JPS5764929A - Carrying apparatus for glass substrate - Google Patents
Carrying apparatus for glass substrateInfo
- Publication number
- JPS5764929A JPS5764929A JP55140333A JP14033380A JPS5764929A JP S5764929 A JPS5764929 A JP S5764929A JP 55140333 A JP55140333 A JP 55140333A JP 14033380 A JP14033380 A JP 14033380A JP S5764929 A JPS5764929 A JP S5764929A
- Authority
- JP
- Japan
- Prior art keywords
- arm
- substrate
- moved downward
- given amount
- cassette
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title abstract 8
- 239000011521 glass Substances 0.000 title abstract 2
- 239000000428 dust Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Library & Information Science (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Warehouses Or Storage Devices (AREA)
- Sheets, Magazines, And Separation Thereof (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55140333A JPS5764929A (en) | 1980-10-07 | 1980-10-07 | Carrying apparatus for glass substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55140333A JPS5764929A (en) | 1980-10-07 | 1980-10-07 | Carrying apparatus for glass substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5764929A true JPS5764929A (en) | 1982-04-20 |
JPH0245323B2 JPH0245323B2 (enrdf_load_stackoverflow) | 1990-10-09 |
Family
ID=15266379
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55140333A Granted JPS5764929A (en) | 1980-10-07 | 1980-10-07 | Carrying apparatus for glass substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5764929A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS616826A (ja) * | 1984-06-20 | 1986-01-13 | Canon Inc | 位置決め装置 |
JPS616825A (ja) * | 1984-06-20 | 1986-01-13 | Canon Inc | 位置決め装置 |
CN101284601B (zh) | 2007-04-11 | 2011-05-04 | 威光自动化科技股份有限公司 | 托盘内载基片的撷取装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5320263A (en) * | 1976-08-06 | 1978-02-24 | Komatsu Ltd | Automatic fork positioning apparatus for use in fork lift |
JPS54109760A (en) * | 1978-02-16 | 1979-08-28 | Toshiba Corp | Carrier for semiconductor wafer |
-
1980
- 1980-10-07 JP JP55140333A patent/JPS5764929A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5320263A (en) * | 1976-08-06 | 1978-02-24 | Komatsu Ltd | Automatic fork positioning apparatus for use in fork lift |
JPS54109760A (en) * | 1978-02-16 | 1979-08-28 | Toshiba Corp | Carrier for semiconductor wafer |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS616826A (ja) * | 1984-06-20 | 1986-01-13 | Canon Inc | 位置決め装置 |
JPS616825A (ja) * | 1984-06-20 | 1986-01-13 | Canon Inc | 位置決め装置 |
CN101284601B (zh) | 2007-04-11 | 2011-05-04 | 威光自动化科技股份有限公司 | 托盘内载基片的撷取装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0245323B2 (enrdf_load_stackoverflow) | 1990-10-09 |
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