ion
batches
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55144704A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0146588B2 (enExample
Inventor
Toshihiro Takao
Masayuki Okaniwa
Satoshi Kono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orient Watch Co Ltd
Original Assignee
Orient Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orient Watch Co Ltd filed Critical Orient Watch Co Ltd
Priority to JP55144704A priority Critical patent/JPS5770272A/ja
Publication of JPS5770272A publication Critical patent/JPS5770272A/ja
Publication of JPH0146588B2 publication Critical patent/JPH0146588B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
JP55144704A 1980-10-16 1980-10-16 Apparatus for controlling high frequency exciting type ion plating Granted JPS5770272A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55144704A JPS5770272A (en) 1980-10-16 1980-10-16 Apparatus for controlling high frequency exciting type ion plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55144704A JPS5770272A (en) 1980-10-16 1980-10-16 Apparatus for controlling high frequency exciting type ion plating

Publications (2)

Publication Number Publication Date
JPS5770272A true JPS5770272A (en) 1982-04-30
JPH0146588B2 JPH0146588B2 (enExample) 1989-10-09

Family

ID=15368338

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55144704A Granted JPS5770272A (en) 1980-10-16 1980-10-16 Apparatus for controlling high frequency exciting type ion plating

Country Status (1)

Country Link
JP (1) JPS5770272A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59175113A (ja) * 1983-03-23 1984-10-03 Seiko Instr & Electronics Ltd 磁性薄膜の作製装置
JPS6226858A (ja) * 1985-07-26 1987-02-04 Stanley Electric Co Ltd 遮光層を有する薄膜トランジスタ−アセンブリ−
DE102010003661A1 (de) * 2010-04-06 2011-11-17 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur Elektronenstrahlverdampfung dielektrischer Materialien

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59175113A (ja) * 1983-03-23 1984-10-03 Seiko Instr & Electronics Ltd 磁性薄膜の作製装置
JPS6226858A (ja) * 1985-07-26 1987-02-04 Stanley Electric Co Ltd 遮光層を有する薄膜トランジスタ−アセンブリ−
DE102010003661A1 (de) * 2010-04-06 2011-11-17 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur Elektronenstrahlverdampfung dielektrischer Materialien

Also Published As

Publication number Publication date
JPH0146588B2 (enExample) 1989-10-09

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