JPS5760205A - Exposure be electron beam - Google Patents

Exposure be electron beam

Info

Publication number
JPS5760205A
JPS5760205A JP55136161A JP13616180A JPS5760205A JP S5760205 A JPS5760205 A JP S5760205A JP 55136161 A JP55136161 A JP 55136161A JP 13616180 A JP13616180 A JP 13616180A JP S5760205 A JPS5760205 A JP S5760205A
Authority
JP
Japan
Prior art keywords
light
amplifier
supplied
output
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55136161A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6341401B2 (enrdf_load_stackoverflow
Inventor
Teruaki Okino
Shigeo Konno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP55136161A priority Critical patent/JPS5760205A/ja
Publication of JPS5760205A publication Critical patent/JPS5760205A/ja
Publication of JPS6341401B2 publication Critical patent/JPS6341401B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Measurement Of Optical Distance (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP55136161A 1980-09-30 1980-09-30 Exposure be electron beam Granted JPS5760205A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55136161A JPS5760205A (en) 1980-09-30 1980-09-30 Exposure be electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55136161A JPS5760205A (en) 1980-09-30 1980-09-30 Exposure be electron beam

Publications (2)

Publication Number Publication Date
JPS5760205A true JPS5760205A (en) 1982-04-12
JPS6341401B2 JPS6341401B2 (enrdf_load_stackoverflow) 1988-08-17

Family

ID=15168738

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55136161A Granted JPS5760205A (en) 1980-09-30 1980-09-30 Exposure be electron beam

Country Status (1)

Country Link
JP (1) JPS5760205A (enrdf_load_stackoverflow)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6079722A (ja) * 1983-10-06 1985-05-07 Jeol Ltd 電子線露光方法
JPS6134936A (ja) * 1984-07-26 1986-02-19 Hitachi Ltd 電子線描画装置における試料面高さ補正方法
JPS61129825A (ja) * 1984-11-29 1986-06-17 Toshiba Mach Co Ltd 電子ビ−ム露光装置
JPS61290414A (ja) * 1985-06-19 1986-12-20 Hitachi Ltd 焦点合せ方法及びその装置
JPS62140419A (ja) * 1985-12-16 1987-06-24 Canon Inc 面位置検知装置
JPS62140420A (ja) * 1985-12-16 1987-06-24 Canon Inc 面位置検知装置
JPS63238509A (ja) * 1987-03-27 1988-10-04 Miyano:Kk レ−ザ−測長器
JPH01217207A (ja) * 1988-02-25 1989-08-30 Jeol Ltd 非接触光学的変位測定装置
US5162642A (en) * 1985-11-18 1992-11-10 Canon Kabushiki Kaisha Device for detecting the position of a surface
JP2008029198A (ja) * 2007-09-14 2008-02-07 Sanyo Electric Co Ltd 温度検出回路を備えたインバータ回路装置

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6079722A (ja) * 1983-10-06 1985-05-07 Jeol Ltd 電子線露光方法
JPS6134936A (ja) * 1984-07-26 1986-02-19 Hitachi Ltd 電子線描画装置における試料面高さ補正方法
JPS61129825A (ja) * 1984-11-29 1986-06-17 Toshiba Mach Co Ltd 電子ビ−ム露光装置
JPS61290414A (ja) * 1985-06-19 1986-12-20 Hitachi Ltd 焦点合せ方法及びその装置
US5162642A (en) * 1985-11-18 1992-11-10 Canon Kabushiki Kaisha Device for detecting the position of a surface
JPS62140419A (ja) * 1985-12-16 1987-06-24 Canon Inc 面位置検知装置
JPS62140420A (ja) * 1985-12-16 1987-06-24 Canon Inc 面位置検知装置
JPS63238509A (ja) * 1987-03-27 1988-10-04 Miyano:Kk レ−ザ−測長器
JPH01217207A (ja) * 1988-02-25 1989-08-30 Jeol Ltd 非接触光学的変位測定装置
JP2008029198A (ja) * 2007-09-14 2008-02-07 Sanyo Electric Co Ltd 温度検出回路を備えたインバータ回路装置

Also Published As

Publication number Publication date
JPS6341401B2 (enrdf_load_stackoverflow) 1988-08-17

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