JPS5767046A - Manufacture of glass base material for laser - Google Patents
Manufacture of glass base material for laserInfo
- Publication number
- JPS5767046A JPS5767046A JP13866780A JP13866780A JPS5767046A JP S5767046 A JPS5767046 A JP S5767046A JP 13866780 A JP13866780 A JP 13866780A JP 13866780 A JP13866780 A JP 13866780A JP S5767046 A JPS5767046 A JP S5767046A
- Authority
- JP
- Japan
- Prior art keywords
- torch
- fed
- base material
- glass
- starting material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/17—Solid materials amorphous, e.g. glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/10—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/28—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/34—Liquid, e.g. mist or aerosol
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Lasers (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
PURPOSE:To manufacture a glass base material with a low impurity content for laser of high performance by forming a porous glass body contg. Nd2O3 by a vapor axial deposition method while feeding fine particles of a neodymium compound soln. to a high temp. reaction section and by treating the glass body at a high temp. CONSTITUTION:Vapor phase starting material prepared by mixing SiCl4 as orincipal starting material with a dopant for controlling refractive index distrubtion such as GeCl4,PCl3 or BBr3 is fed to a torch 6a from a feeding pipe 7a together with H2, O2, He, etc., and an Nd compound soln. converted into mistlike particles with an ultrasonic oscillator 11 is also fed to the torch 6a together with Ar. On the other hand, SiCl4 as vapor phase starting material is fed to a torch 6b from a feeding pipe 7b. These materials are decomposed with the flames 8a, 8b of the torches and deposited on a starting substrate 2 as fine particles of oxide glass. Simultaneously, by pulling up the substrate 2 while rotating it, a porous glass base material 4 is formed. This material 4 is heated to about 1,400-1,500 deg.C in a gaseous mixture of He with Cl2 and converted into transparent glass by defoaming.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13866780A JPS5767046A (en) | 1980-10-06 | 1980-10-06 | Manufacture of glass base material for laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13866780A JPS5767046A (en) | 1980-10-06 | 1980-10-06 | Manufacture of glass base material for laser |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5767046A true JPS5767046A (en) | 1982-04-23 |
JPS6259059B2 JPS6259059B2 (en) | 1987-12-09 |
Family
ID=15227304
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13866780A Granted JPS5767046A (en) | 1980-10-06 | 1980-10-06 | Manufacture of glass base material for laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5767046A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63184386A (en) * | 1986-09-18 | 1988-07-29 | Furukawa Electric Co Ltd:The | Optical fiber and optical fiber type light emitting material |
JPH05129708A (en) * | 1991-04-22 | 1993-05-25 | Alcatel Nv | Telecommunication system with erbium-doped fiber optical amplifier |
JPH06234537A (en) * | 1992-12-28 | 1994-08-23 | Corning Inc | Method for forming optical fiber preform |
-
1980
- 1980-10-06 JP JP13866780A patent/JPS5767046A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63184386A (en) * | 1986-09-18 | 1988-07-29 | Furukawa Electric Co Ltd:The | Optical fiber and optical fiber type light emitting material |
JPH05129708A (en) * | 1991-04-22 | 1993-05-25 | Alcatel Nv | Telecommunication system with erbium-doped fiber optical amplifier |
JPH06234537A (en) * | 1992-12-28 | 1994-08-23 | Corning Inc | Method for forming optical fiber preform |
Also Published As
Publication number | Publication date |
---|---|
JPS6259059B2 (en) | 1987-12-09 |
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