JPS5769735A - Forming method for contact - Google Patents
Forming method for contactInfo
- Publication number
- JPS5769735A JPS5769735A JP14715780A JP14715780A JPS5769735A JP S5769735 A JPS5769735 A JP S5769735A JP 14715780 A JP14715780 A JP 14715780A JP 14715780 A JP14715780 A JP 14715780A JP S5769735 A JPS5769735 A JP S5769735A
- Authority
- JP
- Japan
- Prior art keywords
- film
- forming
- insulating film
- region
- roughen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14715780A JPS5769735A (en) | 1980-10-20 | 1980-10-20 | Forming method for contact |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14715780A JPS5769735A (en) | 1980-10-20 | 1980-10-20 | Forming method for contact |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5769735A true JPS5769735A (en) | 1982-04-28 |
Family
ID=15423868
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14715780A Pending JPS5769735A (en) | 1980-10-20 | 1980-10-20 | Forming method for contact |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5769735A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS605526A (ja) * | 1983-06-24 | 1985-01-12 | Toshiba Corp | 半導体装置の製造方法 |
EP0367511A2 (en) * | 1988-11-03 | 1990-05-09 | STMicroelectronics, Inc. | Method for reducing the surface reflectance of a metal layer during semiconductor processing |
-
1980
- 1980-10-20 JP JP14715780A patent/JPS5769735A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS605526A (ja) * | 1983-06-24 | 1985-01-12 | Toshiba Corp | 半導体装置の製造方法 |
EP0367511A2 (en) * | 1988-11-03 | 1990-05-09 | STMicroelectronics, Inc. | Method for reducing the surface reflectance of a metal layer during semiconductor processing |
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