JPS5760645A - X-ray projector - Google Patents

X-ray projector

Info

Publication number
JPS5760645A
JPS5760645A JP55133768A JP13376880A JPS5760645A JP S5760645 A JPS5760645 A JP S5760645A JP 55133768 A JP55133768 A JP 55133768A JP 13376880 A JP13376880 A JP 13376880A JP S5760645 A JPS5760645 A JP S5760645A
Authority
JP
Japan
Prior art keywords
gas
window
reacting
ray
constitution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55133768A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6250943B2 (cg-RX-API-DMAC7.html
Inventor
Yoshitaka Kitamura
Masahiro Okabe
Yasuo Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP55133768A priority Critical patent/JPS5760645A/ja
Publication of JPS5760645A publication Critical patent/JPS5760645A/ja
Publication of JPS6250943B2 publication Critical patent/JPS6250943B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • H01J35/18—Windows
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP55133768A 1980-09-26 1980-09-26 X-ray projector Granted JPS5760645A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55133768A JPS5760645A (en) 1980-09-26 1980-09-26 X-ray projector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55133768A JPS5760645A (en) 1980-09-26 1980-09-26 X-ray projector

Publications (2)

Publication Number Publication Date
JPS5760645A true JPS5760645A (en) 1982-04-12
JPS6250943B2 JPS6250943B2 (cg-RX-API-DMAC7.html) 1987-10-27

Family

ID=15112505

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55133768A Granted JPS5760645A (en) 1980-09-26 1980-09-26 X-ray projector

Country Status (1)

Country Link
JP (1) JPS5760645A (cg-RX-API-DMAC7.html)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59188123A (ja) * 1983-04-08 1984-10-25 Nec Corp Ｘ線露光装置
JPS62236392A (ja) * 1986-04-07 1987-10-16 Kansai Electric Power Co Inc:The 可変速揚水発電システムの運転制御装置
JPS6445970A (en) * 1987-08-14 1989-02-20 Hitachi Ltd Control device for variable speed water turbine generating unit
JPH01140100A (ja) * 1987-11-26 1989-06-01 Nec Corp Ｘ線取出し方法
JPH0344858U (cg-RX-API-DMAC7.html) * 1989-09-07 1991-04-25
JPH0348846U (cg-RX-API-DMAC7.html) * 1989-09-19 1991-05-10
JPH0348844U (cg-RX-API-DMAC7.html) * 1989-09-19 1991-05-10
US5561358A (en) * 1993-12-24 1996-10-01 Hitachi, Ltd. Variable speed pumping-up generator
US10176900B2 (en) 2012-10-10 2019-01-08 Xyleco, Inc. Equipment protecting enclosures

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59188123A (ja) * 1983-04-08 1984-10-25 Nec Corp Ｘ線露光装置
JPS62236392A (ja) * 1986-04-07 1987-10-16 Kansai Electric Power Co Inc:The 可変速揚水発電システムの運転制御装置
JPS6445970A (en) * 1987-08-14 1989-02-20 Hitachi Ltd Control device for variable speed water turbine generating unit
JPH01140100A (ja) * 1987-11-26 1989-06-01 Nec Corp Ｘ線取出し方法
JPH0344858U (cg-RX-API-DMAC7.html) * 1989-09-07 1991-04-25
JPH0348846U (cg-RX-API-DMAC7.html) * 1989-09-19 1991-05-10
JPH0348844U (cg-RX-API-DMAC7.html) * 1989-09-19 1991-05-10
US5561358A (en) * 1993-12-24 1996-10-01 Hitachi, Ltd. Variable speed pumping-up generator
US10176900B2 (en) 2012-10-10 2019-01-08 Xyleco, Inc. Equipment protecting enclosures
US10589251B2 (en) 2012-10-10 2020-03-17 Xyleco, Inc. Equipment protecting enclosures

Also Published As

Publication number Publication date
JPS6250943B2 (cg-RX-API-DMAC7.html) 1987-10-27

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