JPS5767046A - Manufacture of glass base material for laser - Google Patents
Manufacture of glass base material for laserInfo
- Publication number
- JPS5767046A JPS5767046A JP13866780A JP13866780A JPS5767046A JP S5767046 A JPS5767046 A JP S5767046A JP 13866780 A JP13866780 A JP 13866780A JP 13866780 A JP13866780 A JP 13866780A JP S5767046 A JPS5767046 A JP S5767046A
- Authority
- JP
- Japan
- Prior art keywords
- torch
- fed
- base material
- glass
- starting material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title abstract 5
- 239000011521 glass Substances 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000007858 starting material Substances 0.000 abstract 3
- 229910003910 SiCl4 Inorganic materials 0.000 abstract 2
- ILAHWRKJUDSMFH-UHFFFAOYSA-N boron tribromide Chemical compound BrB(Br)Br ILAHWRKJUDSMFH-UHFFFAOYSA-N 0.000 abstract 2
- 239000010419 fine particle Substances 0.000 abstract 2
- 239000005373 porous glass Substances 0.000 abstract 2
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 239000012808 vapor phase Substances 0.000 abstract 2
- 229910015845 BBr3 Inorganic materials 0.000 abstract 1
- 229910006113 GeCl4 Inorganic materials 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 239000002019 doping agent Substances 0.000 abstract 1
- 239000008246 gaseous mixture Substances 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 150000002798 neodymium compounds Chemical class 0.000 abstract 1
- PLDDOISOJJCEMH-UHFFFAOYSA-N neodymium oxide Inorganic materials [O-2].[O-2].[O-2].[Nd+3].[Nd+3] PLDDOISOJJCEMH-UHFFFAOYSA-N 0.000 abstract 1
- 239000000075 oxide glass Substances 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 abstract 1
- IEXRMSFAVATTJX-UHFFFAOYSA-N tetrachlorogermane Chemical compound Cl[Ge](Cl)(Cl)Cl IEXRMSFAVATTJX-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/17—Solid materials amorphous, e.g. glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/10—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/28—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/34—Liquid, e.g. mist or aerosol
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Electromagnetism (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13866780A JPS5767046A (en) | 1980-10-06 | 1980-10-06 | Manufacture of glass base material for laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13866780A JPS5767046A (en) | 1980-10-06 | 1980-10-06 | Manufacture of glass base material for laser |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5767046A true JPS5767046A (en) | 1982-04-23 |
JPS6259059B2 JPS6259059B2 (enrdf_load_stackoverflow) | 1987-12-09 |
Family
ID=15227304
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13866780A Granted JPS5767046A (en) | 1980-10-06 | 1980-10-06 | Manufacture of glass base material for laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5767046A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63184386A (ja) * | 1986-09-18 | 1988-07-29 | Furukawa Electric Co Ltd:The | 光ファイバと光ファイバ型発光体 |
JPH05129708A (ja) * | 1991-04-22 | 1993-05-25 | Alcatel Nv | エルビウムドープフアイバ光増幅器を有する遠隔通信システム |
JPH06234537A (ja) * | 1992-12-28 | 1994-08-23 | Corning Inc | 光ファイバ・プリフォ−ムの作成方法 |
-
1980
- 1980-10-06 JP JP13866780A patent/JPS5767046A/ja active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63184386A (ja) * | 1986-09-18 | 1988-07-29 | Furukawa Electric Co Ltd:The | 光ファイバと光ファイバ型発光体 |
JPH05129708A (ja) * | 1991-04-22 | 1993-05-25 | Alcatel Nv | エルビウムドープフアイバ光増幅器を有する遠隔通信システム |
JPH06234537A (ja) * | 1992-12-28 | 1994-08-23 | Corning Inc | 光ファイバ・プリフォ−ムの作成方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6259059B2 (enrdf_load_stackoverflow) | 1987-12-09 |
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