JPS5763547A - Photoconductive member - Google Patents

Photoconductive member

Info

Publication number
JPS5763547A
JPS5763547A JP55138982A JP13898280A JPS5763547A JP S5763547 A JPS5763547 A JP S5763547A JP 55138982 A JP55138982 A JP 55138982A JP 13898280 A JP13898280 A JP 13898280A JP S5763547 A JPS5763547 A JP S5763547A
Authority
JP
Japan
Prior art keywords
layer
substrate
photoconductive
halogen atoms
photoconductive member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55138982A
Other languages
Japanese (ja)
Other versions
JPS6341056B2 (en
Inventor
Isamu Shimizu
Shigeru Shirai
Hidekazu Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP55138982A priority Critical patent/JPS5763547A/en
Priority to GB8129627A priority patent/GB2088628B/en
Priority to CA000387231A priority patent/CA1181629A/en
Priority to DE19813139531 priority patent/DE3139531A1/en
Priority to FR8118696A priority patent/FR2495344B1/en
Publication of JPS5763547A publication Critical patent/JPS5763547A/en
Publication of JPS6341056B2 publication Critical patent/JPS6341056B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/09Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/095Devices sensitive to infrared, visible or ultraviolet radiation comprising amorphous semiconductors

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Light Receiving Elements (AREA)
  • Photoreceptors In Electrophotography (AREA)

Abstract

PURPOSE:To obtain a photoconductive member which is superior in electrical, optical and photoconductive characteristics and environment characteristics to be used by providing a nonphotoconductive amorphous material layer consisting basically of Si and O and contg. halogen atoms between a substrate and a photoconductive layer. CONSTITUTION:A photoconductive member 100 is constituted of an intermediate layer 102 and a photoconductive layer 103 provided in the state of direct contact with said layer 102 on a substrate 101 for the photoconductive member. The substrate 101 may be either conductive or of electrically insulation characteristic. The layer 102 consists of the nonphotoconductive amorphous material expressed by the formula (X is halogen atoms; 0<x<1, 0<y<1) consisting basically of Si and O and contg. halogen atoms. Said layer 102 has the functions of blocking the inflow of carriers from the side of the substrate 101 into the layer 103 effectively and permits the passage of the photocarriers produced in the layer 103 by the irradiation of electromagnetic waves and moving toward the side of the substrate 101 from the side of the layer 103 to the side of the substrate 101 easily.
JP55138982A 1980-10-03 1980-10-03 Photoconductive member Granted JPS5763547A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP55138982A JPS5763547A (en) 1980-10-03 1980-10-03 Photoconductive member
GB8129627A GB2088628B (en) 1980-10-03 1981-10-01 Photoconductive member
CA000387231A CA1181629A (en) 1980-10-03 1981-10-02 Photoconductive member including non-photoconductive layer containing amorphous silicon matrix-containing oxygen
DE19813139531 DE3139531A1 (en) 1980-10-03 1981-10-05 PHOTO-CONDUCTIVE ELEMENT
FR8118696A FR2495344B1 (en) 1980-10-03 1981-10-05 PHOTOCONDUCTIVE ELEMENT

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55138982A JPS5763547A (en) 1980-10-03 1980-10-03 Photoconductive member

Publications (2)

Publication Number Publication Date
JPS5763547A true JPS5763547A (en) 1982-04-17
JPS6341056B2 JPS6341056B2 (en) 1988-08-15

Family

ID=15234705

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55138982A Granted JPS5763547A (en) 1980-10-03 1980-10-03 Photoconductive member

Country Status (1)

Country Link
JP (1) JPS5763547A (en)

Also Published As

Publication number Publication date
JPS6341056B2 (en) 1988-08-15

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